公开(公告)号：EP2012198B1

公开(公告)日：2010-11-24

申请号：EP06834917.4

申请日：2006-12-18

申请人： Fujifilm Corporation

发明人： KAMO, Makoto ,  USAMI, Yoshihisa ,  SASAKI, Toshio

IPC分类号： G03H1/04 ,  G11B7/0065 ,  G11B7/135 ,  G11B7/24

CPC分类号： G11B7/00781 ,  G03H1/18 ,  G03H1/182 ,  G03H2223/14 ,  G11B7/0065 ,  G11B7/0938 ,  G11B7/1275 ,  G11B7/1392 ,  G11B7/24038 ,  G11B7/24044 ,  G11B7/26

摘要： In an optical recording medium processing method, a recording layer wherein the information of an optical recording medium having at least a layer for recording the information is recorded by utilizing holography is irradiated with processing light passed through a light diffusion member having a cloudiness value of 70-100%. Equipment for processing an optical recording medium comprises an optical recording medium having at least a recording layer for recording the information by utilizing holography; a processing light source; and a light diffusion member having a cloudiness value of 70-100% interposed between the processing light source and the optical recording medium. The equipment irradiates the recording layer wherein the information is recorded with processing light passed trough the light diffusion member. Preferably, the half peak value of wavelength to the energy intensity of processing light is 5-700 nm, and the optical recording medium is write once (WORM) type.

公开(公告)号：EP2202008A1

公开(公告)日：2010-06-30

申请号：EP08838953.1

申请日：2008-10-07

申请人： Fujifilm Corporation

发明人： USAMI, Yoshihisa

IPC分类号： B08B3/08 ,  B08B3/04

CPC分类号： B08B3/08 ,  G11B7/268 ,  H01L33/005 ,  H01L33/20

摘要： A method for cleaning a heat mode type recording material layer to remove debris (D) generated when a plurality of recessed portions (15) are formed in a thermally deformable heat mode recording material layer (12) by application of condensed light is provided, which method includes using a liquid (L) inactive to the recording material layer (12), to thereby remove the debris (D). This method for cleaning a heat mode type recording material layer is applicable to a method for manufacturing a pit-projection product, a method for manufacturing a light emitting element, and a method for manufacturing an optical element.

摘要翻译： 一种用于清洗的热模式型记录材料层以除去碎片（D）的方法产生的。当凹部的多个（15）中由冷凝的轻的应用中的热变形的热模式记录材料层（12）形成被提供，其 方法包括使用液体（L）不活动到记录材料层（12），从而除去碎屑（D）。 这用于清洁热模式型记录材料层方法适用于用于制造凹 - 凸制品，用于制造发光元件的方法，以及用于制造光学元件的方法的方法。

公开(公告)号：EP2184738A1

公开(公告)日：2010-05-12

申请号：EP08751745.4

申请日：2008-05-16

申请人： Fujifilm Corporation

发明人： USAMI, Yoshihisa ,  WATANABE, Tetsuya

IPC分类号： G11B7/26 ,  B41M5/26

CPC分类号： G11B7/261 ,  B41M5/24 ,  Y10T428/21

摘要： A method by which depressions and projections (pit pattern) can be formed directly and easily in a substrate made of inorganic material is provided. A method for forming a medium on which information is recorded in a pit pattern comprises the steps of: forming a recording material layer (21) over a substrate (11) made of inorganic material wherein the recording material layer is of a thermally deformable heat mode recording material; forming a plurality of holes 15 by application of condensed light to the recording material layer (21); and forming a plurality of pits (16) in the substrate wherein the plurality of pits corresponding to the plurality of holes (15) are etched by using as a mask the recording material layer (21) in which the plurality of holes are formed.

摘要翻译： 提供了一种通过该凹凸（凹坑图案）可以在由无机材料构成的基片可以直接且容易地形成的方法。 一种用于形成在其上的信息被记录在凹坑图案的介质的方法包括以下步骤：形成由无机材料形成的记录材料层（21）在基板（11）worin记录材料层是可热变形热模式的 记录材料上; 通过应用聚光到所述记录材料层（21）形成孔15的多元性; 以及形成在基片的凹坑的多个（16）worin凹坑对应于孔的多元性（15）的多元性通过使用作为掩模其中空穴的多元性形成在记录材料层（21）被蚀刻。

公开(公告)号：EP3501262A1

公开(公告)日：2019-06-26

申请号：EP17841381.1

申请日：2017-08-02

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa ,  ICHIHASHI, Mitsuyoshi ,  OKI, Kazuhiro

IPC分类号： A01G7/00 ,  F21S2/00 ,  F21V9/14 ,  G02B5/30

摘要： An object is to provide a plant illumination apparatus that can output light having a high degree of circular polarization in the target wavelength range. This object is achieved by having a reflective-type polarizing plate having an effective wavelength range, a light-emitting device, and a reflective plate configured to reflect light emitted from the light-emitting device and satisfying:
λ1 > λ2, λ2 > λ3, and w > 30 nm
wherein λ1 is the center wavelength of the effective wavelength range of the reflective-type polarizing plate, λ2 is the center wavelength of the light-emitting device, w is the full width at half maximum of the transmittance of the reflective-type polarizing plate, and λ3 is the shorter wavelength of the wavelengths at the full width at half maximum.

公开(公告)号：EP3498084A1

公开(公告)日：2019-06-19

申请号：EP17841319.1

申请日：2017-07-14

申请人： Fujifilm Corporation

发明人： USAMI, Yoshihisa ,  ICHIHASHI, Mitsuyoshi ,  OKI, Kazuhiro

IPC分类号： A01G7/00 ,  F21V9/14

摘要： Provided are a plant-growth laminated film and a plant-growth illumination apparatus that more efficiently provide circularly polarized light used for plant growth. Included are a reflective-type linearly polarizing plate that transmits one of linearly polarized light components of incident light and that reflects the other linearly polarized light component, and a λ/4 plate that converts, into circularly polarized light, linearly polarized light provided by transmission through the reflective-type linearly polarizing plate, wherein the λ/4 plate has an in-plane retardation of 165 ± 40 nm at a wavelength of 660 nm.

公开(公告)号：EP2982237B1

公开(公告)日：2017-01-11

申请号：EP14774887.5

申请日：2014-03-24

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa ,  ICHIHASHI, Mitsuyoshi

IPC分类号： A01G7/00 ,  F21S2/00 ,  F21V9/14 ,  G02B5/30 ,  A01G7/04 ,  F21K99/00

CPC分类号： F21V9/14 ,  A01G7/045 ,  F21K9/60 ,  F21Y2115/10 ,  G02B5/3025 ,  Y02P60/146

公开(公告)号：EP2865261A1

公开(公告)日：2015-04-29

申请号：EP13807535.3

申请日：2013-06-19

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa ,  ICHIHASHI, Mitsuyoshi

IPC分类号： A01G7/00 ,  F21S2/00 ,  F21V9/08 ,  F21Y101/02

CPC分类号： A01G7/045 ,  F21V9/14 ,  Y02P60/146

摘要： The present invention provides an illumination apparatus for plant cultivation, including a unit configured to change light in any wavelength region of 300 nm or higher and 600 nm or lower (wavelengths of 452 nm to 474 nm, for example) to light in the wavelength region having dominantly a right-circularly polarized light component.The illumination apparatus of the present invention enables irradiation with light that is capable of giving a specific effect in plant cultivation.

摘要翻译： 本发明提供一种用于植物培养的照明装置，包括：将在300nm以上且600nm以下的波长范围（例如452nm〜474nm的波长）的光改变为波长区域的光的单元 主要是右圆偏振光成分。本发明的照明装置能够对能够在植物培养中产生特定效果的光进行照射。

公开(公告)号：EP2856858A1

公开(公告)日：2015-04-08

申请号：EP13796940.8

申请日：2013-05-27

申请人： FUJIFILM Corporation

发明人： ICHIHASHI, Mitsuyoshi ,  USAMI, Yoshihisa

IPC分类号： A01G7/00 ,  F21S2/00 ,  F21V9/14 ,  F21Y101/02

CPC分类号： A01G9/14 ,  A01G7/045 ,  F21V9/14 ,  F21Y2115/10 ,  G02B27/286 ,  Y02P60/146

摘要： According to the present invention, provided is a system for irradiating a target object selectively with specific circularly polarized light, comprising a polarization-state control member that controls the polarization state of light to thereby generate circularly polarized light; and a circularly polarized light-reflecting member, wherein the circularly polarized light-reflecting member is disposed at a position on which the circularly polarized light emitted from the polarization-state control member can be incident; the circularly polarized light-reflecting member generates reflected light that selectively comprises circularly polarized light of the same sense as the incident circularly polarized light from the polarization-state control member; and the circularly polarized light-reflecting member is disposed such that the target object can be irradiated with at least a part of the reflected light.

摘要翻译： 根据本发明，提供了一种用特定的圆偏振光选择性地照射目标物体的系统，包括：控制光的偏振状态从而产生圆偏振光的偏振状态控制部件; 以及圆偏振光反射部件，其中，所述圆偏振光反射部件设置在从所述偏振状态控制部件发射的所述圆偏振光能够入射的位置处; 圆偏振光反射部件产生反射光，该反射光选择性地包括与来自偏振状态控制部件的入射圆偏振光相同方向的圆偏振光; 并且圆偏振光反射构件被设置为使得可以用至少一部分反射光照射目标物体。

公开(公告)号：EP2356881A1

公开(公告)日：2011-08-17

申请号：EP09814497.5

申请日：2009-09-02

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa

IPC分类号： H05B33/02 ,  G09F9/30 ,  H01L27/32 ,  H01L51/50 ,  H05B33/10

CPC分类号： H01L51/5268 ,  H01L51/5262 ,  H01L51/5271 ,  H05B33/10 ,  H05B33/14 ,  H05B33/22

摘要： The present invention provides a light-emitting device which includes, in the order mentioned, a light-emitting layer containing a light-emitting portion, an intermediate layer, and a fine concavo-convex pattern, wherein the intermediate layer is disposed over a second surface of the light-emitting layer which surface is opposite to a first surface of the light-emitting layer, wherein the fine concavo-convex pattern has a cross-sectional shape which has portions projected and recessed with respect to the light-emitting layer, and reflects light emitted from the light-emitting layer, and wherein at least part of the intermediate layer has a refractive index of 0.9n to 1.1n, where n denotes a refractive index of the light-emitting portion with respect to light which has a main light-emitting wavelength.

摘要翻译： 本发明提供一种发光装置，其依次包括含有发光部分，中间层和微细凹凸图案的发光层，其中中间层设置在第二 所述发光层的表面与所述发光层的第一表面相对，其中，所述微细凹凸图案具有相对于所述发光层具有突出和凹陷的部分的横截面形状， 并且反射从发光层发射的光，并且其中中间层的至少一部分具有0.9n至1.1n的折射率，其中n表示发光部相对于具有 主要发光波长。

公开(公告)号：EP2356880A1

公开(公告)日：2011-08-17

申请号：EP09814496.7

申请日：2009-09-02

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa

IPC分类号： H05B33/02 ,  G09F9/30 ,  H01L27/32 ,  H01L51/50 ,  H05B33/10

CPC分类号： H01L51/5271 ,  H01L51/5268 ,  H05B33/10 ,  H05B33/14 ,  H05B33/22

摘要： The present invention provides a light-emitting device which includes, in the order mentioned, a light-emitting layer containing a light-emitting portion, an interference layer, and a fine concavo-convex pattern, wherein the interference layer is disposed over a second surface of the light-emitting layer which surface is opposite to a first surface of the light-emitting layer, and reflects, toward the first surface, light emitted from the light-emitting layer, and wherein the fine concavo-convex pattern has a cross-sectional shape which has portions projected and recessed with respect to the light-emitting layer, and reflects light emitted from the light-emitting layer.