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    CALIBRATION LIGHT SOURCE, OPTICAL SENSOR ARRANGEMENT, AND METHOD FOR ASSEMBLY LINE IN-SITU CALIBRATION OF AN OPTICAL DEVICE COMPRISING AN OPTICAL SENSOR
    34.
    发明公开
    CALIBRATION LIGHT SOURCE, OPTICAL SENSOR ARRANGEMENT, AND METHOD FOR ASSEMBLY LINE IN-SITU CALIBRATION OF AN OPTICAL DEVICE COMPRISING AN OPTICAL SENSOR 审中-公开
    光源装置进行校准，用于校准光学器件为光学传感器组装光学传感器布置和方法

    公开(公告)号：EP3156772A1

    公开(公告)日：2017-04-19

    申请号：EP15197602.4

    申请日：2015-12-02

    Applicant: ams AG

    Inventor： Mehrl, David

    IPC: G01J1/08 ,  G01J1/42 ,  G01D18/00

    CPC classification number: G01J1/08 ,  G01J1/4204

    Abstract: An assembly line in-situ calibration arrangement, optical sensor arrangement and a method for calibration of an optical sensor arrangement are presented. A calibration arrangement (1) comprises a calibration head (10) comprising at least one calibrated light source (17R, 17G, 17B) located behind an aperture in a housing (11) and being electrically connected to a power terminal. A power source (30) is connected to the power terminal, the power source (30) comprising a switching unit (32R, 32G, 32B, 32C) electrically connected to the at least one light source (17R, 17G, 17B). An interface unit (40) is connected to the switching unit (32R, 32G, 32B, 32C) by means of an interface connection (41), wherein the interface unit (40) is arranged to control the switching unit (32R, 32G, 32B, 32C). A control unit (50) is connected to the interface unit (40), wherein the control unit (50) is arranged to drive the interface unit (40) such that the at least one light source (17R, 17G, 17B) is switched to emit a calibration pulse sequence to be received by the optical sensor arrangement (2) to be placed with respect of the aperture. The calibration pulse sequence is arranged to initiate a calibration mode of operation of the optical sensor arrangement (2).

    Abstract translation: 原位校准布置中，光学传感器布置和用于光学传感器装置的校准的方法的流水线呈现。 的校准装置（1）包括一个校准头（10）包括至少一个校准光源（17R，17G，17B）位于后面在一个壳体（11）开口并且连接到电端子的功率。 电源（30）连接到电源端子，包括：开关单元（32R，32G，32B，32C）电连接到所述至少一个光源（17R，17G，17B）的电源（30）。 的接口单元（40）被连接到开关单元（32R，32G，32B，32C）通过接口连接（41）worin接口单元的装置（40）被布置为控制所述开关单元（32R，32G， 32B，32C）。 控制单元（50）被连接到所述接口单元（40），其中所述控制单元（50）被布置成驱动所述接口单元（40）测试并所述至少一个光源（17R，17G，17B）被切换 以发射到由光学传感器装置（2）接收的校准脉冲序列相对于所述孔的放置的位置。 校准脉冲序列被安排成启动光学传感器布置（2）的操作的校准模式。

    GEOMETRIC CALIBRATION OF A REMOTE SENSOR
    35.
    发明公开
    GEOMETRIC CALIBRATION OF A REMOTE SENSOR 审中-公开
    GEOMETRISCHE KALIBRIERUNG EINES FERNSENSORS

    公开(公告)号：EP2888557A1

    公开(公告)日：2015-07-01

    申请号：EP13730084.4

    申请日：2013-05-29

    Applicant: Raytheon Company

    Inventor： SILNY, John F. ,  SCHILLER, Stephen J.

    IPC: G01C25/00 ,  G01J1/42 ,  G01J1/08

    CPC classification number: G01J1/08 ,  G01C11/02 ,  G01C25/00 ,  G01J1/4228 ,  G06T7/80 ,  G06T2207/10032 ,  G06T2207/30181 ,  G06T2207/30244

    Abstract: Geometric calibration of an imaging system is performed by recording visible control points in a calibration image whose geometric properties are known and calibration coefficients can be derived utilizing an image processing system for transforming the recorded image into a geometric distortion-free image. Described are methods and systems for vicarious geometric calibration of a remote sensor that include a processor configured to receive image data collected at a remote sensor, the image data including a plurality of image elements each associated with a respective reflective mirror from a plurality of reflective mirrors located at respective know positions, determine, for each of the plurality of reflective mirrors, an image location in the image data and determine one or more figures of merit based on the image locations and the known positions for each of the plurality of reflective mirrors.

    Abstract translation: 通过将可见控制点记录在其几何特性已知的校准图像中并且可以使用用于将记录图像变换为几何无失真图像的图像处理系统导出校准系数来执行成像系统的几何校准。 描述了用于远程传感器的替代几何校准的方法和系统，其包括被配置为接收在远程传感器处收集的图像数据的处理器，所述图像数据包括多个图像元素，每个图像元素与来自多个反射镜的相应反射镜相关联 位于相应的知道位置，为每个多个反射镜确定图像数据中的图像位置，并且基于多个反射镜中的每一个的图像位置和已知位置来确定一个或多个品质因数。

    DISPOSITIF DE FORMATION D'UN RESEAU D'INTERFERENCES SUR UN ECHANTILLON.
    37.
    发明公开
    DISPOSITIF DE FORMATION D'UN RESEAU D'INTERFERENCES SUR UN ECHANTILLON. 审中-公开
    DEVICE FOR形成网格干扰在样本

    公开(公告)号：EP2661612A1

    公开(公告)日：2013-11-13

    申请号：EP11813417.0

    申请日：2011-12-21

    Applicant: Centre National de la Recherche Scientifique

    Inventor： LONGEAUD, Christophe

    IPC: G01J1/08

    CPC classification number: G02B26/0816 ,  G01J1/08 ,  Y02E10/52

    Abstract: The invention relates to a device for forming an interference grating on a sample, the device comprising a laser emitting a light beam of wavelength lambda, a beam splitter plate splitting the beam emitted by the laser into first and second beams (11, 14), the first beam (11) being deflected in a first direction, a first stationary deflection mirror for deflecting the first beam onto a point P of the sample at a first constant angle of incidence theta1, and at least one second stationary deflection mirror for deflecting the second beam along a final path (17) that reaches said point P of the sample at a second angle of incidence theta2 in order to form an interference grating on the sample at a pitch that depends on the angular difference theta between the first and second angles of incidence theta1 and theta2, the path of the second beam being characterized in that it includes a movable deflection mirror (7, 7') to direct and deflect the second beam from a plurality of first points of impact (71) from which the second beam (15) is directed towards a plurality of second points of impact (82) on a said second mirror (8, M2), thereby forming a plurality of pairs, each comprising first and second points of impact (71, 82), each of which corresponding to a said final path (17) of the second beam having a different value of the angle theta2, so as to cause the value of the angle of incidence theta2 to vary and thus vary the angular difference theta, and in that the first points of impact (71) are arranged on a linear or parabolic path extending from an upstream end remote from the sample where it is spaced apart from the direction of the beam (10) that is emitted by the laser in a direction opposite to the first direction and thus away from the segment (12) of the first beam that impacts said point P of the sample (ECH), said linear or parabolic path being reentrant towards said segment (12) of the first beam on going towards a downstream end closer to the sample (ECH) so as to compensate at least in part for optical path length variations of the second beam for the pairs of first and second points of impact (71, 82), each of which corresponds to a respective value of the angular difference theta.

    Flat light emitting plate for simulating thermal radiation, method for calibrating a pyrometer and method for determining the temperature of a semiconducting wafer
    38.
    发明公开
    Flat light emitting plate for simulating thermal radiation, method for calibrating a pyrometer and method for determining the temperature of a semiconducting wafer 审中-公开
    平面发光用于热辐射的方法的模拟面板用于校准高温计和一种用于确定半导体晶片的温度

    公开(公告)号：EP2660574A1

    公开(公告)日：2013-11-06

    申请号：EP13158380.9

    申请日：2013-03-08

    Applicant: LayTec AG

    Inventor： Zettler, Jörg-Thomas ,  Kaspari, Christian

    IPC: G01J5/00 ,  G01J5/08 ,  G01J1/08 ,  G01J5/52

    CPC classification number: G01J5/02 ,  G01J1/08 ,  G01J5/0007 ,  G01J5/0896 ,  G01J5/522 ,  H05B33/0854

    Abstract: The present invention relates to a flat light emitting plate, a method for calibrating a pyrometer and a method for determining the temperature of a semiconducting wafer inside a processing chamber by said pyrometer.
    It is an object of the present invention to provide a method for calibrating a pyrometer by means of a cold source which is also applicable to processing chambers with a narrow slit.
    According to the present invention, a flat light emitting plate for simulating thermal radiation is provided, comprising a main body made of a transparent material, a light emission area located on an upper surface of the light emitting plate for emitting light, at least one light source located on a lateral surface of the light emitting plate, at least one detector located on a lateral surface of the light emitting plate, and a regulating circuit for adjusting the intensity of light emitted by the light sources.

    Abstract translation: 本发明涉及一种平面发光板，对于半导体晶片的温度校准高温计和一种方法用于确定性采矿由所述高温计的处理室内部的方法。 这是本发明的一个目的是提供一种用于通过冷源的手段校准高温计的所有其因此适用于具有窄缝处理腔室的方法。 。根据本发明，一台光用于模拟热辐射发射板设置，其包括由透明材料制成的主体，位于光用于发射光，至少一个发光板的上表面上的发光区域 源位于所述发光板的侧表面，位于所述发光板的侧表面的至少一个检测器，和用于调节由光源发射的光的强度的调节电路。

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