摘要:
The invention is directed at a method of performing scanning probe microscopy on a substrate surface using a scanning probe microscopy system. A probe tip and substrate surface are moved relative to each other in one or more directions parallel to the scanning plane to position the probe tip to a scanning position on the substrate surface with the probe tip; a displacement is measured by an encoder of said probe tip in said one or more directions; and a fiducial pattern is provided fixed relative to the substrate surface, said fiducial pattern having a scannable structure that is scannable by said probe tip and said structure forming a grid of fiducial marks in said one or more dimensions; said grid dimensioned to allow for measuring placement deviations of the probe tip relative to the probe head by identifying one or more fiducial marks in the fiducial pattern.
摘要:
The subject of the invention is a device for calibrating the lateral force exerted by the Atomic Force Microscope (AFM) measuring lever. The device can directly determine the lateral force calibration coefficient in lateral force microscopy (LFM).
摘要:
A method and system for calibrating force (F12) in a dynamic mode atomic force microscope (AFM). An AFM tip (11) is disposed on a first cantilever (12). The first cantilever (12) is actuated to oscillate the AFM tip (11) in a dynamic mode. A first sensor (16) is configured to measure a first parameter (A1) of the oscillating AFM tip (11). A second sensor (26) is configured to measure a second parameter (A2) of a resilient element (22). The oscillating AFM tip (11) is moved in proximity to the resilient element (22) while measuring the first parameter (A1) of the AFM tip (11) and the second parameter (A2) of the resilient element (22). A force (F12) between the oscillating AFM tip (11) and the resilient element (22) is calculated based on the measured second parameter (A2) and a calibrated force constant (K2) of the resilient element (22).
摘要:
A method for monitoring radius and shape variations of the cantilever tips of atomic force microscopes AFM, the method envisages several embodiments and aspects of the invention aimed to the solve the problem of monitoring and assessing the shape of tips of cantilevers used in AFM. The method hereby described is applicable for the amplitude modulation mode of operation of an atomic force microscopes and based in the relationship between the tip characteristics and the determining the condition of the radius of the tip from the amplitude of at least one nth(s) harmonic wherein higher intensity of the value of the amplitude of the nth(s) harmonic implies higher values of the radius of the tip.
摘要:
The invention relates to a device (10) for characterizing a sample (11), comprising a measuring instrument (20) suitable for determining a physical characteristic of the sample at one point thereof. More specifically, the characterization device of the invention comprises a positioning system (30) suitable for positioning the measuring instrument in relation to the sample, in order to obtain a measurement at a measurement point localized on the sample, in an absolute manner. For this purpose, the invention provides a characterization device including a positioning system that comprises: a locating target (31) solidly connected to the sample and defining a reference system linked to the sample; means for acquiring and analysing images, comprising lighting means (321) for illuminating the locating target, an optical imaging system (322) solidly connected to the measuring instrument and suitable for acquiring an image (31P) of at least one portion of the locating target, and image analysis means (33) suitable for analysing the image of the portion of the locating target in order to determine the position and orientation of the optical imaging system in relation to the locating target; calibration means (34, 34A) for determining the relative position of the measuring instrument in relation to the optical imaging system; and processing means (13) for processing the results of the image analysis and of the calibration, suitable for determining the absolute position of the localized measurement point in the reference system linked to the sample, the measuring instrument being positioned to take the measurement at said localized measurement point and the physical characteristic of the sample being determined by the measuring instrument at the localized measurement point.
摘要:
The arrangement for calibrating probes comprises a source (10) of coherent photon radiation and at least one optically based strain sensor (12a) for measuring an amount of strain (ε). The at least one optically based strain sensor is optically coupled to said source of coherent photon radiation. The arrangement further comprises at least one calibration lever (14) having a surface for placement of a tip (21) of a probe (2) to be calibrated, and that is mechanically coupled to the at least one optically based strain sensor for converting a force (F) exerted by said tip at said surface into an amount of strain in the optically based strain sensor. The arrangement further comprises at least one probe holder (24) for holding the probe (2) to be calibrated, the at least one probe holder having a controllable position in at least a direction (y) transverse to the surface of the calibration lever (14). The arrangement further comprises a calibration control facility (46) for controlling said controllable position within a range of position values, and for determining a mechanical property of said probe from the measured amount of strain (ε) and a deflection (δc) of the tip (21) of the probe relative to the probe holder as a function of said position. The arrangement may be used as a stand-alone device or may be integrated in a device, such as an AFM-device. The arrangement may also be carried out as a batch-calibration device.
摘要:
The present invention relates to a method for measuring the near-field signal of a sample in a scattering type near-field microscope and to a device for conducting said method.
摘要:
A system and method for measuring, analysis, removal, addition or imaging of material using nanostructures in conjunction with mechanical, electromagnetic (optical) and electrical means. Techniques for fabricating such nanostructures and techniques for combining these elements in a system which can modify bulk or large area objects such as silicon wafers, and masks for lithography.
摘要:
An atomic force microscope using a cantilevered sensor (12) which is influenced by an electrostatic force given by the charge in the Unit Under Test (40). The cantilever sensor is preferably made of nickel foil. Both charge distribution and thickness of the sample are plotted in a 3D graph.