公开(公告)号：EP3196921A1

公开(公告)日：2017-07-26

申请号：EP15841522.4

申请日：2015-09-10

申请人： Fujikura, Ltd.

发明人： ARAI, Daisuke

IPC分类号： H01J47/06 ,  G01T1/18 ,  H01J1/46 ,  H01J9/14

摘要： An ion filter used for an electron multiplier is provided. The ion filter has an insulating substrate (11), a first conductive layer (12) formed on one main surface of the insulating substrate (11), a second conductive layer (13) formed on the other main surface of the insulating substrate (11), and a plurality of through-holes (30) formed along the thickness direction of the insulating substrate (11). The ion filter is configured such that a first thickness (th1) of the first conductive layer (12) is different from a second thickness (th2) of the second conductive layer (13).

摘要翻译： 提供了用于电子倍增器的离子过滤器。 离子过滤器具有：绝缘基板（11）;在绝缘基板（11）的一个主面上形成的第一导电层（12）;在绝缘基板（11）的另一个主面上形成的第二导电层 ）以及沿绝缘基板（11）的厚度方向形成的多个通孔（30）。 离子过滤器被构造成使得第一导电层（12）的第一厚度（th1）不同于第二导电层（13）的第二厚度（th2）。

公开(公告)号：EP2317538B1

公开(公告)日：2017-03-22

申请号：EP09290825.0

申请日：2009-10-28

申请人： CERN - European Organization For Nuclear Research ,  CEA

发明人： Giomataris, Ioannis ,  Rui de Oliveira

IPC分类号： H01J47/06

CPC分类号： H01J47/065 ,  H01J47/06

公开(公告)号：EP2489060B1

公开(公告)日：2015-07-29

申请号：EP10765792.6

申请日：2010-10-15

申请人： EOS Imaging

发明人： DESAUTE, Pascal

IPC分类号： H01J47/06 ,  G01T1/185

CPC分类号： H01J47/06 ,  G01T1/185

公开(公告)号：EP2858088A1

公开(公告)日：2015-04-08

申请号：EP13800490.8

申请日：2013-02-28

申请人： HOYA Corporation

发明人： FUSHIE Takashi ,  KIKUCHI Hajime

IPC分类号： H01J47/06 ,  G01T1/18

CPC分类号： C03C15/00 ,  G01R31/1227 ,  G01T1/2935 ,  H01J43/04 ,  H01J43/246 ,  H01J47/001 ,  Y10T428/24273

摘要： There is provided a glass substrate (15) for electronic amplification having through holes (14) formed on a plate-like glass member (11) and used for causing an electron avalanche in the through holes (14), wherein a shape of the glass substrate (15) for electronic amplification and a material of the glass member (11) are determined so that an insulation resistance in a plate thickness direction per plane of 100 cm 2 is 10 7 to 10 11 Ω.

摘要翻译： 提供了一种用于具有通孔形成的板状玻璃部件（11）上并用于通孔的电子雪崩造成（14）的电子放大（14）的玻璃基板（15），worin玻璃的形状 用于电子放大和玻璃部件（11）的材料的基板（15）是确定性的开采所以通过100平方厘米计划在绝缘电阻做在板厚度方向是十月7日至10月11日©。

公开(公告)号：EP2107591A1

公开(公告)日：2009-10-07

申请号：EP09156789.1

申请日：2009-03-31

申请人： FEI Company

发明人： Marek, Uncovsky ,  Toth, Milos ,  Knowles, Ralph

IPC分类号： H01J37/244 ,  H01J37/28 ,  H01J47/06

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J47/06 ,  H01J2237/24445 ,  H01J2237/2448 ,  H01J2237/2605

摘要： A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas.

摘要翻译： 一种用于带电粒子束系统的新型检测器，其包括多个气体放大级。 这些级通常由相对于样品施加电压的导体或前一级定义。 通过在多级中产生二级电子级联，可以增加增益，而不会引起气体的介质击穿。

公开(公告)号：EP1531902A1

公开(公告)日：2005-05-25

申请号：EP02807480.5

申请日：2002-11-29

申请人： ION BEAM APPLICATIONS S.A.

发明人： BRUSASCO, Caterina ,  MARCHAND, Bruno ,  DE LE HOYE, Jean-François ,  PRIEELS, Damien

IPC分类号： A61N5/10 ,  H01J47/06

CPC分类号： G21K1/087 ,  A61N5/10 ,  A61N5/1043 ,  A61N5/1048 ,  A61N2005/1087

摘要： An irradiation apparatus for irradiating by scanning a target volume according to a predetermined dose profile with a scanning beam of charged particles forming an irradiation spot on said target volume, said apparatus comprising: a beam generating device; a reference generator for computing, from said predetermined dose profile, through a dynamic inverse control strategy, the time evolution of commanded variables, these variables being the beam current I(t), the spot position settings x(t), y(t) and the scanning speed settings vx(t), vy(t); a monitor device having means for detecting at each time (t), the actual spot position as a measured position defined by the values xm(t), ym(t) on the target volume, characterised in that said irradiation apparatus further comprises means for determining the differences ex(t), ey(t) between the measured values xm(t), ym(t) and the spot position settings x(t) and y(t), and means for applying a correction to the scanning speed settings vx(t) and vy(t) depending on said differences ex(t), ey(t). The present invention is also related to a monitor for determining beam position in real-time.

公开(公告)号：EP1034557A1

公开(公告)日：2000-09-13

申请号：EP98955259.1

申请日：1998-11-18

申请人： Danilatos, Gerasimos Daniel

发明人： Danilatos, Gerasimos Daniel

IPC分类号： H01J37/244 ,  H01J37/28 ,  H01J47/06 ,  G01N23/225

CPC分类号： H01J37/244 ,  H01J47/06

摘要： An alternating electromagnetic field in the radiofrequency range is applied in a gaseous environment (4). Free electrons produced in the gas (4), by an ionising source of radiation (5) or by interaction of a charged particle beam with a specimen, are acted upon by the alternating electromagnetic field and undergo an oscillatory motion resulting in multiple collisions with the gas molecules or atoms. Amplified electron and photon signals are generated in a controlled discharge, proportional to the initial number of free electrons, and are collected by suitable means (6, 7, 8). The alternating field is generated either by electrodes (1, 2) biased with an alternating voltage, or by a coil driven by an AC current, and may be superposed with a static electric field. The detection device may be used with instruments such as electron microscopes, in ion beam technologies, and with instruments used for detection of ionising radiations such as proportional counters.

公开(公告)号：EP0678896B1

公开(公告)日：1997-08-20

申请号：EP95400857.9

申请日：1995-04-14

申请人： Charpak, Georges

发明人： Charpak, Georges

IPC分类号： H01J47/06 ,  H01J47/00 ,  G01T1/185

CPC分类号： G01T1/185 ,  H01J47/008 ,  H01J47/062

公开(公告)号：EP0557855A1

公开(公告)日：1993-09-01

申请号：EP93102369.1

申请日：1993-02-16

申请人： LABORATORIUM PROF. DR. RUDOLF BERTHOLD GmbH & Co. KG

发明人： Filthuth, Heinz, Prof. Dr.

IPC分类号： H01J47/06 ,  G01T1/29

CPC分类号： H01J47/062 ,  G01T1/2935

摘要： Ein ortsempfindlicher Detektor zum Nachweis von radioaktiver Strahlung, insbesondere von Beta-Strahlung, befindet sich mindestens 5 mm oberhalb der Probenplatte (P), wobei letztere auf einem negativen Potential liegt. Durch eine Optimierung der dadurch erzeugten Saugspannung mit dem Abstand zwischen Probenplatte und Detektor läßt sich je nach Typ der nachzuweisenden Strahlung eine Optimierung der Ortsauflösung erzielen.

摘要翻译： 用于检测放射性辐射，特别是β辐射的位置敏感检测器位于样品板（P）上方至少5mm处，后者处于负电位。 优化由此产生的加速电压到样品板和检测器之间的距离允许根据待检测的辐射的类型优化位置分辨率。

公开(公告)号：EP0340126B1

公开(公告)日：1993-08-04

申请号：EP89420149.0

申请日：1989-04-25

申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) ,  SOCIETE INEL

发明人： Comparat, Vincent ,  Ballon, Jean ,  Carrechio, Pierre ,  Pélissier, Alain

IPC分类号： H01J47/00 ,  H01J47/06

CPC分类号： H01J47/06 ,  H01J47/008