公开(公告)号：EP0758140A2

公开(公告)日：1997-02-12

申请号：EP96112563.0

申请日：1996-08-02

申请人： HITACHI, LTD.

发明人： Takami, Sho ,  Otaka, Tadashi

IPC分类号： H01J37/28

CPC分类号： H01J37/28

摘要： In the electron microscope, a degree of sample contamination caused by irradiating electron beams to a sample (4) can be suppressed to an allowable range. The electron microscope is comprised of: means (5) for directly measuring an electron beam irradiation current to a sample; time measuring means (T) for measuring irradiation time of electron beams to an observation region on the sample; and means (CPU) for calculating a dose of the electron beams irradiated to the observation region based upon the measured electron beam irradiation current, the measured electron beam irradiation time, and preset observation magnification.

摘要翻译： 在电子显微镜中，通过向样品（4）照射电子束而引起的样品污染程度可以被抑制到允许的范围。 电子显微镜包括：用于直接测量样品的电子束照射电流的装置（5） 时间测量装置（T），用于测量电子束对样品上的观察区域的照射时间; 和用于根据测量的电子束照射电流，测量的电子束照射时间和预设的观察放大率计算照射到观察区域的电子束的剂量的装置（CPU）。

公开(公告)号：EP0592899A1

公开(公告)日：1994-04-20

申请号：EP93115912.3

申请日：1993-10-01

申请人： HITACHI, LTD.

发明人： Sato, Mitsugu ,  Todokoro, Hideo ,  Otaka, Tadashi

IPC分类号： H01J37/244

CPC分类号： H01J37/244 ,  H01J2237/2443 ,  H01J2237/28

摘要： Provided between an optical axis of a primary electron beam 4 directed to a specimen 7 and a secondary electron detector 50 for detecting secondary electrons 9 emitted from the specimen 7 is a shielding electrode 12 which has a transparency for the secondary electrons 9 and has a shielding effect for an attracting electric field 54 produced by the secondary electron detector 50. An opposed electrode 11 is provided at a position facing the shielding electrode 12 to put the optical path of the electron beam 4 therebetween. Applied across the shielding electrode 12 and the opposed electrode 11 is a voltage which produces a deflecting electric field E in the electron beam path. The deflecting electric field E deflects the secondary electrons 9 to the shielding electrode 12 side to pass the secondary electrons therethrough before they are captured by the secondary electron detector 50. Optical axis correction coils 19 and 20 are provided for generating a magnetic field B to correct an orbit of the primary electron beam bent by the deflecting electric field E.

摘要翻译： 在从试样7射出的一次电子束4的光轴与从试样7发射的二次电子9的二次电子检测器50之间设置有对二次电子9具有透明性的屏蔽电极9， 对由二次电子检测器50产生的吸引电场54的影响。相对电极11设置在面对屏蔽电极12的位置，以将电子束4的光路放在其间。 穿过屏蔽电极12和相对电极11的是在电子束路径中产生偏转电场E的电压。 偏转电场E将二次电子9偏转到屏蔽电极12侧，以在二次电子被二次电子检测器50捕获之前使二次电子通过。光轴校正线圈19和20被设置用于产生磁场B以校正 由偏转电场E弯曲的一次电子束的轨道

公开(公告)号：EP0548573A3

公开(公告)日：1994-03-09

申请号：EP92120110.9

申请日：1992-11-25

申请人： HITACHI, LTD. ,  Hitachi Instrument Engineering Co., Ltd. ,  HITACHI SCIENCE SYSTEMS LTD

发明人： Otaka, Tadashi ,  Okura, Akimitsu ,  Iwamoto, Hiroshi ,  Todokoro, Hideo ,  Komoda, Tsutomu ,  Tobita, Issei

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J2237/2448 ,  H01J2237/281

摘要： An electron beam apparatus comprises an electron beam source, a unit for irradiating an electron beam (6) on a specimen (12), a detector (30) for secondary electrons, an electrode (7) for generating an electric field sufficient to draw out secondary electrons in a recess in the specimen from the recess, and a unit (2) for generating a magnetic field for focusing secondary electrons drawn out of the recess. With this construction, the secondary electrons drawn out of the recess by the electric field reach the detector without being attracted by the electrode. By adopting this construction, a contact hole of high aspect ratio formed in a semiconductor device and having a small diameter and a large depth can be observed.

摘要翻译： 电子束装置包括电子束源，用于在样本（12）上照射电子束（6）的单元，用于二次电子的检测器（30），用于产生足以抽出的电场的电极（7） 二次电子从凹槽中进入试样的凹槽中;以及一个单元（2），用于产生磁场以聚集从凹槽中引出的二次电子。 利用这种结构，通过电场从凹槽中抽出的二次电子到达检测器而不被电极吸引。 通过采用这种结构，可以观察到在半导体器件中形成的具有高直径比并且具有小直径和大深度的接触孔。

公开(公告)号：EP0523699A1

公开(公告)日：1993-01-20

申请号：EP92112170.3

申请日：1992-07-16

申请人： HITACHI, LTD.

发明人： Otaka, Tadashi ,  Ichihashi, Mikio

IPC分类号： H01J37/18 ,  H01J37/073

CPC分类号： H01J37/18 ,  H01J37/073

摘要： Improvements in a charged particle beam apparatus are contemplated and especially a column structure incorporating a superhigh vacuum evacuation system (100) is provided which is reduced in size and weight and has high performance. In order to evacuate surrounding space of a charged particle source (1) to superhigh vacuum, ion pumps (200, 202) are built in a vacuum enclosure of a column (13). Each ion pump includes a magnet unit 15, a yoke (14) and an electrode (16), and the magnet unit (15) per se is built in the vacuum enclosure. A charged particle beam focusing optics (100) for focusing and deflecting a charged particle beam (2) from the charged particle beam source (1) is arranged in a space which is defined interiorly of the yoke (14). The column structure can be reduced in size and weight and a charged particle beam apparatus having high performance can be obtained.

摘要翻译： 考虑了带电粒子束装置的改进，并且特别地提供了包括超高真空排气系统（100）的柱结构，其减小了尺寸和重量并且具有高性能。 为了排空带电粒子源（1）的周围空间以超高真空，将离子泵（200,202）内置在塔（13）的真空外壳中。 每个离子泵包括磁体单元15，磁轭（14）和电极（16），并且磁体单元（15）本身被内置在真空外壳中。 用于使带电粒子束（2）从带电粒子束源（1）聚焦和偏转的带电粒子束聚焦光学器件（100）布置在限定在轭（14）内部的空间中。 柱结构的尺寸和重量可以减小，并且可以获得具有高性能的带电粒子束装置。

公开(公告)号：EP0422655A2

公开(公告)日：1991-04-17

申请号：EP90119523.0

申请日：1990-10-11

申请人： HITACHI, LTD.

发明人： Otaka, Tadashi

IPC分类号： H01J37/20

CPC分类号： H01J37/20

摘要： The charged-particle beam apparatus according to this invention is of the type in which a specimen is inserted between the upper and lower magnetic poles of an objective lens (1), and is constructed such that stages (9a, 9b, 11, 12), which are used to move a specimen in a desired direction, are mounted one on top another from the bottom wall of the objective lens (1), thus preventing the specimen from being affected by external vibration. Devices (9c, 30, 31, 32, 33, 100), which do not generate a magnetic field, are used to drive the stages. This enables the drive devices to be directly connected to the stages, so that the stages are moved accurately.

摘要翻译： 根据本发明的带电粒子束装置是将样本插入在物镜（1）的上下磁极之间的类型，并且被构造成使得级（9a，9b，11,12） 用于沿期望的方向移动样本，从物镜（1）的底壁一个地安装在另一个上，从而防止样本受到外部振动的影响。 不产生磁场的装置（9c，30,31,32,33,100）用于驱动该级。 这使得驱动装置能够直接连接到级，使得这些级被精确地移动。

公开(公告)号：EP0321925A3

公开(公告)日：1990-04-11

申请号：EP88121303.7

申请日：1988-12-20

申请人： HITACHI, LTD.

发明人： Tsutsumi, Yoshitsugu ,  Ueda, Shinjiro ,  Otaka, Tadashi

IPC分类号： H01J37/18 ,  H01J37/02

CPC分类号： H01J37/18

摘要： An analysis system in which air in a specimen exchange chamber is evacuated by an oil-sealed rotary vacu­um pump and which employs electron incorporates a purge gas supply means at the inlet side of the oil-sealed rotary vacuum pump. The purge gas supply means supplies a small quantity of purge gas when the air in the specimen exchange chamber is evacuated to the almost ultimate pressure of the pump.

公开(公告)号：EP0335398A1

公开(公告)日：1989-10-04

申请号：EP89105637.6

申请日：1989-03-30

申请人： HITACHI, LTD.

发明人： Otaka, Tadashi

IPC分类号： H01J37/20

CPC分类号： H01J37/28

摘要： A scanning electron microscope for observing and measuring a minute pattern of a sample (2) comprising an electron lens (1) for focusing an electron beam (4) from an electron source onto the sample (2), wherein the electron beam (4) scans on the sample (2), an inclining means for inclining the sample (2) at an arbitrary angle α, and two secondary electron detectors (3a, 3b) disposed at positions which are respectively turned at the same angle ϑ around the central axis of the electron beam (4) from a plane which contains the axis of inclination of the sample (2) and the central axis of the electron beam (4).
As it is possible to measure the length of the minute pattern by detecting the secondary electron signal (5a, 5b) having a symmetrical wave-form while observing the minute pat­tern at the arbitrary angle, high measuring accuracy is at­tained.

摘要翻译： 一种扫描电子显微镜，用于观察和测量包括用于将电子束（4）从电子源聚焦到样品（2）上的电子透镜（1）的样品（2）的微小图案，其中电子束（4） 对样品（2）进行扫描，用于将样品（2）以任意角度α倾斜的倾斜装置和设置在分别以相同角度θ绕中心轴线转动的位置的两个二次电子检测器（3a，3b） 的电子束（4）从包含样品（2）的倾斜轴线和电子束（4）的中心轴的平面移动。 通过检测具有对称波形的二次电子信号（5a，5b）可以以任意角度观察微小图案，可以测量微小图案的长度，从而获得高测量精度。

公开(公告)号：EP0321925A2

公开(公告)日：1989-06-28

申请号：EP88121303.7

申请日：1988-12-20

申请人： HITACHI, LTD.

发明人： Tsutsumi, Yoshitsugu ,  Ueda, Shinjiro ,  Otaka, Tadashi

IPC分类号： H01J37/18 ,  H01J37/02

CPC分类号： H01J37/18

摘要： An analysis system in which air in a specimen exchange chamber is evacuated by an oil-sealed rotary vacu­um pump and which employs electron incorporates a purge gas supply means at the inlet side of the oil-sealed rotary vacuum pump. The purge gas supply means supplies a small quantity of purge gas when the air in the specimen exchange chamber is evacuated to the almost ultimate pressure of the pump.

摘要翻译： 通过油密封的旋转式真空泵将试样更换室内的空气排出并使用电子的分析系统在油封旋转式真空泵的入口侧包含净化气体供给单元。 当将样品更换室中的空气抽空到泵的几乎最终的压力时，吹扫气体供给装置提供少量吹扫气体。

公开(公告)号：EP1028452B1

公开(公告)日：2012-03-28

申请号：EP00109452.3

申请日：1993-10-15

申请人： Hitachi, Ltd.

发明人： Todokoro, Hideo ,  Otaka, Tadashi

IPC分类号： H01J37/28 ,  H01J37/244

CPC分类号： H01J37/18 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/04756 ,  H01J2237/057 ,  H01J2237/18 ,  H01J2237/204 ,  H01J2237/244

公开(公告)号：EP0949653B1

公开(公告)日：2010-02-17

申请号：EP99111213.7

申请日：1992-11-25

申请人： Hitachi, Ltd. ,  Hitachi Science Systems, Ltd.

发明人： Otaka, Tadashi ,  Okura, Akimitsu ,  Iwamoto, Hiroshi ,  Todokoro, Hideo ,  Komoda, Tsutomu ,  Tobita, Issei

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J2237/2448 ,  H01J2237/281