Synchrotron radiation source and method of making the same
    2.
    发明公开
    Synchrotron radiation source and method of making the same 失效
    同步辐射源及其制备方法

    公开(公告)号:EP0315134A3

    公开(公告)日:1990-01-24

    申请号:EP88118226.5

    申请日:1988-11-02

    IPC分类号: H05H7/00

    CPC分类号: H05H7/00

    摘要: A synchrotron radiation source and a method of making the same are concerned. An assembly of a beam absorber (1) for synchrotron radiation beams and a piping (2) for cooling the beam absorber (1) is mounted in a charged particle beam duct (5) of a bending section (10) for bending a charged particle beam. Fixed to at least one of straight ducts (8) connectable to the opposite ends of the charged particle beam duct (5) is a piping guide duct (7) through which the beam absorber cooling piping (2) is drawn to the outside, so that the assembly of the beam absorber (1) and beam absorber cooling piping (2) can readily be mounted in the synchrotron radiation source.

    Synchrotron radiation source and method of making the same
    3.
    发明公开
    Synchrotron radiation source and method of making the same 失效
    Synchrotronstrahlungsquelle und Methodefürihre Herstellung。

    公开(公告)号:EP0315134A2

    公开(公告)日:1989-05-10

    申请号:EP88118226.5

    申请日:1988-11-02

    IPC分类号: H05H7/00

    CPC分类号: H05H7/00

    摘要: A synchrotron radiation source and a method of making the same are concerned. An assembly of a beam absorber (1) for synchrotron radiation beams and a piping (2) for cooling the beam absorber (1) is mounted in a charged particle beam duct (5) of a bending section (10) for bending a charged particle beam. Fixed to at least one of straight ducts (8) connectable to the opposite ends of the charged particle beam duct (5) is a piping guide duct (7) through which the beam absorber cooling piping (2) is drawn to the outside, so that the assembly of the beam absorber (1) and beam absorber cooling piping (2) can readily be mounted in the synchrotron radiation source.

    摘要翻译: 同步加速器辐射源及其制造方法。 用于同步加速器辐射束的光束吸收器(1)和用于冷却光束吸收体(1)的管道(2)的组件安装在用于弯曲带电粒子的弯曲部分(10)的带电粒子束管道(5) 光束。 固定在可连接到带电粒子束管道(5)的相对端的直管(8)中的至少一个是管道导管(7),吸收梁冷却管道(2)通过该管道导管 波束吸收器(1)和束吸收器冷却管道(2)的组件可以容易地安装在同步加速器辐射源中。

    Turbomolecular vacuum pump
    5.
    发明公开
    Turbomolecular vacuum pump 失效
    Turbomolekular-Vakuumpumpe。

    公开(公告)号:EP0121673A1

    公开(公告)日:1984-10-17

    申请号:EP84101198.4

    申请日:1984-02-06

    申请人: HITACHI, LTD.

    IPC分类号: F04D19/04

    CPC分类号: F04D19/048 F16C2360/45

    摘要: This invention relates to a turbomolecular vacuum pump (1) of the type having stator blades (10) which are disposed in multistage fashion within a casing (2) and in the axial direction thereof, and rotor blades (11) which are located between the respectively adjacent stator blades (10) and which are disposed on the outer periphery of a rotor (12) situated centrally of the casing (2). A motor rotor (17) is fixed to a rotating member (5) which is formed of the rotor (12) having the rotor blades (11) fixed to its outer periphery, and a motor stator (18) opposite to the motor rotor (17) is arranged to construct the drive mechanism of the rotating member (5). The rotating member (5) is supported at its lower part by a pivot type plain bearing (15). A magnetic bearing (20) is arranged in a manner to oppose between the lower end of the rotor (12) and a supporting member (6) for the rotating member (5).

    摘要翻译: 本发明涉及一种具有定子叶片(10)类型的涡轮分子真空泵(1),它们以多级的方式设置在壳体(2)内并在其轴向方向上,转子叶片(11)位于 分别相邻的定子叶片(10)并且设置在位于壳体(2)中心的转子(12)的外周上。 电动机转子(17)固定在由转子叶片(11)固定在其外周上的转子(12)和与电动机转子相对的电动机定子(18)的旋转部件(5) 17)被构造成构成旋转构件(5)的驱动机构。 旋转构件(5)通过枢轴式滑动轴承(15)在其下部支撑。 磁性轴承(20)以与转子(12)的下端和旋转部件(5)的支撑部件(6)相对的方式配置。

    Synchrotron radiation generation apparatus
    8.
    发明公开
    Synchrotron radiation generation apparatus 失效
    同步辐射发生装置

    公开(公告)号:EP0388123A3

    公开(公告)日:1991-07-10

    申请号:EP90302611.0

    申请日:1990-03-12

    IPC分类号: H05H7/04 H01J41/12

    CPC分类号: H05H7/04 H01J41/12

    摘要: Synchrotron radiation is generated when a base of charged particles is bent by a bending magnet. The synchrotron radiation passes down a lead-out duct (3) as the total number of pumps is limited by the size of the apparatus and many pumps are needed in order to achieve a good vacuum. An ion pump (4) has a main magnetic field (13), normally generated by a magnet (12) of the ion pump (4) which controls the behaviour of the electrons in the ion pump (4). However, the leakage magnetic field (14) of the bending magnet effects the ion pump (4), and therefore the ion pump (4) is arranged so that its main magnetic field (13) is aligned with the leakage magnetic field (14) at the ion pump (4), or at least with a main component thereof. In this way, the effect of the leakage magnetic field (14) on the ion pump (4) is reduced. Indeed, it is possible to use the leakage magnetic field (14) as the main magnetic field of the ion pump (4).