摘要:
The invention relates to an ion beam scanner system with ion sourcing equipment, an ion accelerator system and ion beam guide, containing an outlet aperture for a converging, centred ion beam and a mechanical alignment system for the target volume which is to be scanned. For this purpose, the ion accelerator system can be set to the acceleration required for maximum penetration depth of the ions. In addition, the scanning system has an energy absorption element, which is mounted in the path of the beam crosswise to the centre of the beam, between the target volume and the ion beam outlet aperture. The energy absorption element can be displaced crossways to the centre of the ion beam to vary the beam's energy, so that modulation of the ion beam depth which is effected by a linear motor and transversal displacement of the energy absorption element can be carried out in rapid succession by depthwise graduated scanning on volumetric elements of the target volume. The invention also relates to a method for ion-beam scanning and to a method for operating an ion-beam scanner system using a gantry system.
摘要:
A radiotherapy apparatus comprises a first collimator and a second collimator, the first collimator being a multi-leaf collimator, the second collimator comprising a plurality of slits having a width which is a fraction of the width of the leaves of the first collimator, the first and second collimators being aligned such that each slit of the second collimator is associated with a leaf of the first collimator. A first irradiation is made, during which the first collimator will define the outer edge of the irradiation pattern, and the second collimator will serve to narrow the effective width of each leaf of the first collimator. This narrowing is a simple function of the relative widths of the slits of the second collimator and the leaves of the first. This will leave gaps in between the slits of the second collimator, which can then be filled by moving one ore more of the patient, first and second collimators, so as to irradiate an area omitted in the first irradiation. In this second irradiation, the positions of the leaves of the first collimator are adjusted as necessary. This process is then repeated until the entire target area has been irradiated. Suitable values for the fraction are 1/2, 1/3, 1/4 or 1/5.
摘要:
An algorithm to generate discrete beam intensity modulation by dynamic multileaf collimation (MLC) is described which incorporates constraints on minimum allowed leaf separations. MLC positioning information is derived simultaneously for all leaf pairs and backup diaphragms as they progress across the field and a feedback mechanism allows corrections to be applied to eliminate potential violations of minimum separation conditions and any underexposure in the inter-leaf-tongue-and-groove region as they are encountered. The resulting motion correctly delivers the intended modulation and is physically realisable. Results of the algorithm can also alternatively be interpreted as defining a series of static fields to deliver the same modulation.
摘要:
A film area exposure apparatus has a holding assembly (102) for holding a film, and a first support assembly (106) connected to and supporting the holding assembly (102). The apparatus has an exposure area control assembly (104) located adjacent the holding assembly (102) and forming an adjustable opening (114) to expose a selected area of the film, and a second support assembly (110) connected to and supporting the exposure area control assembly (104). The first support assembly (106) supports the film assembly (102) for movement upward, downward, forward and rearward, and for pivotal movement about horizontal and vertical axes. The second support assembly (110) supports the exposure control assembly (104) for forward and rearward movement, and for pivotal movement about horizontal and vertical axes. The exposure control assembly (104) includes a frame (134) and a multitude of slats (136) supported by the frame, and the slats may be moved to vary the size, shape, and position of the adjustable opening (114) formed by the control assembly. The apparatus is well suited for seamless topographic imaging of large single crystal wafers.