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    SPECTROMETRIC PROCESS MONITORING
    83.
    发明公开
    SPECTROMETRIC PROCESS MONITORING 审中-公开
    光谱过程监控

    公开(公告)号：EP1495292A1

    公开(公告)日：2005-01-12

    申请号：EP02797486.4

    申请日：2002-12-23

    Applicant: Spectral Dimensions, Inc.

    Inventor： LEWIS, E., Neil ,  HABER, Kenneth, S.

    IPC: G01J3/28 ,  G01J3/51

    CPC classification number: G01J3/02 ,  G01J3/0218 ,  G01J3/0229 ,  G01J3/26 ,  G01J3/28 ,  G01J3/2803 ,  G01J3/42 ,  G01J3/51 ,  G01N21/31 ,  G01N21/65 ,  G01N2021/651

    Abstract: Spectrometric apparatus (10) that include an array of detector elements (28) and exhibits a number of capabilities is disclosed. The elements (28) can be responsive to incident radiation to produce an output signal that includes information from the incident radiation. A spectrally selective element (26) can be located in an optical path between the radiation source (14) and the array (28), with an analysis module (18) responsive to the output signal operative to analyze spatial distribution of spectral information received by the array (28). The apparatus can also correct for differences in intensity and spectral variability for spectral image signals and/or compare the spectral image signals with a pattern in spatial-spectral coordinate space. Detector elements (28) can be responsive to scattering, and spatial information in their output can be analyzed.

    HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE
    84.
    发明公开
    HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE 审中-公开
    高分辨率光谱测量

    公开(公告)号：EP1485686A2

    公开(公告)日：2004-12-15

    申请号：EP03744588.9

    申请日：2003-01-15

    Applicant: Cymer, Inc.

    Inventor： SANDSTROM, Richard, L. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  SMITH, Scott, T. ,  BROWN, Daniel, J., W.

    IPC: G01J3/18

    CPC classification number: G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

    Abstract: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser (D) illuminates an etalon (ET). A portion of its light exiting the etalon (ET) is collected and directed into a slit (S1) positioned at a fringe pattern of the etalon (ET). Light passing through the slit (S1) is collimated and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon (ET) and the grating (GR1) are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array (PDA) and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array (PDA). Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer (50), and the etalon (ET) can be scanned.

    Optical shutter
    86.
    发明公开
    Optical shutter 有权
    光学快门

    公开(公告)号：EP1482346A1

    公开(公告)日：2004-12-01

    申请号：EP04252896.8

    申请日：2004-05-19

    Applicant: Alps Electric Co., Ltd.

    Inventor： Someno, Yoshihiro ,  Ohgoshi, Seiichi

    IPC: G02B26/00 ,  G01J3/26

    CPC classification number: G01J3/26 ,  G02B5/005

    Abstract: An optical shutter (1) including a multi-layer fixed filter (2) and a multi-layer movable filter (3) arranged with a gap (4) therebetween controls the transmittance of light passing through the multi-layer filters. The optical shutter includes minute driving elements (5) provided on the movable filter. Operating the minute driving elements varies a distance of the gap defined between the fixed filter and the movable filter. Operation of the movable filter is restricted by a stopper (7) that comes into contact with the movable filter when the gap has the maximum distance and by a bump (2a) formed on the fixed filter. The minute driving elements are joined to the movable filter with elastic bonding layers (6) therebetween.

    Abstract translation: 包括其间布置有间隙（4）的多层固定滤光器（2）和多层可移动滤光器（3）的光学快门（1）控制穿过多层滤光器的光的透射率。 光学快门包括设置在可移动滤波器上的微小驱动元件（5）。 操作微小驱动元件改变了固定过滤器和可移动过滤器之间限定的间隙的距离。 可动过滤器的操作受限于当间隙具有最大距离时与可移动过滤器接触并且通过形成在固定过滤器上的凸起（2a）与止动器（7）接触。 微小驱动元件通过其间的弹性结合层（6）连接到可移动过滤器。

    Wavelength locker and optical systems using the same
    88.
    发明公开
    Wavelength locker and optical systems using the same 审中-公开
    波长从动并且因此工作光学系统

    公开(公告)号：EP1321750A3

    公开(公告)日：2004-11-10

    申请号：EP02025297.9

    申请日：2002-11-13

    Applicant: Coretek, Inc.

    Inventor： Vakhshoori, Daryoosh ,  Azimi, Masud ,  Johnson, Bartley C. ,  Huang, Rong

    IPC: G01J3/26 ,  H01S5/0687 ,  G02B26/00

    CPC classification number: G02B26/001 ,  G01J3/26 ,  H01S5/0687

    Abstract: Apparatus for use in tuning a tunable optical device to a target wavelength, the apparatus comprising: a beam splitter (205) for tapping a portion of the light emerging from the tunable optical device (105); a walk-off reflector (210) for dividing the portion of the light emerging from the beam splitter into a plurality of beams (B 1 ,B 2 ,...); a multiple etalon (215) for tailoring the light from at least two of the plurality of beams provided by the walk-off reflector; a multiple detector (220) for detecting light from the multiple etalon and the walk-off reflector, the multiple detector providing a plurality of output signals (I 1 ,I 2 ,...); and a control unit (225) for controlling the tunable optical device by providing a control signal to the tunable optical device according to the output signals provided by the multiple detector.

    WAVELENGTH MONITORING SYSTEM
    90.
    发明公开
    WAVELENGTH MONITORING SYSTEM 审中-公开
    波长监控系统

    公开(公告)号：EP1356256A1

    公开(公告)日：2003-10-29

    申请号：EP01994402.4

    申请日：2001-12-27

    Applicant: Coretek, Inc.

    Inventor： PARVIZ, Tayebati

    IPC: G01J3/18 ,  G01J3/26

    CPC classification number: G01J9/00 ,  G01J3/26

    Abstract: A wavelength monitoring system (100) for continuously monitoring the wavelengths of different optical channels transmitted through a wavelength division multiplexed (WDM) fiberoptic system. In one construction, an optical diffraction grating (110) is used to disperse the light being monitored onto a rotating polygon (115) having mirrors (120) on the facets (125) thereof, such that the rotating polygon (115) reflects the light onto a detector (130) located behind a slit (135). In a second construction, the light is projected onto a rotating, hollow transparent cylinder (210) having a thin film (215) deposited on a surface thereof, wherein the thin filter (215) comprises a Fabry-Perot structure which has a gap which varies as a function of its position on the rim of the cylinder, such that the varying gap allows for a varying transmission wavelength which varies as a function of angular position. A detector (225) is positioned in the interior of the cylinder to detect light passing through the filter (215).

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