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    SPECTROMETRY DEVICE
    2.
    发明公开
    SPECTROMETRY DEVICE 审中-实审

    公开(公告)号：EP4403891A1

    公开(公告)日：2024-07-24

    申请号：EP22869815.5

    申请日：2022-09-01

    Applicant: National University Corporation Kagawa University

    Inventor： ISHIMARU, Ichiro

    IPC: G01J3/453 ,  G01J3/02

    CPC classification number: G01J3/453 ,  G01J3/02

    Abstract: A spectrometry device 1 includes: a collimating optical system 15 configured to collimate object light from a measurement point a on a sample S; a photodetector 21 having a light-receiving face in which a plurality of pixels are arrayed in a predetermined direction; a conjugate plane imaging optical system 11 provided between the sample and the collimating optical system to form a plane optically conjugate with respect to a surface of the sample; an amplitude-type diffraction grating 1 disposed on the conjugate surface and having a light incident face on which the object light is incident or a light emission face from which the object light is emitted, the light incident face or the light emission face being formed by a light-shielding member made of a material having a light shielding rate higher than that of silicon in a wavelength band of the object light and provided with a plurality of openings, an optical path length differentiating optical system 16 configured to divide collimated object light into a first light beam and a second light beam to provide an optical path length difference; and an interference optical system 17 configured to cause the first light beam and the second light beam provided with the optical path length difference to interfere with each other to form an interference image on the light-receiving face along the predetermined direction.

    GASMESSSYSTEM
    4.
    发明公开
    GASMESSSYSTEM 审中-公开

    公开(公告)号：EP3401666A1

    公开(公告)日：2018-11-14

    申请号：EP17170667.4

    申请日：2017-05-11

    Applicant: Mettler-Toledo GmbH

    Inventor： Venturini, Francesca ,  Bergström, Pär ,  Hertel, Martin

    IPC: G01N21/25 ,  G01J3/02 ,  G01J3/42 ,  G01N21/39

    CPC classification number: G01N21/031 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/42 ,  G01J2003/423 ,  G01N21/3504 ,  G01N21/39 ,  G01N2021/399 ,  G01N2201/0634 ,  G01N2201/0638

    Abstract: Gasmesssystem, umfassend eine kohärente Lichtquelle (1, 201, 301, 401), welche einen Lichtstrahl aussendet; einen Detektor (8, 208, 308, 408); einen Strahlengang (2, 202, 302), der zwischen der Lichtquelle (1, 201, 301, 401) und dem Detektor (8, 208, 308, 408), ausgebildet ist; und eine Gas-Zelle (4, 204, 304, 404), welche im Strahlengang zwischen der Lichtquelle (1, 201, 301, 401) und dem Detektor (8, 208, 308, 408) angeordnet ist, so dass der Detektor (8, 208, 308, 408) das durch die Gas-Zelle (4, 204, 304, 404) transmittierte Licht empfängt; wobei die Gas-Zelle (4, 204, 304, 404) eine poröse Keramik (11, 211, 311, 411) umfasst; und wobei die Gas-Zelle (4, 204, 304, 404) eine optische Weglänge aufweist, welche ein Vielfaches der tatsächlichen Schichtdicke der Gas-Zelle (4, 204, 304, 404) ist; dadurch gekennzeichnet, dass ferner ein optisches Element (3, 203, 303, 403) im Strahlengang (2, 202, 302) zwischen der Lichtquelle (1, 201, 301, 401) und der Gas-Zelle (4, 204, 304, 404) angeordnet ist; dass der von der Lichtquelle (1, 201, 301, 401) ausgesandte Lichtstrahl beim Eintritt in die Gas-Zelle (4, 204, 304, 404) aufgeweitet und unfokussiert ist.

    System for the calibration of operating parameters of a laser engraver
    5.
    发明授权
    System for the calibration of operating parameters of a laser engraver 有权

    公开(公告)号：EP2435888B1

    公开(公告)日：2018-10-31

    申请号：EP10724422.0

    申请日：2010-05-31

    Applicant: Entrust Datacard Corporation

    Inventor： BERTHE, Benoît ,  BIELESCH, Ulrich

    IPC: G01J3/28 ,  G01J3/02 ,  G01J1/02 ,  B23K26/70

    CPC classification number: B23K26/032 ,  B23K26/702 ,  G01J1/02 ,  G01J3/02 ,  G01J3/28

    Abstract: The present invention concerns a system for the calibration of at least one parameter of a laser engraver, the laser engraver comprising on one hand an engraving system with a focusing lens positioned at a distance of the surface of an substrate intended to be engraved and on the other hand a vision system for at least the positioning and the verification of the engraving, the vision system including a camera associated with an appropriate illumination and, wherein the engraving device of the laser is arranged in such way that the engraving device works to engrave a substrate with specific engraved layout corresponding to variation of at least one parameter and wherein the vision system is connected to a comparison device of at least one measured engraved parameter with the template value of at least one stored data in a memorization device connected to a engraving correction device.

    ANALYSIS DEVICE
    10.
    发明授权
    ANALYSIS DEVICE 有权

    公开(公告)号：EP2551661B1

    公开(公告)日：2018-04-11

    申请号：EP11759117.2

    申请日：2011-02-21

    Applicant: NEC Solution Innovators, Ltd.

    Inventor： KAMIMURA, Ippei

    IPC: G01N21/35 ,  G01J3/36 ,  G01J3/51 ,  G01N21/27 ,  G02B5/18 ,  G01J3/18 ,  G01J3/10 ,  G02B5/20

    CPC classification number: G01J3/02 ,  G01J3/10 ,  G01J3/18 ,  G01J3/36 ,  G01J3/42 ,  G01N21/255 ,  G01N21/274 ,  G01N21/31 ,  G01N21/35 ,  G01N21/3563 ,  G01N21/3577 ,  G01N2021/3166 ,  G01N2021/3177 ,  G02B5/1809 ,  G02B5/201 ,  G02B5/203

    Abstract: This analysis device is capable of handling analysis of a wide variety of components while suppressing an increase in device size is provided. The analysis device (1) is provided with a light emitting unit (10), a transmissive spectral filter (22), a light detector (23), and an analysis unit (31). The spectral filter (22) is provided with a light transmissive substrate, a plurality of raised portions formed with a first metal material on one surface of the substrate, and a metal film formed using a second metal material having a higher refractive index than the first metal material, so as to cover the raised portions and the one surface. The raised portions are disposed such that the metal film existing between the raised portions serves as a diffraction grating and the raised portions serve as a waveguide. The grating pitch of the diffraction grating, the height of the raised portions and the thickness of the metal film are set to a different value for each portion of the spectral filter, such that the wavelength of the transmitted light of the spectral filter changes for each of the portions. The light detector (23) is disposed such that each light receiving element (24) receives transmitted light of the spectral filter. The analysis unit (31) acquires the spectrum of the object (40) from the output signals of the light receiving elements (24).

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