GEMSTONE INSPECTION
    4.
    发明授权
    GEMSTONE INSPECTION 有权
    宝石检验

    公开(公告)号:EP2825322B1

    公开(公告)日:2018-04-25

    申请号:EP13712504.3

    申请日:2013-03-13

    申请人: De Beers UK Ltd

    摘要: There is described an apparatus and method for inspecting and optionally sorting gemstones. The apparatus includes a nozzle or array of nozzles operatively connected to a vacuum pump such that a gemstone located generally underneath one of the nozzles will be supported against that nozzle by air pressure when a vacuum is applied above the nozzle. A drive system moves the nozzles along a path past a gemstone pick-up location so that a gemstone can be picked up by each nozzle as that nozzle passes the pick-up location. One or more measurement devices are located on or near the predetermined path and configured to measure at least one property of the gemstone. One or more ejection locations are provided on the path at which the vacuum applied to each nozzle is reversible to eject the gemstone from that nozzle. The apparatus may also include a plurality of dispensing bins into which the gemstones are dispensed. The bin into which each gemstone is dispensed is chosen in dependence on the measured property.

    AUTOMATED FTIR SPECTROMETER
    6.
    发明公开

    公开(公告)号:EP3356804A1

    公开(公告)日:2018-08-08

    申请号:EP16777764.8

    申请日:2016-09-29

    申请人: De Beers UK Ltd

    IPC分类号: G01N21/87

    摘要: A system for placing a sample at a predefined measurement location for measuring an optical property of that sample. The apparatus includes a measurement platform for supporting the sample at the measurement location, the measurement platform having an orifice therein beneath the measurement location, and a nozzle configured to retain the sample therein when a vacuum is applied to the nozzle. The sample is contacted by the nozzle, and a vacuum is applied to the nozzle so that the sample is retained therein by air pressure. The nozzle with the sample retained therein is then transported to the measurement location. The vacuum at the nozzle is disabled to release the sample from the nozzle, and a vacuum is applied to the orifice in the measurement platform so as to retain the sample on the measurement platform. The nozzle is then retracted away from the measurement platform.