LENS ARRAY PHOTOLITHOGRAPHY
    1.
    发明公开
    LENS ARRAY PHOTOLITHOGRAPHY 失效
    镜头组件光刻。

    公开(公告)号:EP0670052A1

    公开(公告)日:1995-09-06

    申请号:EP94906428.0

    申请日:1993-11-15

    IPC分类号: G02B3 G02B5 G03B27 G03F7

    摘要: Microlithography techniques have provided a means for the development of many useful devices from microcircuits, which made the computer era possible, to micromechanical devices such as motors that are only a few tens of microns across. A new use of a microdevice is presented here which serves to 'payback' the art of microlithography as it is a significant contribution thereto. The device of the invention is a unique microdevice made with advanced microlithography techniques which when completed can be used as a new exposure tool for microlithography. A lens array can be as thin as 1/40 of the thickness of the page that this text is printed on, yet have thereon an arrangement of optical lenses powerful enough to replace very sophisticated and bulky, million dollar precision optics. An array of lenses can be fabricated with binary optical device and other techniques. The array having unlimited area and field of regard can be used as an exposure tool for very large area microdevices such as flat panel displays without the requirement of step and repeat operations which severely limit the throughput and yield in modern manufacturing methods.

    LENS ARRAY PHOTOLITHOGRAPHY.
    2.
    发明公开
    LENS ARRAY PHOTOLITHOGRAPHY. 失效
    LINSENANORDNUNGFÜRFOTOLITOGRAFIE。

    公开(公告)号:EP0670052A4

    公开(公告)日:1995-10-25

    申请号:EP94906428

    申请日:1993-11-15

    摘要: Microlithography techniques have provided a means for the development of many useful devices from microcircuits, which made the computer era possible, to micromechanical devices such as motors that are only a few tens of microns across. A new use of a microdevice is presented here which serves to 'payback' the art of microlithography as it is a significant contribution thereto. The device of the invention is a unique microdevice made with advanced microlithography techniques which when completed can be used as a new exposure tool for microlithography. A lens array can be as thin as 1/40 of the thickness of the page that this text is printed on, yet have thereon an arrangement of optical lenses powerful enough to replace very sophisticated and bulky, million dollar precision optics. An array of lenses can be fabricated with binary optical device and other techniques. The array having unlimited area and field of regard can be used as an exposure tool for very large area microdevices such as flat panel displays without the requirement of step and repeat operations which severely limit the throughput and yield in modern manufacturing methods.

    摘要翻译: 微光刻技术为微电路开发许多有用的器件提供了手段,这些器件使得计算机时代成为可能,而微电子器件例如跨越仅几十微米的电机。 这里介绍微型设备的新用途,它可以“回报”微光刻技术,因为它是一项重要贡献。 本发明的装置是利用先进的微光刻技术制成的独特的微装置,其在完成时可用作用于微光刻的新曝光工具。 透镜阵列可以薄至印刷本文的页面厚度的1/40,但其上具有足够强度的光学透镜布置以取代非常复杂和庞大的百万美元精密光学元件。 可以用二元光学装置和其他技术制造一系列透镜。 具有无限的面积和视场的阵列可以用作非常大面积的微型设备(例如平板显示器)的曝光工具,而不需要步进和重复操作,这严重限制了现代制造方法中的生产量和产量。