公开(公告)号：EP0670052A1

公开(公告)日：1995-09-06

申请号：EP94906428.0

申请日：1993-11-15

申请人： BROOK, John ,  PAGE, Joseph

发明人： HUGLE, William Bell ,  DANDLIKER, René ,  HERZIG, Hans, Peter

IPC分类号： G02B3 ,  G02B5 ,  G03B27 ,  G03F7

CPC分类号： G03F7/70791 ,  G02B3/0018 ,  G02B3/0056 ,  G02B3/0062 ,  G02B5/1876 ,  G02B5/1885 ,  G03F7/0005 ,  G03F7/2002 ,  G03F7/70275 ,  G03F7/70316 ,  G03F7/70475

摘要： Microlithography techniques have provided a means for the development of many useful devices from microcircuits, which made the computer era possible, to micromechanical devices such as motors that are only a few tens of microns across. A new use of a microdevice is presented here which serves to 'payback' the art of microlithography as it is a significant contribution thereto. The device of the invention is a unique microdevice made with advanced microlithography techniques which when completed can be used as a new exposure tool for microlithography. A lens array can be as thin as 1/40 of the thickness of the page that this text is printed on, yet have thereon an arrangement of optical lenses powerful enough to replace very sophisticated and bulky, million dollar precision optics. An array of lenses can be fabricated with binary optical device and other techniques. The array having unlimited area and field of regard can be used as an exposure tool for very large area microdevices such as flat panel displays without the requirement of step and repeat operations which severely limit the throughput and yield in modern manufacturing methods.