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    SLOW CLOSURE MECHANISM FOR TOILET COVERS
    4.
    发明公开
    SLOW CLOSURE MECHANISM FOR TOILET COVERS 有权
    慢关闭机构马桶盖

    公开(公告)号：EP2675332A1

    公开(公告)日：2013-12-25

    申请号：EP11707365.0

    申请日：2011-02-18

    申请人： ECZACIBASI YAPI GERECLERI SANAYI ve TICARET A.S.

    发明人： MANAVOGLU, Mustafa ,  ILERIYE, Pelin ,  DUVENCIOGLU, Erhan

    IPC分类号： A47K13/12

    CPC分类号： A47K13/12

    摘要： Present invention is disclosed by a slow closure system developed for toilet covers and operation method of said system. Said system comprises at least one main shell (A) comprising at least two projections (14) extending from inner surface (A') towards inside of it; at least one shaft (B) placed into said shell (A) and having at least one channel (8) on it; at least one plate part (2) which can move by settling in said channel (8); fluid having a certain viscosity and added into the shell (A) before the shaft (B) is placed into the shell (A); sealing elements preventing the shaft from being displaced from the shell (A) when the shaft (B) is placed into the shell (A).

    Coating of vitrified ceramic articles by pvd method
    7.
    发明公开
    Coating of vitrified ceramic articles by pvd method 有权
    Beschichtung von Artikeln aus Glaskeramik mittels PVD-Verfahren

    公开(公告)号：EP2292810A2

    公开(公告)日：2011-03-09

    申请号：EP10173112.3

    申请日：2010-08-17

    申请人： Eczacibasi Yapi Gerecleri Sanayi ve Ticaret A.S.

    发明人： Banat, Raid ,  Tecen, Burhan ,  BAHAR, Hakan ,  Özen, Nimet

    IPC分类号： C23C14/32 ,  C23C14/18 ,  C23C14/06 ,  C23C14/02

    CPC分类号： C23C14/325 ,  C23C14/0015 ,  C23C14/022 ,  C23C14/0635 ,  C23C14/18

    摘要： The method of the present invention is the method for metal-based coating of the vitrified ceramic articles by means of physical vapor deposition (PVD) technique. After the ceramic articles to be coated are placed on the anode while metal based material are placed on the cathode in the vacuum chamber, the air in the vacuum chamber is evacuated at first and second stages; the cathode surface is cleaned with the plasma at the third stage; the ceramic surface is subjected to ion etching at fourth and fifth stages; non-reactive coating of the ceramic surface by means of the plasma is performed at the sixth stage; reactive coating of the ceramic surface by means of the plasma is performed at the seventh stage in this method.

    摘要翻译： 本发明的方法是通过物理气相沉积（PVD）技术对陶瓷陶瓷制品进行金属基涂层的方法。 在将待涂覆的陶瓷制品放置在阳极上，同时将金属基材料放置在真空室中的阴极上时，真空室中的空气在第一和第二阶段被抽真空; 在第三阶段用等离子体清洗阴极表面; 陶瓷表面在第四和第五阶段进行离子蚀刻; 在第六阶段进行通过等离子体的陶瓷表面的非反应性涂层; 在该方法的第七阶段，通过等离子体的陶瓷表面的反应性涂层进行。