利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

25 条记录 (耗时 0.014 秒)

    SURFACE COATINGS
    3.
    发明公开
    SURFACE COATINGS 审中-公开
    表面涂层

    公开(公告)号：EP3101170A1

    公开(公告)日：2016-12-07

    申请号：EP15170410.3

    申请日：2015-06-03

    申请人： Europlasma NV

    发明人： Rogge, Eva ,  Legein, Filip

    IPC分类号： D06M10/10 ,  D06M15/643 ,  D06M11/79

    CPC分类号： D06M10/10 ,  D06M11/79 ,  D06M15/643 ,  D06M2200/12

    摘要： The present invention concerns a method for depositing a halogen-free water repellent nanocoating on textile products by means of a low-pressure plasma polymerization coating process with an organosilane monomer, wherein the halogen-free water repellent nanocoating is resistant against washing, laundering and dry cleaning.

    摘要翻译： 本发明涉及一种通过低压等离子体聚合涂覆工艺用有机硅烷单体在纺织产品上沉积无卤素拒水纳米涂层的方法，其中所述无卤素拒水纳米涂层耐洗涤，洗涤和干燥 清洗。

    A PLASMA POLYMERISATION METHOD FOR COATING A SUBSTRATE WITH A POLYMER
    7.
    发明公开
    A PLASMA POLYMERISATION METHOD FOR COATING A SUBSTRATE WITH A POLYMER 审中-公开

    公开(公告)号：EP3680029A1

    公开(公告)日：2020-07-15

    申请号：EP19151022.1

    申请日：2019-01-09

    申请人： Europlasma nv

    发明人： Marc Sercu ,  Samir Loulidi

    IPC分类号： B05D3/14 ,  B05D5/08 ,  B05D7/00 ,  B05D1/00

    摘要： A plasma polymerisation method for coating a substrate with a polymer layer, which method includes:
    providing a substrate to be coated within a plasma chamber;
    introducing a flow of a first polymer precursor to the plasma chamber;
    applying a power at a level greater than zero Watts (W) and converting the first polymer precursor to a first polymer precursor plasma;
    exposing the substrate to the first polymer precursor plasma;
    introducing a flow of a second polymer precursor to the plasma chamber;
    applying a power at a level greater than zero Watts (W) and converting the second polymer precursor to a second polymer precursor plasma; and
    exposing the substrate to the second polymer precursor plasma,
    wherein exposing the substrate to the first polymer precursor plasma forms a first polymer layer thereon and exposing the substrate to the second polymer precursor plasma forms a second polymer layer thereon, characterised by maintaining the power at a level greater than zero Watts (W) between exposing the substrate to the first polymer precursor plasma and exposing the substrate to the second polymer precursor plasma.