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    Method of making an oxide superconducting thin film
    1.
    发明公开
    Method of making an oxide superconducting thin film 失效
    Verfahren zur Herstellung einer supraleitendendünnenOxydschicht。

    公开(公告)号：EP0587095A2

    公开(公告)日：1994-03-16

    申请号：EP93114284.8

    申请日：1993-09-06

    申请人： NIPPON STEEL CORPORATION ,  INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER ,  MITSUBISHI ELECTRIC CORPORATION ,  HOKKAIDO ELECTRIC POWER CO., INC.

    发明人： Ito, Wataru, c/o Supercon. Research Lab., Int. ,  Morishita, Tadataka, c/o Supercon Research Lab Int ,  Homma, Norio, c/o Dept. of Research and Dev. ,  Yoshida, Yukihisa, c/o Supercon. Research Lab. Int

    IPC分类号： H01L39/24 ,  C04B35/50

    CPC分类号： C23C14/35 ,  C23C14/087 ,  C23C14/46 ,  H01L39/2435 ,  Y10S505/731

    摘要： A method of making a superconducting thin film of a Y-Ba-Cu-O series material by using a diode parallel plate type sputtering apparatus including a vacuum chamber (1), a substrate (6) disposed within the vacuum chamber and having a substantially flat surface on which the superconducting thin film is to be formed, and a plate-shaped target (5) functioning as a cathode and disposed within the vacuum chamber to parallelly face to the flat surface of the substrate, the target being made of the same material as the superconducting thin film, a plasma gas being introduced into the vacuum chamber, and a voltage being applied between the cathode and the substrate, wherein the method comprises the steps of applying a high frequency voltage having a frequency higher than 40 MHz between the cathode and the substrate to generate plasma of the introduced gas, superimposing a DC voltage (V) on the high frequency voltage in a polarity that the cathode becomes negative, and setting the DC voltage at a value where the DC voltage is substantially unchanged with variation of a cathode current flowing through the target when adjusting the DC voltage and controlling a value of the DC current while maintaining the DC voltage substantially at the set value.

    摘要翻译： 一种通过使用二极管平行板型溅射装置制造Y-Ba-Cu-O系列材料的超导薄膜的方法，所述二极管平行板式溅射装置包括真空室（1），设置在真空室内的基板（6） 要形成超导薄膜的平坦表面和用作阴极的板状靶（5），并设置在真空室内以平行地面对基板的平坦表面，目标由其制成 作为超导薄膜的材料，将等离子体气体引入到真空室中，以及施加在阴极和衬底之间的电压，其中该方法包括以下步骤：将频率高于40MHz的高频电压施加在 阴极和衬底以产生引入的气体的等离子体，以直流阴极为极性的高频电压叠加直流电压（V），将直流电压设定为 其中当调节直流电压并控制直流电流的值同时保持直流电压基本上处于设定值时，直流电压随着正在流过目标物的阴极电流的变化而基本上不变。