公开(公告)号：EP2940698B1

公开(公告)日：2018-05-30

申请号：EP13868055.8

申请日：2013-12-24

申请人： Fujikura Ltd.

发明人： YOSHIDA Tomo ,  YOSHIZUMI Masateru ,  IZUMI Teruo ,  SHIOHARA Yuh

IPC分类号： H01L39/12 ,  H01L39/24 ,  H01B12/06

CPC分类号： H01B12/06 ,  C23C14/024 ,  C23C14/087 ,  H01L39/126 ,  H01L39/128 ,  H01L39/2438 ,  H01L39/2448 ,  H01L39/2483

摘要： An RE123-based superconducting wire (10) of the invention includes: a substrate (11); an intermediate layer (12) provided above the substrate (11); and an oxide superconducting layer (14) that is provided above the intermediate layer (12) and is made of an oxide superconductor expressed by a composition formula of RE 1 Ba 2 Cu 3 O 7-´ where RE represents one kind of or two or more kinds of rare earth elements in the formula, wherein an Hf-containing compound of 0.5 to 10 mol% is introduced into the oxide superconducting layer (14), a different phase containing Hf is dispersed in the oxide superconducting layer (14) as a flux pinning center, and the a-axial-ratio of the oxide superconducting layer (14) is less than or equal to 1.5%.

公开(公告)号：EP3141630B1

公开(公告)日：2018-05-09

申请号：EP16172411.7

申请日：2013-02-15

申请人： MITSUBISHI MATERIALS CORPORATION

发明人： Zhang, Shoubin ,  Umemoto, Keita ,  Shoji, Masahiro

IPC分类号： C23C14/34 ,  C23C14/06

CPC分类号： H01J37/3429 ,  B22F3/10 ,  B22F2201/20 ,  B22F2301/00 ,  B22F2999/00 ,  C22C1/0425 ,  C22C32/0089 ,  C23C14/0623 ,  C23C14/08 ,  C23C14/087 ,  C23C14/3414 ,  C23C14/35 ,  B22F3/1007

摘要： Provided is a sputtering target which contains Na in high concentration and, despite this, is inhibited from discoloration, generating spots, and causing abnormal electrical discharge and which has high strength and rarely breaks. Also provided is a method for producing the sputtering target. The sputtering target has a component composition that contains 10 to 40 at% of Ga and 1.0 to 15 at% of Na as metal element components other than F, S, and Se, with the remainder composed of Cu and unavoidable impurities, wherein the Na is contained in the form of at least one Na compound selected from sodium fluoride, sodium sulfide, and sodium selenide. The sputtering target has a theoretical density ratio of 90% or higher, a flexural strength of 100 N/mm 2 or higher, and a bulk resistivity of 1 m©·cm or less. The number of 0.05 mm 2 or larger aggregates of the at least one of sodium fluoride, sodium sulfide, and sodium selenide present per cm 2 area of the target surface is 1 or less on average.

公开(公告)号：EP2940698A4

公开(公告)日：2016-08-17

申请号：EP13868055

申请日：2013-12-24

申请人： FUJIKURA LTD

发明人： YOSHIDA TOMO ,  YOSHIZUMI MASATERU ,  IZUMI TERUO ,  SHIOHARA YUH

IPC分类号： H01L39/12 ,  H01B12/06 ,  H01L39/24

CPC分类号： H01B12/06 ,  C23C14/024 ,  C23C14/087 ,  H01L39/126 ,  H01L39/128 ,  H01L39/2438 ,  H01L39/2448 ,  H01L39/2483

摘要： An RE123-based superconducting wire (10) of the invention includes: a substrate (11); an intermediate layer (12) provided above the substrate (11); and an oxide superconducting layer (14) that is provided above the intermediate layer (12) and is made of an oxide superconductor expressed by a composition formula of RE 1 Ba 2 Cu 3 O 7-´ where RE represents one kind of or two or more kinds of rare earth elements in the formula, wherein an Hf-containing compound of 0.5 to 10 mol% is introduced into the oxide superconducting layer (14), a different phase containing Hf is dispersed in the oxide superconducting layer (14) as a flux pinning center, and the a-axial-ratio of the oxide superconducting layer (14) is less than or equal to 1.5%.

公开(公告)号：EP2940698A1

公开(公告)日：2015-11-04

申请号：EP13868055.8

申请日：2013-12-24

申请人： International Superconductivity Technology Center ,  Fujikura Ltd.

发明人： YOSHIDA Tomo ,  YOSHIZUMI Masateru ,  IZUMI Teruo ,  SHIOHARA Yuh

IPC分类号： H01B12/06 ,  C01G1/00 ,  C01G3/00 ,  C23C14/08 ,  H01B13/00

CPC分类号： H01B12/06 ,  C23C14/024 ,  C23C14/087 ,  H01L39/126 ,  H01L39/128 ,  H01L39/2438 ,  H01L39/2448 ,  H01L39/2483

摘要： An RE123-based superconducting wire (10) of the invention includes: a substrate (11); an intermediate layer (12) provided above the substrate (11); and an oxide superconducting layer (14) that is provided above the intermediate layer (12) and is made of an oxide superconductor expressed by a composition formula of RE 1 Ba 2 Cu 3 O 7-δ where RE represents one kind of or two or more kinds of rare earth elements in the formula, wherein an Hf-containing compound of 0.5 to 10 mol% is introduced into the oxide superconducting layer (14), a different phase containing Hf is dispersed in the oxide superconducting layer (14) as a flux pinning center, and the a-axial-ratio of the oxide superconducting layer (14) is less than or equal to 1.5%.

摘要翻译： 本发明的基于RE123的超导线（10）包括：衬底（11）; 设置在所述基板（11）上方的中间层（12）; 以及设置在所述中间层（12）的上方并由RE 1 Ba 2 Cu 3 O 7-'的组成式表示的氧化物超导体制成的氧化物超导层（14），其中RE表示一种或两种或 式中的更多种稀土元素，其中将0.5-10mol％的含Hf化合物引入氧化物超导层（14）中，将含有Hf的不同相分散在氧化物超导层（14）中，作为 磁通钉扎中心，氧化物超导层（14）的a轴比率小于或等于1.5％。

公开(公告)号：EP1642997A4

公开(公告)日：2008-04-02

申请号：EP04729286

申请日：2004-04-23

申请人： NAT INST FOR MATERIALS SCIENCE

发明人： GOTO MASAHIRO ,  KASAHARA AKIRA ,  OISHI TETSUO ,  TOSA MASAHIRO ,  YOSHIHARA KAZUHIRO

IPC分类号： C23C14/08 ,  C23C14/34

CPC分类号： C23C14/3414 ,  C23C14/08 ,  C23C14/087

摘要： A copper oxide thin film mainly containing CuO is formed by a plasma film-forming process on a substrate for film formation. The friction coefficient of the copper oxide thin film can be controlled remarkably low.

公开(公告)号：EP1638701A4

公开(公告)日：2007-02-21

申请号：EP04776126

申请日：2004-05-25

申请人： SUPERPOWER INC

发明人： SELVAMANICKAM VENKAT ,  LEE HEE-GYOUN

IPC分类号： C23C14/08 ,  C23C14/22 ,  C23C14/28 ,  C23C16/40 ,  C23C16/48 ,  H01L39/24

CPC分类号： H01L39/2448 ,  C23C14/087 ,  C23C14/22 ,  C23C14/28 ,  C23C16/408 ,  C23C16/486 ,  H01L39/2441

摘要： An ion source impinging on the surface of the substrate to be coated is used to enhance a MOCVD, PVD or other process for the preparation of superconducting materials.

摘要翻译： 撞击在待涂覆基材表面上的离子源用于增强MOCVD，PVD或用于制备超导材料的其他工艺。

公开(公告)号：EP1479435A1

公开(公告)日：2004-11-24

申请号：EP04019143.9

申请日：1995-10-18

申请人： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA ,  SYMYX TECHNOLOGIES

发明人： The designation of the inventor has not yet been filed

IPC分类号： B01J19/00 ,  C07B61/00 ,  B01J23/00 ,  C04B35/00 ,  C22C1/00

CPC分类号： C04B35/16 ,  B01J19/0046 ,  B01J2219/00313 ,  B01J2219/00317 ,  B01J2219/00378 ,  B01J2219/0043 ,  B01J2219/00432 ,  B01J2219/00436 ,  B01J2219/00441 ,  B01J2219/00443 ,  B01J2219/00475 ,  B01J2219/005 ,  B01J2219/00511 ,  B01J2219/00515 ,  B01J2219/0052 ,  B01J2219/00527 ,  B01J2219/00531 ,  B01J2219/00533 ,  B01J2219/00536 ,  B01J2219/0054 ,  B01J2219/00585 ,  B01J2219/0059 ,  B01J2219/00592 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00619 ,  B01J2219/00621 ,  B01J2219/00626 ,  B01J2219/00628 ,  B01J2219/0063 ,  B01J2219/00635 ,  B01J2219/00637 ,  B01J2219/00644 ,  B01J2219/00646 ,  B01J2219/00648 ,  B01J2219/00659 ,  B01J2219/00689 ,  B01J2219/00691 ,  B01J2219/00711 ,  B01J2219/0072 ,  B01J2219/00722 ,  B01J2219/00736 ,  B01J2219/00745 ,  B01J2219/00747 ,  B01J2219/00752 ,  B01J2219/00754 ,  B82Y25/00 ,  B82Y30/00 ,  C01G51/006 ,  C01G51/68 ,  C01P2002/34 ,  C01P2002/52 ,  C01P2002/72 ,  C01P2006/40 ,  C01P2006/42 ,  C04B35/01 ,  C04B35/4508 ,  C04B35/4521 ,  C04B35/4525 ,  C04B35/62218 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3262 ,  C04B2235/327 ,  C04B2235/3275 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/3296 ,  C04B2235/3298 ,  C04B2235/3418 ,  C04B2235/3463 ,  C04B2235/656 ,  C04B2235/761 ,  C04B2235/762 ,  C04B2235/768 ,  C04B2235/96 ,  C23C14/042 ,  C23C14/087 ,  C23C16/042 ,  C40B30/08 ,  C40B40/14 ,  C40B40/18 ,  C40B60/08 ,  C40B60/14 ,  C40B70/00 ,  C40B80/00 ,  G01R33/16 ,  H01F1/401 ,  H01F1/407 ,  H01F10/007 ,  H01F10/1933 ,  H01F41/18 ,  H01F41/34 ,  H01L43/10 ,  Y10T428/24479 ,  Y10T428/24612 ,  Y10T428/2462 ,  Y10T428/31 ,  Y10T428/31645 ,  Y10T428/31855 ,  Y10T428/31931 ,  Y10T436/25 ,  Y10T436/2525 ,  Y10T436/255 ,  Y10T436/25875

摘要： Described is a method of screening organometallic materials for catalysis, the method comprising making an array of organometallic materials by delivering a first component of a first organometallic material and a first component of a second organometallic material to first and second regions on a substrate,
delivering a second component of the first organometallic material and a second component of the second organometallic material to the first and second regions on the substrate,
simultaneously reacting the components to form at least two organometallic materials, and
screening the array of organometallic materials in parallel for a chemical property, the chemical property being catalysis.

摘要翻译： 描述了筛选用于催化的有机金属材料的方法，所述方法包括通过将第一有机金属材料的第一组分和第二有机金属材料的第一组分递送到衬底上的第一和第二区域来制备阵列的有机金属材料， 第一有机金属材料的第二组分和第二有机金属材料的第二组分施加到基底上的第一和第二区域，同时使组分反应以形成至少两种有机金属材料，并平行筛选有机金属材料阵列用于化学 性质，化学性质是催化剂。

公开(公告)号：EP1088787A4

公开(公告)日：2004-11-17

申请号：EP99913698

申请日：1999-04-16

申请人： CHUBU CHELEST CO LTD ,  SAITOH HIDETOSHI

发明人： SAITOH HIDETOSHI ,  OHSHIO SHIGEO ,  SATOH RYO ,  NAMBU NOBUYOSHI ,  NAKAMURA ATSUSHI ,  FURUKAWA MASANORI

IPC分类号： C01B3/00 ,  C01B13/18 ,  C01B13/32 ,  C01G1/00 ,  C01G3/00 ,  C23C14/08 ,  C23C14/28 ,  C23C14/34 ,  C01F17/00 ,  C01G23/00 ,  C07C229/76 ,  C30B29/22

CPC分类号： C01B13/324 ,  C01B13/18 ,  C01G3/006 ,  C01P2002/02 ,  C01P2002/34 ,  C01P2002/72 ,  C01P2004/03 ,  C23C14/087 ,  C23C14/3414 ,  Y02E60/324

摘要： Metallic materials are mixed with an organic chelating agent so as to result in a given metal composition to prepare a transparent aqueous solution of organic metal chelate complexes. The aqueous solution is spray-dried to obtain a powder comprising the amorphous organic metal chelate complexes. The powder is burned to produce a metal oxide. The powder comprising the complexes is molded into a tablet to obtain a target, which is used to form a thin metal oxide film. In producing the metal oxide, compositional control is satisfactory and particle shape control is easy. With the target, a thin metal oxide film having a proper composition can be efficiently produced by the laser deposition method, etc.

摘要翻译： 金属材料在有机螯合剂与混合以产生给定的金属的组合物来制备的有机金属螯合络合物的透明wässrige溶液。 该wässrige溶液进行喷雾干燥，以获得在含有无定形的有机金属螯合络合物的无定形粉末。 粉末被烧结以产生金属氧化物。 或者，含有所述复合物的粉末成型为片剂以获得目标，所有这一切都被用于形成薄的金属氧化物膜 - 。 本发明提供了一种金属氧化物的组成和形状的颗粒的是容易控制的，因此提供具有薄的金属氧化物组合物的适当的膜的通过激光沉积法有效地制造靶。

公开(公告)号：EP0872579B1

公开(公告)日：2004-09-08

申请号：EP97909591.6

申请日：1997-10-23

申请人： Fujikura, Ltd.

发明人： IIJIMA, Yasuhiro ,  HOSAKA, Mariko ,  TANABE, Nobuo ,  SADAKATA, Nobuyuki ,  SAITOH, Takashi

IPC分类号： C30B28/00 ,  C30B23/00 ,  C30B29/22 ,  C01G1/00 ,  C01G3/00 ,  C01G15/00 ,  C01G25/00 ,  C23C14/08 ,  C23C14/22 ,  H01B12/00 ,  H01L39/24

CPC分类号： H01L39/2461 ,  C23C14/083 ,  C23C14/087 ,  C23C14/22 ,  C23C14/46 ,  H01L39/2435 ,  Y02T50/67 ,  Y10S505/731

公开(公告)号：EP1371746A1

公开(公告)日：2003-12-17

申请号：EP02710513.9

申请日：2002-02-05

申请人： Sumitomo Electric Industries, Ltd.

发明人： HAHAKURA, S., Osaka Wks of Sumitomo Elec. Ind. Ltd ,  OHMATSU, K., Osaka Wks of Sumitomo Elect. Ind. Ltd

IPC分类号： C23C14/28 ,  C23C14/46

CPC分类号： C23C14/225 ,  C23C14/087 ,  C23C14/28 ,  C23C14/505

摘要： A film deposition method and apparatus capable of forming a film on a substrate having a large area are provided. The film deposition method of forming a film by scattering a deposition material from a surface of a target material (14) and depositing the scattered deposition material onto a surface of a substrate (12), comprising a step of arranging the substrate (12) and the target material (14) such that the surface of the substrate (12) forms an angle to the surface of the target material (14), and a deposition step of forming the film on the substrate (12) in such a manner that an area of a film surface is continuously increased in a two-dimensional direction, while moving a relative position of the substrate (12) with respect to the target material (14).