公开(公告)号：EP1733836A1

公开(公告)日：2006-12-20

申请号：EP05728657.7

申请日：2005-03-30

申请人： NIKON CORPORATION ,  Adachi, Hiroaki ,  Sasaki, Takatomo ,  Mori, Yusuke ,  Takano, Kazufumi ,  Inoue, Tsuyoshi ,  Matsumura, Hiroyoshi

发明人： ADACHI, Hiroaki ,  KITANO, Hiroshi; c/o NIKON CORPORATION

IPC分类号： B23K26/12 ,  C07D213/84 ,  G01N23/20 ,  G01N1/28

CPC分类号： C30B33/06 ,  B23K26/0006 ,  B23K26/0066 ,  B23K26/03 ,  B23K26/032 ,  B23K26/0624 ,  B23K26/0643 ,  B23K26/0665 ,  B23K26/123 ,  B23K26/14 ,  B23K26/38 ,  B23K2203/30 ,  B23K2203/42 ,  B23K2203/50 ,  C30B29/54

摘要： The short-pulse laser light 9 emitted from the short-pulse laser light source 1 is focused on and caused to irradiate an organic crystal 8 contained in a sample container 6 via a shutter 2, intensity adjusting element 3, irradiation position control mechanism 4, and focusing optical system 5. The sample container 6 is carried on a stage 7, and can be moved in three dimensions along the x axis, y axis and z axis in an x-y-z orthogonal coordinate system with the direction of the optical axis being taken as the z axis; furthermore, the sample container 6 can be rotated about the z axis. Working of the organic crystal 8 is performed by means of short-pulse laser light that is focused on and caused to irradiate the surface of the organic crystal 8. Prior to working, nitrogen is caused to jet onto the sample container 6 by a low-temperature gas jet device C that is a cooling device; consequently, the organic crystal 8 is cooled to -150°C or below. As a result, it is possible to work the object of working in a fixed state, and to increase the working efficiency by means of the short-pulse laser light that is used.

摘要翻译： 从短脉冲激光光源1发射的短脉冲激光9被聚焦并通过挡板2，强度调节元件3，照射位置控制机构4照射包含在样品容器6中的有机晶体8， 并且聚焦光学系统5.样品容器6承载在载物台7上，并且可以在xyz正交坐标系中沿着x轴，y轴和z轴在三维中移动，其中光轴的方向被视为 z轴; 此外，样品容器6可绕z轴旋转。 有机晶体8的工作是通过聚焦在有机晶体8的表面上照射并照射有机晶体8的表面的短脉冲激光进行的。在加工之前，氮气通过低频激光器喷射到样品容器6上， 作为冷却装置的高温气体喷射装置C; 因此，将有机晶体8冷却至-150℃以下。 结果，可以以固定状态工作的目的，并且通过所使用的短脉冲激光来提高工作效率。

公开(公告)号：EP1666520A4

公开(公告)日：2009-04-08

申请号：EP04773221

申请日：2004-09-10

申请人： NIPPON KOGAKU KK ,  SASAKI TAKATOMO ,  MORI YUSUKE ,  TAKANO KAZUFUMI ,  INOUE TSUYOSHI ,  MATSUMURA HIROYOSHI

发明人： ADACHI HIROAKI ,  KITANO HIROSHI

IPC分类号： C08J3/28 ,  B23K26/00 ,  B23K26/06 ,  B23K26/38 ,  B23K26/40

CPC分类号： C08J3/28 ,  B23K26/0006 ,  B23K26/0066 ,  B23K26/0624 ,  B23K26/38 ,  B23K2203/30 ,  B23K2203/42 ,  B23K2203/50

摘要： The ultraviolet short-pulse laser light emitted from the ultraviolet short-pulse laser light source 1 is focused on and caused to irradiate a macromolecular crystal 8 contained in a sample container 6 via a shutter 2, intensity adjusting element 3, irradiation position control mechanism 4, and focusing optical system 5. The sample container 6 is carried on a stage 7, and can be moved in three dimensions along the directions of the x, y and z axes in an x-y-z orthogonal coordinate system with the direction of the optical axis being taken as the z axis; furthermore, the sample container 6 can be rotated about the z axis. Working of the macromolecular crystal is performed by means of ultraviolet short-pulse laser light that is focused on and caused to irradiate the surface of the macromolecular crystal 8. In this way, various types of working can be securely performed on macromolecular crystals with little damage and by means of a simple operation.

摘要翻译： 聚焦紫外线短脉冲激光光源1发出的紫外线短脉冲激光，经由活门2，强度调节元件3，照射位置控制机构4照射包含在检体容器6内的高分子晶体8 和聚焦光学系统5.样品容器6承载在载物台7上，并且可以在xyz正交坐标系中沿x，y和z轴的方向在三维中移动，其中光轴的方向为 作为z轴; 此外，样品容器6可绕z轴旋转。 大分子晶体的工作是通过聚焦并照射大分子晶体8的表面的紫外线短脉冲激光进行的。以这种方式，可以在几乎没有损伤的大分子晶体上可靠地进行各种工作 并通过简单的操作。

公开(公告)号：EP1666520A1

公开(公告)日：2006-06-07

申请号：EP04773221.9

申请日：2004-09-10

申请人： NIKON CORPORATION ,  Adachi, Hiroaki ,  Sasaki, Takatomo ,  Mori, Yusuke ,  Takano, Kazufumi ,  Inoue, Tsuyoshi ,  Matsumura, Hiroyoshi

发明人： ADACHI, Hiroaki ,  KITANO, Hiroshi c/o Nikon Corporation

IPC分类号： C08J3/28

CPC分类号： C08J3/28 ,  B23K26/0006 ,  B23K26/0066 ,  B23K26/0624 ,  B23K26/38 ,  B23K2203/30 ,  B23K2203/42 ,  B23K2203/50

摘要： The ultraviolet short-pulse laser light emitted from the ultraviolet short-pulse laser light source 1 is focused on and caused to irradiate a macromolecular crystal 8 contained in a sample container 6 via a shutter 2, intensity adjusting element 3, irradiation position control mechanism 4, and focusing optical system 5. The sample container 6 is carried on a stage 7, and can be moved in three dimensions along the directions of the x, y and z axes in an x-y-z orthogonal coordinate system with the direction of the optical axis being taken as the z axis; furthermore, the sample container 6 can be rotated about the z axis. Working of the macromolecular crystal is performed by means of ultraviolet short-pulse laser light that is focused on and caused to irradiate the surface of the macromolecular crystal 8. In this way, various types of working can be securely performed on macromolecular crystals with little damage and by means of a simple operation.

摘要翻译： 聚焦紫外线短脉冲激光光源1发出的紫外线短脉冲激光，经由活门2，强度调节元件3，照射位置控制机构4照射包含在检体容器6内的高分子晶体8 和聚焦光学系统5.样品容器6承载在载物台7上，并且可以在xyz正交坐标系中沿x，y和z轴的方向在三维中移动，其中光轴的方向为 作为z轴; 此外，样品容器6可绕z轴旋转。 大分子晶体的工作是通过聚焦并照射大分子晶体8的表面的紫外线短脉冲激光进行的。以这种方式，可以在几乎没有损伤的大分子晶体上可靠地进行各种工作 并通过简单的操作。

公开(公告)号：EP1666520B1

公开(公告)日：2013-11-13

申请号：EP04773221.9

申请日：2004-09-10

申请人： NIKON CORPORATION ,  Sasaki, Takatomo ,  Mori, Yusuke ,  Takano, Kazufumi ,  Inoue, Tsuyoshi ,  Matsumura, Hiroyoshi ,  Adachi, Hiroaki

发明人： ADACHI, Hiroaki ,  KITANO, Hiroshi c/o Nikon Corporation

IPC分类号： C08J3/28 ,  B23K26/00 ,  B23K26/38 ,  B23K26/40 ,  B23K26/06

CPC分类号： C08J3/28 ,  B23K26/0006 ,  B23K26/0066 ,  B23K26/0624 ,  B23K26/38 ,  B23K2203/30 ,  B23K2203/42 ,  B23K2203/50

摘要： The ultraviolet short-pulse laser light emitted from the ultraviolet short-pulse laser light source 1 is focused on and caused to irradiate a macromolecular crystal 8 contained in a sample container 6 via a shutter 2, intensity adjusting element 3, irradiation position control mechanism 4, and focusing optical system 5. The sample container 6 is carried on a stage 7, and can be moved in three dimensions along the directions of the x, y and z axes in an x-y-z orthogonal coordinate system with the direction of the optical axis being taken as the z axis; furthermore, the sample container 6 can be rotated about the z axis. Working of the macromolecular crystal is performed by means of ultraviolet short-pulse laser light that is focused on and caused to irradiate the surface of the macromolecular crystal 8. In this way, various types of working can be securely performed on macromolecular crystals with little damage and by means of a simple operation.

公开(公告)号：EP1733836B1

公开(公告)日：2010-12-08

申请号：EP05728657.7

申请日：2005-03-30

申请人： NIKON CORPORATION ,  Adachi, Hiroaki ,  Sasaki, Takatomo ,  Mori, Yusuke ,  Takano, Kazufumi ,  Inoue, Tsuyoshi ,  Matsumura, Hiroyoshi

发明人： ADACHI, Hiroaki ,  KITANO, Hiroshi; c/o NIKON CORPORATION

IPC分类号： B23K26/12 ,  C07D213/84 ,  G01N23/20 ,  G01N1/28 ,  B23K26/00 ,  B23K26/14 ,  B23K26/38 ,  B23K26/40 ,  C08J3/18

CPC分类号： C30B33/06 ,  B23K26/0006 ,  B23K26/0066 ,  B23K26/03 ,  B23K26/032 ,  B23K26/0624 ,  B23K26/0643 ,  B23K26/0665 ,  B23K26/123 ,  B23K26/14 ,  B23K26/38 ,  B23K2203/30 ,  B23K2203/42 ,  B23K2203/50 ,  C30B29/54

摘要： The short-pulse laser light 9 emitted from the short-pulse laser light source 1 is focused on and caused to irradiate an organic crystal 8 contained in a sample container 6 via a shutter 2, intensity adjusting element 3, irradiation position control mechanism 4, and focusing optical system 5. The sample container 6 is carried on a stage 7, and can be moved in three dimensions along the x axis, y axis and z axis in an x-y-z orthogonal coordinate system with the direction of the optical axis being taken as the z axis; furthermore, the sample container 6 can be rotated about the z axis. Working of the organic crystal 8 is performed by means of short-pulse laser light that is focused on and caused to irradiate the surface of the organic crystal 8. Prior to working, nitrogen is caused to jet onto the sample container 6 by a low-temperature gas jet device C that is a cooling device; consequently, the organic crystal 8 is cooled to -150°C or below. As a result, it is possible to work the object of working in a fixed state, and to increase the working efficiency by means of the short-pulse laser light that is used.

公开(公告)号：EP1733836A4

公开(公告)日：2009-04-15

申请号：EP05728657

申请日：2005-03-30

申请人： NIPPON KOGAKU KK ,  ADACHI HIROAKI ,  SASAKI TAKATOMO ,  MORI YUSUKE ,  TAKANO KAZUFUMI ,  INOUE TSUYOSHI ,  MATSUMURA HIROYOSHI

发明人： ADACHI HIROAKI ,  KITANO HIROSHI

IPC分类号： B23K26/12 ,  B23K26/00 ,  B23K26/03 ,  B23K26/06 ,  B23K26/14 ,  B23K26/38 ,  B23K26/40 ,  C07D213/84 ,  C08J3/18 ,  G01N1/28 ,  G01N23/20

CPC分类号： C30B33/06 ,  B23K26/0006 ,  B23K26/0066 ,  B23K26/03 ,  B23K26/032 ,  B23K26/0624 ,  B23K26/0643 ,  B23K26/0665 ,  B23K26/123 ,  B23K26/14 ,  B23K26/38 ,  B23K2203/30 ,  B23K2203/42 ,  B23K2203/50 ,  C30B29/54

摘要： The short-pulse laser light 9 emitted from the short-pulse laser light source 1 is focused on and caused to irradiate an organic crystal 8 contained in a sample container 6 via a shutter 2, intensity adjusting element 3, irradiation position control mechanism 4, and focusing optical system 5. The sample container 6 is carried on a stage 7, and can be moved in three dimensions along the x axis, y axis and z axis in an x-y-z orthogonal coordinate system with the direction of the optical axis being taken as the z axis; furthermore, the sample container 6 can be rotated about the z axis. Working of the organic crystal 8 is performed by means of short-pulse laser light that is focused on and caused to irradiate the surface of the organic crystal 8. Prior to working, nitrogen is caused to jet onto the sample container 6 by a low-temperature gas jet device C that is a cooling device; consequently, the organic crystal 8 is cooled to -150°C or below. As a result, it is possible to work the object of working in a fixed state, and to increase the working efficiency by means of the short-pulse laser light that is used.

摘要翻译： 从短脉冲激光光源1发射的短脉冲激光光9聚焦在并使其照射在通过快门2包含在样品容器6的有机晶体8，强度调节元件3，照射位置控制机构4， 和聚焦光学系统5。样品容器6承载在阶段7中，并可以在沿x轴，y轴和z轴三个维度在XYZ正交坐标系与所述光轴的方向上移动被取作 z轴; 进一步，样品容器6可以绕z轴。 有机晶体8的工作是由一个致力于并由此对有机晶体的表面照射8.之前工作的短脉冲激光来进行，氮是由低引发的对喷射到样品容器6 温度的气体喷射装置C.这是一个冷却装置; 因此，有机晶体8被冷却至-150℃或以下。 其结果，能够工作在一个固定的工作状态的对象，并且以增加由所使用的短脉冲激光的手段工作效率。