公开(公告)号：EP1151825A2

公开(公告)日：2001-11-07

申请号：EP00204331.3

申请日：2000-12-04

申请人： Kinik Company

发明人： Lin, Frank S. ,  Sung, Chien-Min

IPC分类号： B24B53/12 ,  B24B37/04

CPC分类号： B24B53/017 ,  B24B53/12 ,  B24D3/06 ,  B24D7/02 ,  B24D2203/00

摘要： The present invention discloses a CMP pad dresser which has a plurality of uniformly spaced abrasive particles (180) protruding therefrom. The abrasive particles (180) are super hard materials, and are typically diamond, polycrystalline diamond (PCD), cubic boron nitride (cBN), or polycrystalline cubic boron nitride (PcBN). The abrasive particles (180) are attacked to a substrate (40) which may be then coated with an additional anti-corrosive layer (130). The anti-corrosive layer (130) is usually a diamond or diamond-like carbon which is coated over the surface of the disk to prevent erosion of the brazing alloy (90) by the chemical slurry used in conjunction with the CMP pad. This immunity to chemical attack allows the CMP pad dresser to dress the pad while it is polishing a workpiece. In addition to even spacing on the substrate (40), the abrasive particles (180) extend for a uniform distance away from the substrate (40), allowing for even grooming or dressing of a CMP pad both in vertical and horizontal directions. A method of producing such a CMP pad dresser is also disclosed.

摘要翻译： 本发明公开了一种CMP抛光修整器，其具有从其突出的多个均匀间隔的磨料颗粒（180）。 研磨颗粒（180）是超硬材料，通常是金刚石，多晶金刚石（PCD），立方氮化硼（cBN）或多晶立方氮化硼（PcBN）。 磨料颗粒（180）被冲击到衬底（40），然后可以用附加的防腐蚀层（130）涂覆。 防腐蚀层（130）通常是金刚石或类金刚石碳，其涂覆在盘的表面上，以防止钎焊合金（90）与CMP垫结合使用的化学浆料侵蚀。 化学侵蚀的这种免疫能使CMP抛光垫修整器在抛光工件时穿着垫子。 除了衬底（40）上的均匀间隔之外，磨料颗粒（180）延伸离开衬底（40）一个均匀的距离，允许在垂直和水平方向均匀地修整或修整CMP垫。 还公开了一种制造这种CMP垫修整器的方法。

公开(公告)号：EP1151825B1

公开(公告)日：2006-06-28

申请号：EP00204331.3

申请日：2000-12-04

申请人： Kinik Company

发明人： Lin, Frank S. ,  Sung, Chien-Min

IPC分类号： B24B37/04 ,  B24B53/12 ,  B24D3/06 ,  B24D7/02

CPC分类号： B24B53/017 ,  B24B53/12 ,  B24D3/06 ,  B24D7/02 ,  B24D2203/00

摘要： The present invention discloses a CMP pad dresser which has a plurality of uniformly spaced abrasive particles (180) protruding therefrom. The abrasive particles (180) are super hard materials, and are typically diamond, polycrystalline diamond (PCD), cubic boron nitride (cBN), or polycrystalline cubic boron nitride (PcBN). The abrasive particles (180) are attacked to a substrate (40) which may be then coated with an additional anti-corrosive layer (130). The anti-corrosive layer (130) is usually a diamond or diamond-like carbon which is coated over the surface of the disk to prevent erosion of the brazing alloy (90) by the chemical slurry used in conjunction with the CMP pad. This immunity to chemical attack allows the CMP pad dresser to dress the pad while it is polishing a workpiece. In addition to even spacing on the substrate (40), the abrasive particles (180) extend for a uniform distance away from the substrate (40), allowing for even grooming or dressing of a CMP pad both in vertical and horizontal directions. A method of producing such a CMP pad dresser is also disclosed.

公开(公告)号：EP1852896A1

公开(公告)日：2007-11-07

申请号：EP06290727.4

申请日：2006-05-05

申请人： Kinik Company

发明人： Chang, Hsiao-Kuo ,  Huang, Jen-Sheuan ,  Teng, Chien-Chung ,  Chung, Chih-Hsien ,  Wang, Ming-Hui

IPC分类号： H01L21/20 ,  C30B29/04

CPC分类号： H01L21/02527 ,  H01L21/02664

摘要： A diamond substrate and a method for fabricating the same are provided, wherein a protection layer is formed on one surface of a diamond layer in the process of forming the diamond layer by chemical vapor deposition process, for reducing the deformation of the diamond layer. Thereby the deformation of diamond substrate falls within the range of permitted tolerance of deformation, so that the performance of the diamond substrate is enhanced.

摘要翻译： 提供了一种金刚石基板及其制造方法，其中，在通过化学气相沉积工艺形成金刚石层的过程中，在金刚石层的一个表面上形成保护层，以减少金刚石层的变形。 由此金刚石基板的变形落入允许的变形容差范围内，从而提高了金刚石基板的性能。

公开(公告)号：EP1852895A1

公开(公告)日：2007-11-07

申请号：EP06290725.8

申请日：2006-05-05

申请人： Kinik Company

发明人： Chang, Hsiao-Kuo ,  Huang, Jen-Sheuan ,  Chen, Chih-Peng ,  Chen, Na-Ling ,  Wen, Shih-Pang

IPC分类号： H01L21/20 ,  H01L29/24

CPC分类号： H01L21/02527 ,  H01L21/02378 ,  H01L21/02381 ,  H01L21/02447 ,  H01L21/0254 ,  H01L21/02664

摘要： A diamond substrate and a method for fabricating the same are provided wherein a SiC layer is formed on a lower surface of a diamond layer for preventing the diamond layer from being deformed after the process of forming the diamond substrate, and then a semiconductor layer is formed on the diamond layer or directly formed on the surface of the SiC layer. Thereby, the lattice mismatch between the diamond film layer and the semiconductor layer is mitigated by the SiC layer, and the crystalline quality of the semiconductor layer is improved, the fabricating process of the diamond substrate is simplified, and the performance and stability are enhanced.

摘要翻译： 提供一种金刚石基板及其制造方法，其中在金刚石层的下表面上形成SiC层，以防止金刚石层在形成金刚石基板的过程之后变形，然后形成半导体层 在金刚石层上或直接形成在SiC层的表面上。 因此，通过SiC层减轻了金刚石膜层和半导体层之间的晶格失配，提高了半导体层的结晶质量，简化了金刚石基板的制造工艺，提高了性能和稳定性。

公开(公告)号：EP1151825A3

公开(公告)日：2004-03-31

申请号：EP00204331.3

申请日：2000-12-04

申请人： Kinik Company

发明人： Lin, Frank S. ,  Sung, Chien-Min

IPC分类号： B24B37/04 ,  B24B53/12 ,  B24D3/06 ,  B24D7/02

CPC分类号： B24B53/017 ,  B24B53/12 ,  B24D3/06 ,  B24D7/02 ,  B24D2203/00

摘要： The present invention discloses a CMP pad dresser which has a plurality of uniformly spaced abrasive particles (180) protruding therefrom. The abrasive particles (180) are super hard materials, and are typically diamond, polycrystalline diamond (PCD), cubic boron nitride (cBN), or polycrystalline cubic boron nitride (PcBN). The abrasive particles (180) are attacked to a substrate (40) which may be then coated with an additional anti-corrosive layer (130). The anti-corrosive layer (130) is usually a diamond or diamond-like carbon which is coated over the surface of the disk to prevent erosion of the brazing alloy (90) by the chemical slurry used in conjunction with the CMP pad. This immunity to chemical attack allows the CMP pad dresser to dress the pad while it is polishing a workpiece. In addition to even spacing on the substrate (40), the abrasive particles (180) extend for a uniform distance away from the substrate (40), allowing for even grooming or dressing of a CMP pad both in vertical and horizontal directions. A method of producing such a CMP pad dresser is also disclosed.