公开(公告)号：EP1751623B1

公开(公告)日：2017-07-19

申请号：EP05753949.6

申请日：2005-05-23

Applicant: Rudolph Technologies, Inc.

Inventor： GARDNER, Steven, D. ,  DA SILVEIRA, Elvino, M. ,  RESOR, Griffith, L., III

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70275 ,  G03F7/70733 ,  G03F9/7003

公开(公告)号：EP1549905B1

公开(公告)日：2013-11-06

申请号：EP03797124.9

申请日：2003-09-17

Applicant: Rudolph Technologies, Inc.

Inventor： VODANOVIC, Bojko

IPC: G01B11/02 ,  H04N13/00 ,  H04N3/00

CPC classification number: G01B11/024

公开(公告)号：EP3635771A1

公开(公告)日：2020-04-15

申请号：EP18814215.2

申请日：2018-06-08

Applicant: Rudolph Technologies, Inc.

Inventor： SCHAEFER, John ,  VOGES, Christopher ,  SMITH, Nicholas ,  TREPTAU, Jeff

IPC: H01L21/66 ,  G02B21/02

公开(公告)号：EP1417450B1

公开(公告)日：2017-12-27

申请号：EP02775693.1

申请日：2002-07-12

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： MORATH, Christopher ,  STONER, Robert, J.

IPC: G01B11/06 ,  G01B11/28 ,  G01N21/17

CPC classification number: G01B11/0666 ,  G01B11/28 ,  G01N21/1702 ,  G01N2021/1706

Abstract: An apparatus for improving the signal to noise ratio of measurements of the thickness of layers in a thin film stack uses a photoacoustic measurement system that includes a time differentiation system for inducing a delay in pump beam pulses. The time differentiation system uses, among other things, a birefringent element and other elements to control the polarization of pump beam pulses. Use of the apparatus involves applying a time varying voltage to an electro-optic modulator driver and setting a time differentiation step; or, in another embodiment, applying a time varying voltage to an electro-optic modulator to induce a fixed time delay delta-t between a vertically polarized pulse and a horizontally polarized pulse. The high frequency operation of the system provides for improved determinations of film thickness.

公开(公告)号：EP2904455A1

公开(公告)日：2015-08-12

申请号：EP13774337.3

申请日：2013-09-27

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： DONAHER, J., Casey ,  SIMPSON, Craig ,  DUFAULT, Peter John, Gerard

IPC: G03F7/20 ,  H02K41/03

CPC classification number: G03F7/70716 ,  G03F7/70758 ,  H02K41/02 ,  H02K41/031 ,  H02K2201/18

Abstract: A planar motor system (800) comprises a platen (802) with a first planar motor component and a stage (812) with a second planar motor component (1010, 1012, 1020, 1022). The stage can move along a first cardinal axis (X) or a second cardinal axis (Y). The planar motor system further comprises a drive system (1050). When the drive system is energized in a first drive configuration, it applies a first force and a second force. The first force and the second force are not parallel to any cardinal axis. A vector sum of the first force and the second force is parallel to the first cardinal axis. When the drive system is energized in a second drive configuration, it applies a third force and a fourth force. The third force and the fourth force are not parallel to any cardinal axis. A vector sum of the third force and the fourth force is parallel to the second cardinal axis.

公开(公告)号：EP1817542A1

公开(公告)日：2007-08-15

申请号：EP04794682.7

申请日：2004-10-07

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： LEARY, Sean P. ,  TAS, Guray ,  MORATH, Christopher, J. ,  KOTELYANSKII, Michael ,  ZHENG, Tong ,  LAZAROV, Guenadiy ,  MILLER, Andre, D. ,  ANTONELLI, George, A. ,  LUDKE, Jamie L.

IPC: G01B9/02

CPC classification number: G01N21/211 ,  G01N21/8422

Abstract: An optical metrology system (50) is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films (310) such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse (325)focused onto a wafer surface, measuring a first set of x1, y1 and z1 coordinates (330) moving the wafer in the z direction, directing the light pulse (325) onto the wafer surface and measuring a second set of x2, y2 and z2 coordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5 % or below.

公开(公告)号：EP1247079A4

公开(公告)日：2007-05-30

申请号：EP01932496

申请日：2001-01-08

Applicant: RUDOLPH TECHNOLOGIES INC

Inventor： WAGNER JEFF A

IPC: G01J4/00 ,  G01N21/21

CPC classification number: G01J4/00 ,  G01N21/211

Abstract: An improved ellipsometry method and a self-correcting simultaneous multiple angle/multiple wavelength return path ellipsometer (20) are disclosed which allow for simultaneous measurement at multiple angles of incidence in a manner which permits separation of instrument error from the measured properties. Non-sample optical system ellipsometric effects of the ellipsometer are measured and the measured changes in polarization state are corrected to eliminate errors introduced thereby. The disclosed embodiment is self-correcting by way of a convex reflector (6) which can be inserted into and removed from the optical path of the beam of polarized light between a focusing optic (5) and the sample optical system (7) under study. The convex reflector (6) when inserted into the optical path causes the light rays of the beam of polarized light in each of the plurality of angles of incidence to retrace its path through the focusing optic (5) for detection by a detector array (10) without undergoing reflection and re-reflection as during a sample measurement configuration of the ellipsometer (20) is removed from the optical path.

公开(公告)号：EP1417450A2

公开(公告)日：2004-05-12

申请号：EP02775693.1

申请日：2002-07-12

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： MORATH, Christopher ,  STONER, Robert, J.

IPC: G01B11/06 ,  G01B9/02

CPC classification number: G01B11/0666 ,  G01B11/28 ,  G01N21/1702 ,  G01N2021/1706

Abstract: An apparatus for improving the signal to noise ratio of measurement of the thickness of layers in a thin film stack uses a photoa coustic measurement system (75) that includes a time differentiation system (130) for inducing a delay in pump beam pulses (125A). The time differentiation system (130) uses, among other things, a birefringent element and other elements to control the polarization of pump beam pulses (125A). Use of the apparatus involves applying a time varying voltage to an electro-optic modulator driver and setting a time differentiation step; or, in another embodiment, applying a time varying voltage to an electro-optic modulator to induce a fixed time delay delta-t between a vertically polarized pulse and a horizontally polarized pulse. The high frequency operation of the system provides for improved determinations of film thickness.

公开(公告)号：EP1247079A1

公开(公告)日：2002-10-09

申请号：EP01932496.1

申请日：2001-01-08

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： WAGNER, Jeff, A.

IPC: G01J4/00

CPC classification number: G01J4/00 ,  G01N21/211

Abstract: An improved ellipsometry method and a self-correcting simultaneous multiple angle/multiple wavelength return path ellipsometer (20) are disclosed which allow for simultaneous measurement at multiple angles of incidence in a manner which permits separation of instrument error from the measured properties. Non-sample optical system ellipsometric effects of the ellipsometer are measured and the measured changes in polarization state are corrected to eliminate errors introduced thereby. The disclosed embodiment is self-correcting by way of a convex reflector (6) which can be inserted into and removed from the optical path of the beam of polarized light between a focusing optic (5) and the sample optical system (7) under study. The convex reflector (6) when inserted into the optical path causes the light rays of the beam of polarized light in each of the plurality of angles of incidence to retrace its path through the focusing optic (5) for detection by a detector array (10) without undergoing reflection and re-reflection as during a sample measurement configuration of the ellipsometer (20) is removed from the optical path.

公开(公告)号：EP2446468B1

公开(公告)日：2020-04-22

申请号：EP10792434.2

申请日：2010-06-14

Applicant: Rudolph Technologies, Inc.

Inventor： Marx, David S. ,  Grant, David L.

IPC: H01L21/66 ,  G01B11/22