APPARATUS AND METHOD FOR USE IN CHEMICAL-MECHANICAL POLISHING PROCEDURES
    1.
    发明公开
    APPARATUS AND METHOD FOR USE IN CHEMICAL-MECHANICAL POLISHING PROCEDURES 失效
    用于化学机械抛光程序的装置和方法

    公开(公告)号:EP0771235A1

    公开(公告)日:1997-05-07

    申请号:EP95927147.0

    申请日:1995-07-13

    IPC分类号: B24B57 B01J4 B24B37 C09K3 G01F11

    摘要: The present invention is an improved apparatus and method for mixing, storing, and delivering slurry chemicals (12, 14, 16) for use in manufacturing operations (18a, 18b, 18c). The present invention is particularly directed to the effective production and handling of slurry chemicals for use in chemical-mechanical polishing (CMP) processes, where process chemicals tend to be highly abrasive and often difficult to produce and handle. The apparatus (10) of the present invention provides a wide variety of mixing and handling options that have previously been unavailable.

    摘要翻译: 本发明是用于混合,储存和输送用于制造操作(18a,18b,18c)的浆料化学品(12,14,16)的改进设备和方法。 本发明特别涉及用于化学机械抛光(CMP)工艺中的浆料化学品的有效生产和处理,其中工艺化学品倾向于具有高磨蚀性并且通常难以生产和处理。 本发明的设备(10)提供了以前不可用的各种各样的混合和处理选项。