摘要:
An electrostatic chuck (20) for holding a substrate in a process chamber (80), having a voltage supply terminal (65) for charging the chuck. The chuck includes an electrostatic member (25) comprising at least one electrode (30) covered by an electrically insulated holding surface (40) for holding a substrate thereon, and an electrical contact surface (48) for providing charge to the electrode. A unidirectionally conducting coupler (70) electrically couples the contact surface (48) of the electrostatic member to the voltage supply terminal (65) to conduct charge substantially only in a single direction from the terminal to the contact surface. Preferably, an electrical connector (50) having a junction surface (55) is bonded to the electrical contact surface (48), and a terminal surface (60) for electrically contacting the voltage supply terminal, electrically couples the unidirectionally conducting coupler (70) to the voltage supply terminal (65).
摘要:
An electrostatic chuck (20) for holding a substrate in a process chamber (80), having a voltage supply terminal (65) for charging the chuck. The chuck includes an electrostatic member (25) comprising at least one electrode (30) covered by an electrically insulated holding surface (40) for holding a substrate thereon, and an electrical contact surface (48) for providing charge to the electrode. A unidirectionally conducting coupler (70) electrically couples the contact surface (48) of the electrostatic member to the voltage supply terminal (65) to conduct charge substantially only in a single direction from the terminal to the contact surface. Preferably, an electrical connector (50) having a junction surface (55) is bonded to the electrical contact surface (48), and a terminal surface (60) for electrically contacting the voltage supply terminal, electrically couples the unidirectionally conducting coupler (70) to the voltage supply terminal (65).