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公开(公告)号:EP0735575B1
公开(公告)日:2002-01-02
申请号:EP96200869.4
申请日:1996-03-29
IPC分类号: H01L21/00
CPC分类号: H01L21/67115
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公开(公告)号:EP0735575A1
公开(公告)日:1996-10-02
申请号:EP96200869.4
申请日:1996-03-29
IPC分类号: H01L21/00
CPC分类号: H01L21/67115
摘要: Vertical furnace for processing wafers positioned on a support structure. The furnace comprises an inner sleeve, heating means and an outer sleeve. To support the inner sleeve on the support structure a support sleeve is provided engaging with its top end lower part of the inner sleeve and resting with its lower end on the support structure.
摘要翻译: 用于处理位于支撑结构上的晶圆的立式炉。 炉包括内套筒,加热装置和外套筒。 为了支撑支撑结构上的内套筒,提供支撑套筒,其与内套筒的顶端下部接合,并将其下端搁置在支撑结构上。
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