专利检索 ap:("ASML Netherlands B.V.") AND inv:"ABEGG, Erik Achilles" 第 1 页

1.

发明公开
A METHOD OF MANUFACTURING A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A LITHOGRAPHIC APPARATUS, A DEVICE MANUFACTURING METHOD, AN APPARATUS FOR PROCESSING A PELLICLE, AND A METHOD FOR PROCESSING A PELLICLE 审中-公开

公开(公告)号：EP3365730A2

公开(公告)日：2018-08-29

申请号：EP16788043.4

申请日：2016-10-11

申请人： ASML Netherlands B.V.

发明人： PÉTER, Mária , ABEGG, Erik Achilles , GIESBERS, Adrianus Johannes Maria , KLOOTWIJK, Johan Hendrik , NASALEVICH, Maxim Aleksandrovich , VAN DEN EINDEN, Wilhelmus Theodorus Anthonius Johannes , VAN DER ZANDE, Willem Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes Petrus Martinus Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter

IPC分类号： G03F7/20 , B01D67/00 , G03F1/62 , G21K1/06

CPC分类号： G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067

摘要： Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer on a planar surface of a substrate. The substrate comprises a first substrate portion and a second substrate portion. The method further comprises removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.