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    MULTILAYER FILM REFLECTOR AND X-RAY EXPOSURE SYSTEM
    1.
    发明公开
    MULTILAYER FILM REFLECTOR AND X-RAY EXPOSURE SYSTEM 审中-公开

    公开(公告)号：EP3389056A1

    公开(公告)日：2018-10-17

    申请号：EP18168175.0

    申请日：2004-05-24

    申请人： Nikon Corporation

    发明人： Shiraishi, Masayuki

    IPC分类号： G21K1/06

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70233 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  H01L21/0332

    摘要： A multilayer film reflector (61) having a first multilayer film (67) obtained by forming Mo layers (672) and Si layers (673) alternatively on a substrate (63), and a second multilayer film (65) obtained by forming Mo layers (651) and Si layers (653) alternatively on the first multilayer film (67), wherein the Mo layer in the first multilayer film has a thickness substantially equal to or smaller than that of the Mo layer in the second multilayer film and the ratio of thickness between the Mo layer and Si layer in the first multilayer is different from the ratio of thickness in the second multilayer film. A multilayer film reflector of low internal stress in which lowering of reflectivity is suppressed can thereby be obtained.

    PHASENKONTRAST-RÖNTGENBILDGEBUNGSVORRICHTUNG UND BRECHUNGSGITTER FÜR EINE SOLCHE
    9.
    发明公开
    PHASENKONTRAST-RÖNTGENBILDGEBUNGSVORRICHTUNG UND BRECHUNGSGITTER FÜR EINE SOLCHE 有权
    富士康特公司

    公开(公告)号：EP2979276A1

    公开(公告)日：2016-02-03

    申请号：EP14724384.4

    申请日：2014-05-07

    申请人： Siemens Aktiengesellschaft

    发明人： PREUSCHE, Oliver

    IPC分类号： G21K1/06

    CPC分类号： G21K1/065 ,  G21K2201/067 ,  G21K2207/005

    摘要： The invention relates to a refracting grid (G
    L ) for a phase contrast x-ray imaging device. The refracting grid (G
    L ) is formed by a plurality of refracting bars (14) made of a visually comparably thin base material, which refracting bars (14) are arranged in alternation, having visually more dense intermediate spaces (16). The refracting bars (14) are designed such that they divide a transversal surface (10) to be aligned crosswise to the incident radiation into elongated, parallel refracting strips (12), wherein adjacent refracting strips (12) are always aligned to different focus points (F). The refracting bars (14) extend diagonally to the longitudinal direction of the refracting strips (12), at least in sections, wherein the lateral surfaces (18) of at least one refracting bar (14) extend over a plurality of refracting strops (12).

    摘要翻译： 本发明涉及一种用于相位X射线成像装置的折射网格（G L）。 折射栅格（G L）由多个由视觉上相当薄的基材制成的折射棒（14）形成，折射棒（14）交替布置，具有视觉上更致密的中间空间（16）。 折射杆（14）被设计成使得它们分开横向表面（10）以与入射辐射交叉对准成细长的平行折射条（12），其中相邻的折射条（12）总是对准不同的聚焦点 （F）。 所述折射杆（14）至少在部分上沿折射条（12）的纵向方向对角延伸，其中至少一个折射杆（14）的侧表面（18）在多个折射杆（12）上延伸 ）。

    STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND TALBOT INTERFEROMETER
    10.
    发明公开
    STRUCTURE, METHOD FOR MANUFACTURING THE SAME, AND TALBOT INTERFEROMETER 审中-公开
    STRUKTUR，VERFAHREN ZUR HERSTELLUNG DAVON UND TALBOT-INTERFEROMETER

    公开(公告)号：EP2977992A1

    公开(公告)日：2016-01-27

    申请号：EP15176032.9

    申请日：2015-07-09

    申请人： Canon Kabushiki Kaisha

    发明人： TESHIMA, Takayuki ,  OKA, Arisa

    IPC分类号： G21K1/10

    CPC分类号： A61B6/484 ,  A61B6/032 ,  A61B6/4035 ,  C25D5/02 ,  G21K1/062 ,  G21K1/067 ,  G21K1/10 ,  G21K2201/061 ,  G21K2201/067 ,  G21K2207/005

    摘要： A structure includes a silicon substrate (1) having a plurality of recessed portions (2), each having a bottom (3) and a side wall (7), silicide layers (4), one each in contact with the bottoms of the recessed portions, and a metal structure (5) including metal portions, one each disposed in the recessed portions and in contact with the silicide layers. The silicide layers are electrically connected to each other through the silicon substrate.

    摘要翻译： 一种结构包括具有多个凹部（2）的硅基板（1），每个具有底部（3）和侧壁（7），硅化物层（4），每个与凹陷部分 部分以及包括金属部分的金属结构（5），每个都设置在凹部中并与硅化物层接触。 硅化物层通过硅衬底彼此电连接。