公开(公告)号：EP4400913A1

公开(公告)日：2024-07-17

申请号：EP23151845.7

申请日：2023-01-16

申请人： ASML Netherlands B.V.

发明人： CALADO, Victor Emanuel ,  VAN LEEST, Adriaan Johan ,  THISSEN, Nick Franciscus Wilhelmus ,  MATHIJSSEN, Simon Gijsbert Josephus

IPC分类号： G03F7/00

CPC分类号： G03F7/70558 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/706837

摘要： Disclosed is a method of determining at least one exposure parameter such as focus and/or dose. The method comprises obtaining product metrology data for a plurality of structures; grouping said product metrology data into a plurality of neighbor groups, each neighbor group describing a different arrangement of said structures; obtaining pre-calibrated sensitivity relationship data for each of said plurality of neighbor groups or different combinations thereof, and inferring said at least one exposure parameter from the product metrology data and pre-calibrated sensitivity relationship data.

公开(公告)号：EP3336607A1

公开(公告)日：2018-06-20

申请号：EP16204764.1

申请日：2016-12-16

申请人： ASML Netherlands B.V.

发明人： WARNAAR, Patrick ,  VAN DER SCHAAR, Maurits ,  GRZELA, Grzegorz ,  KOOP, Erik Johan ,  CALADO, Victor Emanuel ,  ZENG, Si-Han

IPC分类号： G03F7/20

CPC分类号： G03F7/7065 ,  G01N21/47 ,  G03F7/70633

摘要： A method of measuring a property of a substrate, the substrate having a plurality of targets formed thereon, the method comprising:
measuring N targets of the plurality of targets using an optical measurement system, where N is an integer greater than 2 and each of said N targets is measured W t times, where W t is an integer greater than 2 so as to obtain N*W t measurement values; and
determining R property values using Q equations and the N*W t measurement values, where R t ;
wherein the optical measurement system has at least one changeable setting and, for each of the N targets, measurement values are obtained using different setting values of at least one changeable setting.