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    EXPOSURE UNIT WITH IMPROVED LIGHT INTENSITY UNIFORMNESS FOR EXPOSING A RELIEF PLATE PRECURSOR
    1.
    发明公开
    EXPOSURE UNIT WITH IMPROVED LIGHT INTENSITY UNIFORMNESS FOR EXPOSING A RELIEF PLATE PRECURSOR 审中-公开

    公开(公告)号：EP4411476A1

    公开(公告)日：2024-08-07

    申请号：EP24155747.9

    申请日：2024-02-05

    申请人： XSYS Prepress NV

    发明人： WATTYN, Bart Marc Luc ,  DE RAUW, Dirk Ludo Julien

    IPC分类号： G03F7/00 ,  F21V8/00 ,  G03F7/20 ,  G03F7/24

    CPC分类号： G03F7/2004 ,  G03F7/201 ,  G03F7/24 ,  G03F7/202 ,  G03F7/2008 ,  G03F7/70558

    摘要： Exposure unit (10) for exposing a relief plate precursor, said exposure unit (10) comprising: a support structure (12) with a support surface (14) configured for supporting a relief plate precursor; a plurality of UV light sources (16) arranged next to each other and configured to emit UV light to a side of the relief plate precursor, said plurality of UV light sources (16) covering a light source area (LA) parallel to the support surface (14); and a light adjustment structure (20) configured to block and/or reflect a portion of the light emitted by the plurality of UV light sources (16) so as to render a light intensity measured in the support surface (14) more uniform as compared to a situation without the light adjustment structure (20); wherein the light adjustment structure (20) is arranged at least partially between the light source area (LA) and the support surface (14).

    METHOD FOR PRINTING COLOUR IMAGES
    5.
    发明公开
    METHOD FOR PRINTING COLOUR IMAGES 有权
    打印彩色图像的方法

    公开(公告)号：EP3237973A1

    公开(公告)日：2017-11-01

    申请号：EP15831071.4

    申请日：2015-12-18

    申请人： Eulitha A.G.

    发明人： SOLAK, Harun H. ,  DAIS, Christian ,  CLUBE, Francis

    IPC分类号： G03F7/00 ,  G03F7/20

    CPC分类号： G03F7/70466 ,  G02B5/008 ,  G02B5/1809 ,  G02B5/204 ,  G03F7/0007 ,  G03F7/40 ,  G03F7/70408 ,  G03F7/7045 ,  G03F7/70558

    摘要： A method forms a pattern of metallic nanofeatures that generates by plasmonic resonance a desired image having a distribution of colors. The method includes providing a substrate having a layer of photosensitive material, exposing the layer to a high-resolution periodic pattern of dose distribution, and determining a low-resolution pattern of dose distribution such that the sum of the low-resolution pattern and the high-resolution periodic pattern of dose distribution is suitable for forming the pattern of metallic nanofeatures. The lateral dimensions of the metallic nano-features have a spatial variation across the pattern that corresponds to the distribution of colors in the desired image. The layer of photosensitive material is exposed to the low-resolution pattern of dose distribution. The layer of photosensitive material is developed to produce a pattern of nanostructures in the developed photosensitive material. The pattern of nanostructures is processed so that the pattern of metallic nanofeatures is formed.

    摘要翻译： 一种用于形成通过等离子体激元共振产生具有颜色分布的期望图像的金属纳米特征图案的方法，该方法包括提供具有光敏材料层的基底，将该层暴露于剂量分布的高分辨率周期性图案， 确定剂量分布的至少一个低分辨率图案，使得剂量分布的至少一个低分辨率图案和剂量分布的高分辨率周期图案的总和适合于形成金属纳米特征的图案，其中侧向 所述金属纳米特征的尺寸在图案上具有对应于期望图像中的颜色分布的空间变化，将感光材料层暴露于所述至少一个低分辨率剂量分布图案，将感光材料层显影为 在显影的感光材料中产生纳米结构图案， 处理纳米结构的图案，使得金属纳米特征的图案形成为横跨对应于期望图像中的颜色分布的图案的横向尺寸的所述空间变化。

    EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    9.
    发明公开
    EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    曝光方法，曝光装置以及元件制造工艺

    公开(公告)号：EP1895570A4

    公开(公告)日：2011-03-09

    申请号：EP06756474

    申请日：2006-05-23

    申请人： NIPPON KOGAKU KK

    发明人： UEHARA YUSAKU ,  SUZUKI KOUSUKE ,  NAKANO KATSUSHI ,  OMURA YASUHIRO

    IPC分类号： H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/70558

    摘要： An exposure apparatus (100) is provided with an optical system including a liquid (Lq1), a sensor system (46) for acquiring energy information of an energy beam (IL) which is incident on the liquid, and a controller 50 which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object (W) based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.