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    COMPONENT FOR A LITHOGRAPHY TOOL, LITHOGRAPHY APPARATUS, INSPECTION TOOL AND A METHOD OF MANUFACTURING A DEVICE
    1.
    发明公开
    COMPONENT FOR A LITHOGRAPHY TOOL, LITHOGRAPHY APPARATUS, INSPECTION TOOL AND A METHOD OF MANUFACTURING A DEVICE 有权
    光刻设备的组件，光刻设备，检查工具和制造设备的方法

    公开(公告)号：EP3213149A1

    公开(公告)日：2017-09-06

    申请号：EP15778638.5

    申请日：2015-10-08

    申请人： ASML Netherlands B.V.

    发明人： VAN DE RIJDT, Johannes Hubertus Antonius

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709

    摘要： A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.

    摘要翻译： 一种用于光刻工具的部件，所述部件包括：·具有主表面（53）的构件（50）; ·导管（51），限定在所述构件内并构造成接收处于压力下的流体; ·构件内的可压缩区域（52a，52b），其位于导管和主表面之间; 以及·可压缩区域与导管之间的可变形区域（55） 其中所述可压缩区域和所述可变形区域构造成适应由所述流体的压力引起的所述构件的局部变形。

    Apparatus and method for providing fluid for immersion lithography
    2.
    发明授权
    Apparatus and method for providing fluid for immersion lithography 有权
    装置和方法用于提供流体用于浸没式光刻

    公开(公告)号：EP2960702B1

    公开(公告)日：2017-02-22

    申请号：EP15158998.3

    申请日：2004-07-16

    申请人： Nikon Corporation

    发明人： Poon, Alex Ka Tim ,  Kho, Leonard Wai Fung

    IPC分类号： G03F7/20 ,  G02B21/00 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70858

    摘要： Embodiments of the present invention are directed to a system and a method of controlling the flow and pressure of immersion fluid to provide stable conditions for immersion lithography. An immersion fluid is provided in a space (34) between a last optical element of an optical projection system and a workpiece during the immersion lithography process. For this purpose,a nozzle (20) is provided configured to supply immersion fluid in the gap between the last optical element and the workpiece, wherein the nozzle includes an inner cavity (34) to retain the immersion fluid in the gap and an outer cavity (53) to recover immersion fluid that exits the inner cavity.

    APPARATUS AND METHOD FOR PROVIDING FLUID FOR IMMERSION LITHOGRAPHY
    5.
    发明授权
    APPARATUS AND METHOD FOR PROVIDING FLUID FOR IMMERSION LITHOGRAPHY 有权
    装置和方法用于提供流体的浸液光刻

    公开(公告)号：EP1660925B1

    公开(公告)日：2015-04-29

    申请号：EP04778426.9

    申请日：2004-07-16

    申请人： NIKON CORPORATION

    发明人： POON, Alex Ka Tim ,  KHO, Leonard Wai Fung

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70858

    摘要： Embodiments of the present invention are directed to a system and a method of controlling the flow and pressure of immersion fluid to provide stable conditions for immersion lithography. An immersion fluid is provided in a space (34) between a last optical element of an optical projection system and a workpiece during the immersion lithography process. For this purpose,a nozzle (20) is provided configured to supply immersion fluid in the gap between the last optical element and the workpiece, wherein the nozzle includes an inner cavity (34) to retain the immersion fluid in the gap and an outer cavity (53) to recover immersion fluid that exits the inner cavity.

    EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
    6.
    发明公开
    EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD 审中-公开
    曝光装置及设备的位置，宁可程序

    公开(公告)号：EP2585873A1

    公开(公告)日：2013-05-01

    申请号：EP11728429.9

    申请日：2011-06-09

    申请人： Canon Kabushiki Kaisha

    发明人： UCHIDA, Shinji

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70716 ,  G03F7/70858

    摘要： The present invention provides an exposure apparatus which forms a pattern on a substrate, the apparatus including an electron optical system (10) configured to guide a charged particle beam onto the substrate (ST), a stage (20) configured to hold the substrate, an electromagnetic actuator (32) configured to drive the stage, a magnetic shield (34) which is placed in the stage so as to surround the electromagnetic actuator, a measurement member (50) configured to measure a position of the stage, a coil member (60) configured to generate a magnetic field on a path of the charged particle beam between the electron optical system and the substrate, and a control member (90) configured to control the coil member so as to reduce a fluctuation of the magnetic field on the path, the magnetic field on the path fluctuating while the stage being driven by the electromagnetic actuator, based on the position of the stage measured by the measurement member.