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公开(公告)号：EP3514630A1
公开(公告)日：2019-07-24
申请号：EP19152558.3
申请日：2014-06-17
发明人： NIKIPELOV, Andrey , FRIJNS, Olav Waldemar Vladimir , DE VRIES, Gosse Charles , LOOPSTRA, Erik Roelof , BANINE, Vadim Yevgenyevich , DE JAGER, Pieter Willem Herman , DONKER, Rilpho Ludovicus , NIENHUYS, Han-Kwang , KRUIZINGA, Borgert , ENGELEN, Wouter Joep , LUITEN, Otger Jan , AKKERMANS, Johannes Antonius Gerardus , GRIMMINCK, Leonardus Adrianus Gerardus , LITVINENKO, Vladimir
IPC分类号： G03F7/20 , H05H7/04 , G01J1/26 , G02B1/06 , G02B5/20 , G01J1/04 , G21K1/10 , H01S3/09 , G01J1/42 , G02B26/02 , H01S3/00
摘要： A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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2.发明公开
公开(公告)号：EP3488293A1
公开(公告)日：2019-05-29
申请号：EP17730175.1
申请日：2017-06-16
发明人： BUTLER, Hans , GEUPPERT, Bernhard, Mathias , LOOPSTRA, Erik Roelof , WIJCKMANS, Maurice Willem Jozef Etiënne
IPC分类号： G03F7/20
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公开(公告)号：EP3221748A2
公开(公告)日：2017-09-27
申请号：EP15794923.1
申请日：2015-11-16
发明人： VAN DER MEULEN, Frits , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald Harm Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LOOPSTRA, Erik Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , DE KLERK, Angelo Cesar Peter , DINGS, Jacobus Maria , JANSSEN, Maurice Leonardus Johannes , KERSTENS, Roland Jacobus Johannes , KESTERS, Martinus Jozef Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester Matheus , THEUERZEIT, Frank Johannes Christiaan , VAN LIEVENOOGEN, Anne Johannes Wilhelmus
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译： 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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公开(公告)号：EP3221747A2
公开(公告)日：2017-09-27
申请号：EP15794591.6
申请日：2015-11-16
发明人： KRUIZINGA, Matthias , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BOGAART, Erik Willem , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , BRULS, Richard Joseph , DEKKERS, Jeroen , JANSSEN, Paul , KAMALI, Mohammad Reza , KRAMER, Ronald Harm Gunther , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LIPSON, Matthew , LOOPSTRA, Erik Roelof , LYONS, Joseph H. , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译： 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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