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公开(公告)号：EP3514630A1
公开(公告)日：2019-07-24
申请号：EP19152558.3
申请日：2014-06-17
发明人： NIKIPELOV, Andrey , FRIJNS, Olav Waldemar Vladimir , DE VRIES, Gosse Charles , LOOPSTRA, Erik Roelof , BANINE, Vadim Yevgenyevich , DE JAGER, Pieter Willem Herman , DONKER, Rilpho Ludovicus , NIENHUYS, Han-Kwang , KRUIZINGA, Borgert , ENGELEN, Wouter Joep , LUITEN, Otger Jan , AKKERMANS, Johannes Antonius Gerardus , GRIMMINCK, Leonardus Adrianus Gerardus , LITVINENKO, Vladimir
IPC分类号： G03F7/20 , H05H7/04 , G01J1/26 , G02B1/06 , G02B5/20 , G01J1/04 , G21K1/10 , H01S3/09 , G01J1/42 , G02B26/02 , H01S3/00
摘要： A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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公开(公告)号：EP4017221A1
公开(公告)日：2022-06-22
申请号：EP20216083.4
申请日：2020-12-21
发明人： SMORENBURG, Petrus Wilhelmus , LUITEN, Otger Jan , SCHAAP, Brian Herman , FRANSSEN, Jim Gerardus Hubertus
摘要： A method for controlling a density distribution of electrons provided by an electron source for use in hard X-ray, soft X-ray and/or extreme ultraviolet generation, the method comprising generating a plurality of electrons from a pattern of ultracold excited atoms using an ionization laser inside a cavity, wherein the electrons have a density distribution determined by at least one of the patterns of excited atoms and the ionization laser, and accelerating the electrons out of the cavity using a non-static acceleration profile, wherein the acceleration profile controls the density distribution of the electrons as they exit the cavity.
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