公开(公告)号：EP4455783A1

公开(公告)日：2024-10-30

申请号：EP23169511.5

申请日：2023-04-24

申请人： ASML Netherlands B.V.

发明人： DE HOOGH, Joost ,  NAKIBOGLU, Günes ,  JACOBS, Johannes, Henricus, Wilhelmus ,  MCGRAW, Aaron ,  DIRECKS, Daniel, Jozef, Maria

IPC分类号： G03F7/00

摘要： A vacuum system configured to provide a vacuum to a heat transfer fluid of a fluid-conditioned lithographic system element, the vacuum system comprising: a venturi, configured to generate a partial vacuum; and a buffer vessel, configured to contain a partial vacuum. The buffer vessel is in fluid communication with a constriction of the venturi, and the buffer vessel is further configured to be in fluid communication with a heat transfer fluid of a fluid-conditioned lithographic system element.