摘要:
A silencer is configured to silence an acoustic wave in a thermal conditioning fluid in a thermal conditioning fluid duct and comprises an open inlet configured to be connected to the thermal conditioning fluid duct to be in fluid communication with the thermal conditioning fluid in the thermal conditioning fluid duct, a silencer housing comprising an inner cavity connected to the open inlet, a compliant member which divides the inner cavity into a thermal conditioning fluid cavity and a substantially closed gas cavity, wherein the thermal conditioning fluid cavity is connected to the inlet, an inlet duct configured to receive the thermal conditioning fluid, and an outlet duct wherein the silencer further comprises a plurality of parallel ducts each forming a fluid channel, the plurality of parallel ducts arranged in at least one of the inlet duct and the outlet duct.
摘要:
The invention provides a temperature conditioning system using conditioning liquid to condition a temperature of an object, comprising a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.
摘要:
A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
摘要:
A vacuum system configured to provide a vacuum to a heat transfer fluid of a fluid-conditioned lithographic system element, the vacuum system comprising: a venturi, configured to generate a partial vacuum; and a buffer vessel, configured to contain a partial vacuum. The buffer vessel is in fluid communication with a constriction of the venturi, and the buffer vessel is further configured to be in fluid communication with a heat transfer fluid of a fluid-conditioned lithographic system element.
摘要:
A silencer is configured to silence an acoustic wave in a thermal conditioning fluid in a thermal conditioning fluid duct. The silencer comprises an open inlet configured to be connected to the thermal conditioning fluid duct to be in fluid communication with the thermal conditioning fluid, a silencer housing comprising an inner cavity connected to the open inlet, a compliant member arranged in the inner cavity, wherein the compliant member divides the inner cavity into a thermal conditioning fluid cavity and a gas cavity, wherein the thermal conditioning fluid cavity is connected to the open inlet and wherein the gas cavity forms a substantially closed space, wherein the gas cavity comprises a plurality of gas channels extending in a direction substantially perpendicular to a surface of the compliant member facing the gas cavity.
摘要:
A silencer is configured to silence an acoustic wave in a thermal conditioning fluid at a target frequency. The silencer comprises an open inlet to be connected to a thermal conditioning fluid duct to be in fluid communication with the thermal conditioning fluid in the duct, a closed end to reflect the acoustic wave in the thermal conditioning fluid, and a silencer duct forming a thermal conditioning fluid passage therebetween. The silencer is configured to silence the acoustic wave. The silencer duct comprises a three dimensional shape configured to provide at least one revolution in the thermal conditioning fluid passage The silencer duct comprises a viscoelastic material.