VACUUM SYSTEM
    5.
    发明公开
    VACUUM SYSTEM 审中-公开

    公开(公告)号:EP4455783A1

    公开(公告)日:2024-10-30

    申请号:EP23169511.5

    申请日:2023-04-24

    IPC分类号: G03F7/00

    摘要: A vacuum system configured to provide a vacuum to a heat transfer fluid of a fluid-conditioned lithographic system element, the vacuum system comprising: a venturi, configured to generate a partial vacuum; and a buffer vessel, configured to contain a partial vacuum. The buffer vessel is in fluid communication with a constriction of the venturi, and the buffer vessel is further configured to be in fluid communication with a heat transfer fluid of a fluid-conditioned lithographic system element.