公开(公告)号：EP1400854A3

公开(公告)日：2009-07-08

申请号：EP03077974.8

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Van Bilsen, Franciscus Bernardus Maria ,  Burghoorn, Jacobus ,  Van Haren, Richard Johannes Franciscus ,  Van Hinnen, Paul Christiaan ,  Van Horssen, Hermanus Gerardus ,  Huijbregtse, Jeroen ,  Jeunink, Andre Bernardus ,  Megens, Henry ,  Navarro Y Koren, Ramon ,  Tolsma, Hoite Pieter Theodoor ,  Simons, Hubertus Johannes Gertrudus ,  Schuurhuis, Johny Rutger ,  Schets, Sicco Ian ,  Lee, Brian ,  Dunbar, Allan

IPC分类号： G03F7/20

CPC分类号： G03F9/7049 ,  G03F7/70483 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7084 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.

公开(公告)号：EP1400859A3

公开(公告)日：2009-07-01

申请号：EP03077973.0

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Navarro Y Koren, Ramon ,  Simons, Hubertus Johannes Gertrudus ,  Jeunink, André Bernardus

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7088 ,  G03F7/70483 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus, comprising:
a source of alignment radiation having a first wavelength and a second wavelength;
a detection system comprising a first wavelength channel arranged to receive alignment radiation from an alignment mark at said first wavelength and a second wavelength channel arranged to receive alignment radiation from said alignment mark at said second wavelength; and
a position determining unit in communication with said detection system,
   wherein said position determining unit processes information from said first and second wavelength channels in combination to determine a position of said alignment mark based on one of information from said first wavelength channel, information from said second wavelength channel and combined information from said first and second wavelength channels according to a relative strength of said alignment radiation detected at said first wavelength to alignment radiation detected at said second wavelength.

公开(公告)号：EP1400859A2

公开(公告)日：2004-03-24

申请号：EP03077973.0

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Navarro Y Koren, Ramon ,  Simons, Hubertus Johannes Gertrudus ,  Jeunink, André Bernardus

IPC分类号： G03F9/00

CPC分类号： G03F9/7088 ,  G03F7/70483 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus, comprising:

a source of alignment radiation having a first wavelength and a second wavelength;
a detection system comprising a first wavelength channel arranged to receive alignment radiation from an alignment mark at said first wavelength and a second wavelength channel arranged to receive alignment radiation from said alignment mark at said second wavelength; and
a position determining unit in communication with said detection system,
   wherein said position determining unit processes information from said first and second wavelength channels in combination to determine a position of said alignment mark based on one of information from said first wavelength channel, information from said second wavelength channel and combined information from said first and second wavelength channels according to a relative strength of said alignment radiation detected at said first wavelength to alignment radiation detected at said second wavelength.

摘要翻译： 用于光刻设备的对准系统，包括：具有第一波长和第二波长的对准辐射的源; 的检测系统包括被布置为在所述第一波长和设置成接收来自于所述第二波长，所述对准标记对准辐射的第二波长信道从在对准标记对准接收辐射的第一波长信道; 并在与所述的检测系统，€ƒ€ƒ€ƒwherein通信的位置确定的挖掘单元，所述位置确定挖掘单元从所述组合确定性矿处理信息的第一和第二波长信道，所述对准标记的基础上的信息的一个从所述第一波长的位置 信道，从所述第二波长信道信息和合并信息，从所述第一和第二波长信道gemäß到在所述第一波长检测到在所述第二波长检测的对准辐射所述对准辐射的相对强度。

公开(公告)号：EP1400854A2

公开(公告)日：2004-03-24

申请号：EP03077974.8

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Van Bilsen, Franciscus Bernardus Maria ,  Burghoorn, Jacobus ,  Van Haren, Richard Johannes Franciscus ,  Van Hinnen, Paul Christiaan ,  Van Horssen, Hermanus Gerardus ,  Huijbregtse, Jeroen ,  Jeunink, Andre Bernardus ,  Megens, Henry ,  Navarro Y Koren, Ramon ,  Tolsma, Hoite Pieter Theodoor ,  Simons, Hubertus Johannes Gertrudus ,  Schuurhuis, Johny Rutger ,  Schets, Sicco Ian ,  Lee, Brian ,  Dunbar, Allan

IPC分类号： G03F7/20

CPC分类号： G03F9/7049 ,  G03F7/70483 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7084 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源，具有第一检测器通道和第二检测器通道的检测系统以及与检测系统通信的位置确定单元。 位置确定单元组合处理来自第一和第二检测器通道的信息，以基于组合的信息确定第一对象上的对准标记相对于第二对象上的参考位置的位置。