公开(公告)号：EP1400860A2

公开(公告)日：2004-03-24

申请号：EP03077976.3

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Van Haren, Richard Johannes Franciscus ,  Van Hinnen, Paul Christiaan ,  Lalbahadoersing, Sanjay ,  Megens, Henry ,  Van der Schaar, Maurits

IPC分类号： G03F9/00

CPC分类号： G03F9/7076 ,  G03F7/70633 ,  G03F9/7084

摘要： Marker structure on a substrate for optical alignment of said substrate, said marker structure comprising a plurality of first structural elements and a plurality of second structural elements,
in use said marker structure allowing said optical alignment based upon

providing at least one light beam directed on said marker structure,
detecting light received from said marker structure at a sensor,
determining alignment information from said detected light, said alignment information comprising information relating a position of said substrate to said sensor.

摘要翻译： 对所说基片的光学对准的基板标记结构，所述标记结构包括第一结构性元件的多元性和第二结构元件复数，在使用中所述标记结构允许所述光学对准基于： - 提供至少一个光束导向上 所述标记结构， - 检测在一个传感器从所述标记结构接收到的光， - 从所述确定性采矿对准信息检测到的光，所述对准信息包括有关的信息。所述底物的所述传感器的位置。

公开(公告)号：EP1400854A3

公开(公告)日：2009-07-08

申请号：EP03077974.8

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Van Bilsen, Franciscus Bernardus Maria ,  Burghoorn, Jacobus ,  Van Haren, Richard Johannes Franciscus ,  Van Hinnen, Paul Christiaan ,  Van Horssen, Hermanus Gerardus ,  Huijbregtse, Jeroen ,  Jeunink, Andre Bernardus ,  Megens, Henry ,  Navarro Y Koren, Ramon ,  Tolsma, Hoite Pieter Theodoor ,  Simons, Hubertus Johannes Gertrudus ,  Schuurhuis, Johny Rutger ,  Schets, Sicco Ian ,  Lee, Brian ,  Dunbar, Allan

IPC分类号： G03F7/20

CPC分类号： G03F9/7049 ,  G03F7/70483 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7084 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.

公开(公告)号：EP1400860B1

公开(公告)日：2013-11-06

申请号：EP03077976.3

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Van Haren, Richard Johannes Franciscus ,  Van Hinnen, Paul Christiaan ,  Lalbahadoersing, Sanjay ,  Megens, Henry ,  Van der Schaar, Maurits

IPC分类号： G03F9/00

CPC分类号： G03F9/7076 ,  G03F7/70633 ,  G03F9/7084

公开(公告)号：EP1400860A3

公开(公告)日：2009-03-25

申请号：EP03077976.3

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Van Haren, Richard Johannes Franciscus ,  Van Hinnen, Paul Christiaan ,  Lalbahadoersing, Sanjay ,  Megens, Henry ,  Van der Schaar, Maurits

IPC分类号： G03F9/00

CPC分类号： G03F9/7076 ,  G03F7/70633 ,  G03F9/7084

摘要： Marker structure on a substrate for optical alignment of said substrate, said marker structure comprising a plurality of first structural elements and a plurality of second structural elements,
in use said marker structure allowing said optical alignment based upon
- providing at least one light beam directed on said marker structure,
- detecting light received from said marker structure at a sensor,
- determining alignment information from said detected light, said alignment information comprising information relating a position of said substrate to said sensor.

公开(公告)号：EP1400854A2

公开(公告)日：2004-03-24

申请号：EP03077974.8

申请日：2003-09-19

申请人： ASML Netherlands B.V.

发明人： Van Bilsen, Franciscus Bernardus Maria ,  Burghoorn, Jacobus ,  Van Haren, Richard Johannes Franciscus ,  Van Hinnen, Paul Christiaan ,  Van Horssen, Hermanus Gerardus ,  Huijbregtse, Jeroen ,  Jeunink, Andre Bernardus ,  Megens, Henry ,  Navarro Y Koren, Ramon ,  Tolsma, Hoite Pieter Theodoor ,  Simons, Hubertus Johannes Gertrudus ,  Schuurhuis, Johny Rutger ,  Schets, Sicco Ian ,  Lee, Brian ,  Dunbar, Allan

IPC分类号： G03F7/20

CPC分类号： G03F9/7049 ,  G03F7/70483 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7084 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源，具有第一检测器通道和第二检测器通道的检测系统以及与检测系统通信的位置确定单元。 位置确定单元组合处理来自第一和第二检测器通道的信息，以基于组合的信息确定第一对象上的对准标记相对于第二对象上的参考位置的位置。