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公开(公告)号：EP4120317A1
公开(公告)日：2023-01-18
申请号：EP22181682.0
申请日：2022-06-28
IPC分类号： H01J37/244 , H01J37/28
摘要： A detector for use in a charged particle device for an assessment tool to detect signal particles from a sample, the detector comprising a substrate , the substrate comprising: a semiconductor element configured to detect signal particles above a first energy threshold; and a charge based element configured to detect signal particles below a second energy threshold.
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公开(公告)号：EP3020062B1
公开(公告)日：2020-01-22
申请号：EP14720984.5
申请日：2014-05-05
IPC分类号： H01J37/317 , H01J37/09 , H01J37/30
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公开(公告)号：EP4256601A1
公开(公告)日：2023-10-11
申请号：EP21810001.4
申请日：2021-11-09
发明人： SLOT, Erwin , MANGNUS, Albertus, Victor, Gerardus , SMAKMAN, Erwin, Paul , REN, Yan , SCOTUZZI, Marijke
IPC分类号： H01J37/304
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公开(公告)号：EP4117014A1
公开(公告)日：2023-01-11
申请号：EP21184292.7
申请日：2021-07-07
摘要： A charged particle apparatus, configured to project a charged particle multi-beam toward a sample, comprises: a charged particle source configured to emit a charged particle beam; a light source configured to emit light; and a charged particle-optical device configured to project toward the sample sub-beams of a charged particle multi-beam derived from the charged particle beam; wherein the light source is arranged such that the light is projected along paths of the sub-beams through the charged particle-optical device so as to irradiate at least a portion of the sample..
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公开(公告)号：EP4117012A1
公开(公告)日：2023-01-11
申请号：EP21184294.3
申请日：2021-07-07
发明人： SLOT, Erwin
IPC分类号： H01J37/02
摘要： A method for projecting a charged particle multi-beam toward a sample comprises: manipulating respective sub-beams of a charged particle multi-beam using a control lens array comprising a plurality of control lenses for the respective sub-beams; controlling the control lens array to manipulate the sub-beams such that the sub-beams are shaped by respective apertures of a beam shaping aperture array such that less than a threshold current of charged particles of each sub-beam passes through the respective apertures of the beam shaping aperture array, down-beam of the control lens array, comprising a plurality of apertures for the respective sub-beams; and controlling the control lens array to manipulate the sub-beams such that at least the threshold current of at least a proportion of the sub-beams passes through the respective apertures of the beam shaping aperture array.
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6.发明公开
公开(公告)号：EP4391006A1
公开(公告)日：2024-06-26
申请号：EP22215815.6
申请日：2022-12-22
CPC分类号： H01J37/12 , H01J37/28 , H01J2237/120520130101 , H01J2237/020620130101 , H01J37/02 , H01J2237/244620130101
摘要： The present disclosure relates to a charged particular apparatus for projecting a multi-beam of charged particles toward a sample. In one arrangement, a sample support supports a sample. A charged particle-optical device projects beams of a multi-beam of the charged particles along a plurality of paths toward the sample. The device comprises a plurality of charged particle-optical elements that define an objective lens and in which are defined a plurality of apertures along the paths of the beams. At least two of the charged particle-optical elements are configured to be set at different potentials and at least one of the charged particle-optical elements is set at ground potential.
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公开(公告)号：EP4117017A1
公开(公告)日：2023-01-11
申请号：EP21183811.5
申请日：2021-07-05
IPC分类号： H01J37/244 , H01J37/28
摘要： A detector for use in a charged particle device for an assessment tool to detect signal particles from a sample, the detector comprising a substrate , the substrate comprising: a semiconductor element configured to detect signal particles above a first energy threshold; and a charge based element configured to detect signal particles below a second energy threshold.
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公开(公告)号：EP3651183A1
公开(公告)日：2020-05-13
申请号：EP19214148.9
申请日：2014-05-05
IPC分类号： H01J37/317 , H01J37/09
摘要： A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.
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公开(公告)号：EP4421843A1
公开(公告)日：2024-08-28
申请号：EP23158846.8
申请日：2023-02-27
发明人： VAN ENGELEN, Jorn, Paul , SAHIN, Ezgi , AKBULUT, Duygu , PELLEMANS, Henricus, Petrus, Maria , WIELAND, Marco, Jan-Jaco , SLOT, Erwin , KUIPER, Vincent, Sylvester
IPC分类号： H01J37/317 , H01J37/22
CPC分类号： H01J2237/2459220130101 , H01J37/3177 , H01J37/226 , H01J2237/004720130101 , H01J2237/3177420130101 , H01J2237/063520130101 , H01J2237/045320130101
摘要： An electron-optical projection device for projecting a plurality of charged particle beams towards a sample, the device comprising:
a stack of plates comprising beam directing elements configured to project the plurality of charged particle beams towards a sample location on the sample,
wherein at least one plate of the stack comprises a planar optical member configured to direct stimulation light towards the sample location so that the stimulation light is coincident with the plurality of charged particle beams, desirably coincident with the paths of the plurality of charged particle beams towards the sample location, desirably in the at least one plate comprising an optical member is defined a plurality of apertures for respective paths of a plurality charged particle beams.-
10.发明公开
公开(公告)号：EP4310885A1
公开(公告)日：2024-01-24
申请号：EP22186294.9
申请日：2022-07-21
发明人： OOMS, Thomas, Adriaan , VERGEER, Niels , BOSCH, Niels, Johannes, Maria , KUIPER, Vincent, Sylvester , HEMPENIUS, Peter, Paul , STEENBRINK, Stijn, Wilem, Herman, Karel , SLOT, Erwin
IPC分类号： H01J37/317 , H01J37/28 , H01J37/26 , H01J37/21 , G03F9/00
摘要： This discloses apparatus and methods for obtaining topographical information about a sample surface. In one arrangement, a sensing system comprises a group of proximal sensors for measuring positions of respective portions of a sample surface, and a distal sensor positioned more remotely from paths of sub-beams of a multibeam than the proximal sensors. The distal sensor measures a position of a portion of the sample surface relative to the distal sensor. A control system controls a charged particle device to process the sample surface in a multibeam processable area using the multibeam. A stage causes the multibeam processable area to move along a processing path in a reference frame of the sample. The sensing system uses at least the distal sensor to obtain topographical information about the sample surface in a selected portion of the processing path before the multibeam processable area reaches the selected portion of the processing path.
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