DETECTING CHARGED PARTICLE EVENTS AT HIGH DOSE RATES

    公开(公告)号:EP4390462A1

    公开(公告)日:2024-06-26

    申请号:EP23217251.0

    申请日:2023-12-15

    申请人: FEI Company

    IPC分类号: G01T1/17 G01T1/29 H01J37/28

    摘要: Charged particle microscope (CPM) support systems and apparatus, as well as related methods, computing devices, and computer-readable media. One charged particle microscope support apparatus includes first logic to detect a first charged particle event at a first pixel of a charged particle camera, and second logic to detect, within a subregion of pixels of the charged particle camera containing the first pixel, whether a second charged particle event is present based on a dose rate and an energy value of each pixel within the subregion of pixels. When the second charged particle event is determined to be present, the second logic determines a location of the second charged particle event within the subregion. The support apparatus further includes third logic to output charged particle event data representing the first charged particle event and the second charged particle event.