METHOD FOR ROLL-TO-ROLL DEPOSITION OF OPTICALLY TRANSPARENT AND HIGH CONDUCTIVITY METALLIC THIN FILMS
    2.
    发明公开
    METHOD FOR ROLL-TO-ROLL DEPOSITION OF OPTICALLY TRANSPARENT AND HIGH CONDUCTIVITY METALLIC THIN FILMS 有权
    程序对轧辊ORDER光学透明的高级官员金属d- NNEN FILMS

    公开(公告)号:EP1534510A2

    公开(公告)日:2005-06-01

    申请号:EP03760348.7

    申请日:2003-06-12

    IPC分类号: B32B9/04

    摘要: Methods for roll-to-roll deposition of optically transparent and high conductivity metallic thin films are disclosed. In general, a method according to the present invention comprises: (1) providing a flexible plastic substrate; (2) depositing a multi-layered conductive metallic film on the flexible plastic substrate by a thin-film deposition technique to form a composite film; and (3) collecting the composite film in continuous rolls. Typically, the thin conductive metallic film is an InCeO-Ag-InCeO film. Typically, the thin-film deposition technique is DC magnetron sputtering. Another aspect of the invention is a composite film produced by a method according to the present invention. Still another aspect of the invention is a composite film comprising InCeO-Ag-InCeO film formed on a flexible plastic substrate, wherein the composite fillm has a combination of properties including: transmittance of at least 90% throughout the visible region; an electrical resistance of no greater than about 10 ohm/square; a root-mean-square roughness of no greater than about 2.5 nm; and an interlayer adhesion between the InCeO/Ag/InCeO metallic film and the remainder of the composite film that is sufficiently great to survive a 180° peel adhesion test.

    COMPOSITE BARRIER FILMS AND METHOD
    3.
    发明公开
    COMPOSITE BARRIER FILMS AND METHOD 审中-公开
    复合阻隔薄膜和方法

    公开(公告)号:EP1590502A1

    公开(公告)日:2005-11-02

    申请号:EP03814669.2

    申请日:2003-12-09

    IPC分类号: C23C28/02 B32B9/00 C04B35/00

    摘要: In one embodiment, the invention relates to composite films having barrier properties, and more particularly, to composite films which comprise a silicon nitride based coating on a flexible plastic substrate wherein the silicon nitride based coating has a thickness of less than about 220 nm and is deposited on the plastic substrate by sputtering of a silicon target in an atmosphere comprising at least 75 % by volume of nitrogen. The composite barrier film has a visible light transmittance of at least about 75 %. In another embodiment, the invention relates to a barrier method of depositing a silicon nitride based coating on a plastic substrate to form a composite barrier film which comprises depositing a silicon nitride based coating on the substrate by sputtering of a silicon target in an atmosphere comprising at least about 75 % by volume nitrogen.

    TRANSPARENT CONDUCTIVE FILM FOR FLAT PANEL DISPLAYS
    4.
    发明公开
    TRANSPARENT CONDUCTIVE FILM FOR FLAT PANEL DISPLAYS 审中-公开
    透明导电层用于平板显示器

    公开(公告)号:EP1556525A2

    公开(公告)日:2005-07-27

    申请号:EP03781604.8

    申请日:2003-10-31

    摘要: Transparent conductive films for flat panel displays and methods for producing them are disclosed. In general, a method according to the present invention comprises: (1) providing a flexible plastic substrate; (2) depositing a multi-layered conductive metallic film on the flexible plastic substrate by a thin-film deposition technique to form a composite film, the multi-layered conductive metallic film comprising two layers of an alloy selected from the group consisting of indium cerium oxide (InCeO) and indium tin oxide (ITO) surrounding a layer of an alloy of silver, palladium, and copper (Ag/Pd/Cu); and (3) collecting the composite film in continuous rolls. Typically, the thin-film deposition technique is DC magnetron sputtering. Another aspect of the invention is a composite film produced by a method according to the present invention. Still another aspect of the invention is a composite film comprising a multilayered film as described above formed on a flexible plastic substrate, wherein the composite film has a combination of properties including: transmittance of at least 80% throughout the visible region; an electrical resistance of no greater than about 10 Ω/square; a root-mean-square roughness of no greater than about 2.5 nm; and an interlayer adhesion between the multi-layered metallic film and the remainder of the composite film that is sufficiently great to survive a 180° peel adhesion test.