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1.发明公开Process for producing an image using a first minimum bottom antireflective coating composition 有权Verfahren zur Bilderzeugung unter Verwendung einer Antireflexunterschichtzusammensetzung
公开(公告)号：EP1845415A2
公开(公告)日：2007-10-17
申请号：EP07009942.9
申请日：2003-01-03
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antirefiective coating (B.A.R.O.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ 2 n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
摘要翻译： 公开了一种在基板上形成图像的方法，包括以下步骤：（a）在基板上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆在抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）从步骤（c）开发暴露的涂覆的基底以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是具有固体含量高达约8％固体的第一最小底部抗反射涂层（BARO）组合物，并且涂覆的基底的最大涂层厚度为»2 ¢n，其中» 是步骤（c）的光化辐射的波长，n是BARC的折射率 组成。
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2.发明授权
公开(公告)号：EP1845415B1
公开(公告)日：2014-04-30
申请号：EP07009942.9
申请日：2003-01-03
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
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3.发明公开
公开(公告)号：EP1845415A3
公开(公告)日：2009-05-27
申请号：EP07009942.9
申请日：2003-01-03
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antirefiective coating (B.A.R.O.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ 2 n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
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