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公开(公告)号:EP1204622A1
公开(公告)日:2002-05-15
申请号:EP00953911.5
申请日:2000-08-10
申请人: AlliedSignal Inc.
IPC分类号: C04B41/89
CPC分类号: C23C16/405 , C04B35/584 , C04B35/6263 , C04B41/009 , C04B41/52 , C04B41/89 , C04B2235/3213 , C04B2235/3225 , C04B2235/3227 , C04B2235/3826 , C04B2235/483 , C04B2235/616 , C04B2235/656 , C04B2235/77 , C23C26/00 , F01D5/284 , F01D5/288 , C04B41/0072 , C04B41/4517 , C04B41/4539 , C04B41/4578 , C04B41/4582 , C04B41/4596 , C04B41/5066 , C04B41/4515 , C04B41/4535 , C04B41/4554 , C04B41/457 , C04B41/5059 , C04B41/4519 , C04B41/4529 , C04B41/455 , C04B41/5027 , C04B41/4523 , C04B41/522
摘要: A turbomachine component includes a silicon nitride substrate and a multilayer coating bonded to the substrate. The coating includes an interlayer of porous fibrous silicon nitride having a density of between 85-98 %. The coating also includes an outer layer formed of an oxide compound, preferably tantalum oxide, that is applied by Electron Beam-Physical Vapor Deposition. The combination of the silicon nitride interlayer and tantalum oxide outer layer serves to protect the substrate from the adverse affects of oxidation, impact by foreign objects and extreme operating temperatures.
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公开(公告)号:EP1204622B1
公开(公告)日:2003-05-21
申请号:EP00953911.5
申请日:2000-08-10
申请人: AlliedSignal Inc.
IPC分类号: C04B41/89
CPC分类号: C23C16/405 , C04B35/584 , C04B35/6263 , C04B41/009 , C04B41/52 , C04B41/89 , C04B2235/3213 , C04B2235/3225 , C04B2235/3227 , C04B2235/3826 , C04B2235/483 , C04B2235/616 , C04B2235/656 , C04B2235/77 , C23C26/00 , F01D5/284 , F01D5/288 , C04B41/0072 , C04B41/4517 , C04B41/4539 , C04B41/4578 , C04B41/4582 , C04B41/4596 , C04B41/5066 , C04B41/4515 , C04B41/4535 , C04B41/4554 , C04B41/457 , C04B41/5059 , C04B41/4519 , C04B41/4529 , C04B41/455 , C04B41/5027 , C04B41/4523 , C04B41/522
摘要: A turbomachine component includes a silicon nitride substrate and a multilayer coating bonded to the substrate. The coating includes an interlayer of porous fibrous silicon nitride having a density of between 85-98 %. The coating also includes an outer layer formed of an oxide compound, preferably tantalum oxide, that is applied by Electron Beam-Physical Vapor Deposition. The combination of the silicon nitride interlayer and tantalum oxide outer layer serves to protect the substrate from the adverse affects of oxidation, impact by foreign objects and extreme operating temperatures.
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