公开(公告)号：EP2244279B1

公开(公告)日：2018-11-07

申请号：EP10160623.4

申请日：2010-04-21

申请人： Applied Materials, Inc.

发明人： Jennings, Dean C. ,  Thomas, Timothy N. ,  Howells, Samuel C. ,  Adams, Bruce E. ,  Li, Jiping

IPC分类号： H01L21/00 ,  B23K26/06 ,  B23K26/073 ,  H01L21/268

CPC分类号： H01L21/67115 ,  B23K26/0006 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/12 ,  B23K26/125 ,  B23K26/127 ,  B23K26/352 ,  B23K26/354 ,  B23K2101/40 ,  B23K2103/56 ,  G02B27/0927 ,  G02B27/0961 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268

摘要： Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays (310, 312, 320, 322) and Fourier lens (314, 324). The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.

公开(公告)号：EP2244279A3

公开(公告)日：2012-07-25

申请号：EP10160623.4

申请日：2010-04-21

申请人： Applied Materials, Inc.

发明人： Jennings, Dean C. ,  Thomas, Timothy N. ,  Howells, Samuel C. ,  Adams, Bruce E. ,  Li, Jiping

IPC分类号： H01L21/00 ,  B23K26/06 ,  B23K26/073 ,  H01L21/268

CPC分类号： H01L21/67115 ,  B23K26/0006 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/12 ,  B23K26/125 ,  B23K26/127 ,  B23K26/352 ,  B23K26/354 ,  B23K2101/40 ,  B23K2103/56 ,  G02B27/0927 ,  G02B27/0961 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268

摘要： Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays (310, 312, 320, 322) and Fourier lens (314, 324). The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.

公开(公告)号：EP2244279A2

公开(公告)日：2010-10-27

申请号：EP10160623.4

申请日：2010-04-21

申请人： Applied Materials, Inc.

发明人： Jennings, Dean C. ,  Thomas, Timothy N. ,  Howells, Samuel C. ,  Adams, Bruce E. ,  Li, Jiping

IPC分类号： H01L21/00

CPC分类号： H01L21/67115 ,  B23K26/0006 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/12 ,  B23K26/125 ,  B23K26/127 ,  B23K26/352 ,  B23K26/354 ,  B23K2101/40 ,  B23K2103/56 ,  G02B27/0927 ,  G02B27/0961 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268

摘要： Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays (310, 312, 320, 322) and Fourier lens (314, 324). The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.

摘要翻译： 基板处理设备和方法用于通过用多个光学均质器处理光来改善衬底的照射部分上的照明的均匀性。 多个光学均质器各自包括微透镜阵列（310,312,320,322）和傅里叶透镜（314,324）。 多个光学均质器被布置成使得一个光学均化器的输出数值孔径在另一个光学均化器的输入数值孔径的5％内。