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1.发明公开
公开(公告)号：EP3330036A1
公开(公告)日：2018-06-06
申请号：EP18152336.6
申请日：2008-05-22
发明人： Li, Jiping , Adams, Bruce E. , Thomas, Timothy N. , Hunter, Aaron M. , Mayur, Abhilash , Ramanujam, Rajesh S.
IPC分类号： B23K26/04
摘要： In a laser annealing system for workpieces such as semiconductor wafers, a pyrometer wavelength response band is established within a narrow window lying between the laser emission band and a fluorescence emission band from the optical components of the laser system, the pyrometer response band lying in a wavelength region at which the optical absorber layer on the workpiece has an optical absorption coefficient as great as or greater than the underlying workpiece. A multi-layer razor-edge interference filter (72) having a 5-8 nm wavelength cut-off edge transition provides the cut-off of the laser emission at the bottom end of the pyrometer response band.
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2.发明授权
公开(公告)号：EP3330036B1
公开(公告)日：2019-11-06
申请号：EP18152336.6
申请日：2008-05-22
发明人： Li, Jiping , Adams, Bruce E. , Thomas, Timothy N. , Hunter, Aaron M. , Mayur, Abhilash , Ramanujam, Rajesh S.
IPC分类号： B23K26/04
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公开(公告)号：EP2244279B1
公开(公告)日：2018-11-07
申请号：EP10160623.4
申请日：2010-04-21
IPC分类号： H01L21/00 , B23K26/06 , B23K26/073 , H01L21/268
CPC分类号： H01L21/67115 , B23K26/0006 , B23K26/0622 , B23K26/0648 , B23K26/0652 , B23K26/12 , B23K26/125 , B23K26/127 , B23K26/352 , B23K26/354 , B23K2101/40 , B23K2103/56 , G02B27/0927 , G02B27/0961 , H01L21/02678 , H01L21/02686 , H01L21/268
摘要： Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays (310, 312, 320, 322) and Fourier lens (314, 324). The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.
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公开(公告)号：EP2244279A3
公开(公告)日：2012-07-25
申请号：EP10160623.4
申请日：2010-04-21
IPC分类号： H01L21/00 , B23K26/06 , B23K26/073 , H01L21/268
CPC分类号： H01L21/67115 , B23K26/0006 , B23K26/0622 , B23K26/0648 , B23K26/0652 , B23K26/12 , B23K26/125 , B23K26/127 , B23K26/352 , B23K26/354 , B23K2101/40 , B23K2103/56 , G02B27/0927 , G02B27/0961 , H01L21/02678 , H01L21/02686 , H01L21/268
摘要： Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays (310, 312, 320, 322) and Fourier lens (314, 324). The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.
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公开(公告)号：EP2244279A2
公开(公告)日：2010-10-27
申请号：EP10160623.4
申请日：2010-04-21
IPC分类号： H01L21/00
CPC分类号： H01L21/67115 , B23K26/0006 , B23K26/0622 , B23K26/0648 , B23K26/0652 , B23K26/12 , B23K26/125 , B23K26/127 , B23K26/352 , B23K26/354 , B23K2101/40 , B23K2103/56 , G02B27/0927 , G02B27/0961 , H01L21/02678 , H01L21/02686 , H01L21/268
摘要： Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays (310, 312, 320, 322) and Fourier lens (314, 324). The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.
摘要翻译： 基板处理设备和方法用于通过用多个光学均质器处理光来改善衬底的照射部分上的照明的均匀性。 多个光学均质器各自包括微透镜阵列（310,312,320,322）和傅里叶透镜（314,324）。 多个光学均质器被布置成使得一个光学均化器的输出数值孔径在另一个光学均化器的输入数值孔径的5％内。
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