专利检索 ap:("Applied Materials, Inc.") AND inv:"KOELMEL, Blake, R." 第 1 页

1.

发明授权
APPARATUS AND METHOD INCLUDING HEATING SOURCE REFLECTIVE FILTER FOR PYROMETRY 有权
标题翻译：装置和方法与HEIZQUELLENREFLEKTIONSFILTER测温

公开(公告)号：EP2279519B1

公开(公告)日：2013-05-22

申请号：EP09730361.4

申请日：2009-04-03

申请人： Applied Materials, Inc.

发明人： RANISH, Joseph, M. , HUNTER, Aaron, M. , KOELMEL, Blake, R.

IPC分类号： H01L21/67

CPC分类号： H01L21/67115 , H01L21/67248

2.

发明公开
APPARATUS INCLUDING HEATING SOURCE REFLECTIVE FILTER FOR PYROMETRY 有权
标题翻译：装置和方法与HEIZQUELLENREFLEKTIONSFILTER测温

公开(公告)号：EP2279519A2

公开(公告)日：2011-02-02

申请号：EP09730361.4

申请日：2009-04-03

申请人： Applied Materials, Inc.

发明人： RANISH, Joseph, M. , HUNTER, Aaron, M. , KOELMEL, Blake, R.

IPC分类号： H01L21/324

CPC分类号： H01L21/67115 , H01L21/67248

摘要： Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.