公开(公告)号：EP2304774B1

公开(公告)日：2015-04-29

申请号：EP09774542.6

申请日：2009-07-02

申请人： Applied Materials, Inc.

发明人： LAM, Hyman ,  ZHENG, Bo ,  HUA, Ai ,  JACKSON, Michael ,  YUAN, XiaoXiong ,  WANG, Hou, Gong ,  UMOTOY, Salvador, P. ,  YU, San, Ho

IPC分类号： C23C16/455 ,  C23C16/44 ,  H01J37/32

CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/4558 ,  H01J37/32449 ,  Y10T137/87265

公开(公告)号：EP2304774A2

公开(公告)日：2011-04-06

申请号：EP09774542.6

申请日：2009-07-02

申请人： Applied Materials, Inc.

发明人： LAM, Hyman ,  ZHENG, Bo ,  HUA, Ai ,  JACKSON, Michael ,  YUAN, XiaoXiong ,  WANG, Hou, Gong ,  UMOTOY, Salvador, P. ,  YU, San, Ho

IPC分类号： H01L21/205

CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/4558 ,  H01J37/32449 ,  Y10T137/87265

摘要： Embodiments of the invention provide apparatuses for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In one embodiment, a showerhead assembly is provided which includes a showerhead plate having top and bottom surfaces, and a radius extending from the center to the outer edge of the showerhead plate, a first plurality of holes in fluid communication with the top and bottom surfaces, positioned within a first zone extending from the center of the showerhead plate to about 25% of the radius of the showerhead plate, and each hole has a diameter of less than 0.1 inches, and a second plurality of holes in fluid communication with the top and bottom surfaces, positioned within a second zone extending from about 25% of the radius of the showerhead plate to about the outer edge of the showerhead plate, and each hole has a diameter of greater than 0.1 inches.