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    NOZZLE AND NOZZLE HEAD
    4.
    发明授权
    NOZZLE AND NOZZLE HEAD 有权

    公开(公告)号：EP2814996B1

    公开(公告)日：2018-12-26

    申请号：EP13749430.8

    申请日：2013-02-12

    申请人： Beneq OY

    发明人： ALASAARELA, Tapani ,  SOININEN, Pekka ,  JAUHIAINEN, Mika

    IPC分类号： C23C16/455 ,  C23C16/44

    CPC分类号： C23C16/45574 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/45548 ,  C23C16/45578

    摘要： A nozzle and nozzle head arranged to subject a surface of a substrate to gaseous precursors. The nozzle includes an output face via which the precursor is supplied, a longitudinal precursor supply element for supplying precursor and a longitudinal discharge channel open to and along the output face for discharging at least a fraction of the precursor supplied from the precursor channel. The precursor supply element is arranged to extend inside the discharge channel such that the precursor supply element divides the discharge channel in the longitudinal direction to a first discharge sub-channel and a second discharge sub-channel on opposite sides of the precursor supply element for supplying precursor through the discharge channel.

    FILM-FORMATION DEVICE AND FILM-FORMATION METHOD
    5.
    发明公开
    FILM-FORMATION DEVICE AND FILM-FORMATION METHOD 审中-公开

    公开(公告)号：EP3196337A4

    公开(公告)日：2018-03-28

    申请号：EP15842589

    申请日：2015-09-17

    申请人： TOPPAN PRINTING CO LTD

    发明人： KON MASATO

    IPC分类号： C23C16/455 ,  C23C16/44

    CPC分类号： C23C16/45544 ,  C23C16/4412 ,  C23C16/45551 ,  C23C16/52 ,  C23C16/545

    摘要： A film formation apparatus and a film formation method that can homogenize the distribution of gas in each zone in a chamber and improve film formation precision is provided. A film formation apparatus according to one embodiment is characterized in that the film formation apparatus includes: a chamber which includes a plurality of zones into which gas is introduced, and a plurality of discharge ports that discharge the gas located in at least any of the zones and that can individually adjust an opening state; and a transportation unit that transports a substrate so as to pass through the plurality of the zones in the chamber.

    PLANETARY ROTATION FLUIDIZED APPARATUS FOR NANOPARTICLE ATOMIC LAYER DEPOSITION
    6.
    发明公开
    PLANETARY ROTATION FLUIDIZED APPARATUS FOR NANOPARTICLE ATOMIC LAYER DEPOSITION 有权
    纳米颗粒原子层沉积的行星旋转流化床装置

    公开(公告)号：EP3181722A1

    公开(公告)日：2017-06-21

    申请号：EP16157778.8

    申请日：2016-02-29

    申请人： Huazhong University of Science and Technology

    发明人： Chen, Rong ,  Zhu, Penghui ,  Duan, Chenlong ,  Shan, Bin ,  Ba, Weiming

    IPC分类号： C23C16/44 ,  C23C16/442 ,  C23C16/455

    CPC分类号： C23C16/4417 ,  C23C16/442 ,  C23C16/45544 ,  C23C16/45555

    摘要： This disclosure provides a device for nanoparticles' atomic layer decoration based on planetary fluidization, comprising a motor (2), a reaction chamber, a planet carrier (13), a cartridge (6), and gas manifolds. Before coating, the nanoparticles are firstly put into the cartridges, and then the cartridges are settled onto the hollow planet wheels (9). The planetary mechanism drives the cartridge to conduct planetary movement. Along the radial direction, the nanoparticles in the cartridge suffer the centrifugal force generated by the revolution, and therefore intend to move outwards and stack on the walls of the cartridges which locate on the connecting line from the revolution axis to spin axis. In the meantime, the circumferential friction force generated by the spin of cartridges compels the nanoparticles to rotate inside the cartridge, achieving centrifugal fluidization. In the axis direction of said planet wheel (9), the nanoparticles are fluidized by the axial vertical fluidizing gas, and exhibit uniform fluidization as traditional vertical fluidized bed. During modification process, precursor gas and purge gas alternatively enter the cartridge through the planet carrier, and the precursor molecules are absorbed on the surface of the nanoparticles upon pulse stage, forming an atomic layer film. Repeating the deposition cycles will finally obtain the desired coating thickness. The coupling of the centrifugal and vertical fluidization exerts shear force 30 times greater than gravity on the agglomerates, breaks them apart, and overcome the axial non-uniform distribution in the centrifugal fluidized bed, realizing more uniform fluidization and coating for each individual nanoparticle. In addition, the device of the invention can effectively improve nanoparticles' coating percentage and uniformity, and significantly increase the coating efficiency with high batch processing ability.

    摘要翻译： 本公开提供了一种基于行星流化的用于纳米颗粒原子层装饰的装置，包括马达（2），反应室，行星架（13），筒（6）和气体歧管。 在涂布之前，首先将纳米粒子放入墨盒中，然后将墨盒沉积到空心行星轮（9）上。 行星机构驱动墨盒进行行星运动。 沿着径向，盒中的纳米颗粒受到旋转产生的离心力，因此打算向外移动并堆叠在位于从旋转轴到旋转轴的连接线上的盒的壁上。 同时，由旋转的墨盒产生的周向摩擦力迫使纳米颗粒在墨盒内旋转，实现离心流化。 在所述行星轮（9）的轴线方向上，纳米颗粒被轴向垂直流化气体流化，并且与传统的垂直流化床一样呈现均匀的流化。 在改性过程中，前驱气体和吹扫气体交替通过行星载体进入墨盒，在脉冲阶段前体分子被纳米颗粒表面吸附，形成原子层膜。 重复沉积循环将最终获得所需的涂层厚度。 离心和垂直流化的耦合对附聚物施加比重力大30倍的剪切力，将它们分开，并克服离心流化床中的轴向不均匀分布，实现对每个单独纳米颗粒更均匀的流化和涂布。 另外，本发明的装置可以有效提高纳米粒子的涂布率和均匀性，并且具有高批量处理能力的涂布效率显着提高。

    CLEANING OF DEPOSITION DEVICE BY INJECTING CLEANING GAS INTO DEPOSITION DEVICE
    7.
    发明公开
    CLEANING OF DEPOSITION DEVICE BY INJECTING CLEANING GAS INTO DEPOSITION DEVICE 审中-公开
    分离装置用清洁气的进样到分离装置清洁

    公开(公告)号：EP3119922A1

    公开(公告)日：2017-01-25

    申请号：EP15765627.3

    申请日：2015-03-11

    申请人： Veeco ALD Inc.

    发明人： LEE, Sang In ,  PAK, Samuel S. ,  LEE, Daniel Ho ,  YANG, Hyoseok Daniel

    IPC分类号： C23C16/455

    CPC分类号： C23C16/4405 ,  C23C16/4412 ,  C23C16/45523 ,  C23C16/45538 ,  C23C16/45544 ,  C23C16/45551 ,  H01J37/32091 ,  H01J37/32357 ,  H01J37/32834 ,  H01J37/32853 ,  H01J37/32862

    摘要： Embodiments relate to a deposition device that operates in two modes: a deposition mode, and a cleaning mode. In the deposition mode, modular injectors inject materials onto a substrate to form a layer. In the cleaning mode, the deposition device is cleaned without disassembly by injecting a cleaning gas. The injector module assembly may be cleaned in the cleaning mode by injecting cleaning gas through an exhaust for removing reactant precursor and routing the cleaning gas from the exhaust to another exhaust for removing source precursor. Alternatively, the injector module assembly is cleaned by injecting cleaning gas into a passage between an injector for injecting a source precursor and another injector for injecting a reactant precursor, and routing the cleaning gas to one of the exhausts in the cleaning mode.

    摘要翻译： 实施例涉及一种沉积装置确实以两种模式操作：沉积模式和清洁模式。 在沉积模式中，模块化喷射器注入材料到基片，以形成一个层。 在清洁模式中，沉积装置被拆卸，而不通过注入的清洁气体清洁。 喷射器模块组件可在清洁模式中通过注入通过清洁气体在排气除去反应物前体和从排气路由清洁气体到另一个排气除去源前体进行清洗。 可替代地，喷射器模块组件通过注入清洁气体成之间的通道在喷射器用于喷射源前体和另一注射器用于注射的前体反应物，和路由所述清洁气体到在清洁模式排出的废气中的一个清洁。