公开(公告)号：EP2030220A2

公开(公告)日：2009-03-04

申请号：EP07795613.4

申请日：2007-06-01

Applicant: Axcelis Technologies, Inc.

Inventor： HUANG, Yongzhang ,  YE, John ,  GRAF, Michael ,  FREER, Brian ,  GODFREY, Christopher ,  SPLINTER, Patrick

IPC: H01J37/317

CPC classification number: H01J37/304 ,  H01J37/3171 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/31703

Abstract: A method derives a terminal return current to adjust and/or compensate for variations in beam current during ion implantation. One or more individual upstream current measurements are obtained from a region of an ion implantation system. A terminal return current, or composite upstream current, is derived from the one or more current measurements. The terminal return current is then employed to adjust scanning or dose of an ion beam in order to facilitate beam current uniformity at a target wafer.

公开(公告)号：EP1625604A1

公开(公告)日：2006-02-15

申请号：EP04752159.6

申请日：2004-05-14

Applicant: Axcelis Technologies, Inc.

Inventor： BENVENISTE, Victor ,  HUANG, Yongzhang

IPC: H01J37/317 ,  H01J37/05 ,  H01J37/153

CPC classification number: H01J37/32082 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/3266 ,  H01J2237/0041

Abstract: A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.