-
1.
公开(公告)号:EP3210664A1
公开(公告)日:2017-08-30
申请号:EP17163637.6
申请日:2009-11-18
申请人: BHA Altair, LLC
CPC分类号: B01D67/009 , B01D53/228 , B01D67/0093 , B01D71/32 , B01D71/34 , B01D71/36 , B01D71/38 , B01D71/40 , B01D2323/02 , B01D2323/385 , B01D2325/36
摘要: A membrane includes a porous base membrane and a hydrophilic coating. The coating comprises a hydrophilic additive and a hydrophilic polymer derivatized with an electron beam reactive group adapted to form a radical under high energy irradiation. In some embodiments, the membrane comprises a fluoropolymer. Also disclosed are processes for forming the membrane.
摘要翻译: 膜包括多孔基膜和亲水涂层。 所述涂层包含亲水性添加剂和亲电性聚合物,所述亲水性聚合物和亲水性聚合物用适于在高能照射下形成自由基的电子束反应性基团衍生。 在一些实施例中,膜包含含氟聚合物。 还公开了用于形成膜的方法。