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23 条记录 (耗时 0.016 秒)

    Ink-jet recording apparatus
    5.
    发明公开
    Ink-jet recording apparatus 失效
    喷墨记录仪

    公开(公告)号：EP0348234A3

    公开(公告)日：1990-05-30

    申请号：EP89306414.7

    申请日：1989-06-23

    申请人： CANON KABUSHIKI KAISHA

    发明人： Ebinuma, Ryuichi ,  Chiba, Yuji ,  Mizusawa, Nobutoshi

    IPC分类号： B41J2/165 ,  B41J2/19

    CPC分类号： B41J2/19 ,  B41J2/16579 ,  B41J2202/12

    摘要： An ink-jet recording apparatus comprises recording means (1) for recording an image on a recording medium;
    image reader means (2) for reading the image;
    cmparing means (3) for comparing a recording signal input from the recording means (1) and an image signal input from the image reader means (2);
    determination means (4) for diagnosing an ink injection state of a recording head nozzle and determining an ink injection recovery processing method on the basis of the comparison result of the comparing means (3); and
    processing means (5) for performing ink injection recovery processing based on the determination result of the determination means (4).

    Method and apparatus for manufacture of X-ray mask
    8.
    发明公开
    Method and apparatus for manufacture of X-ray mask 失效
    X射线掩模的制造方法和装置

    公开(公告)号：EP0453133A3

    公开(公告)日：1992-05-27

    申请号：EP91302988.0

    申请日：1991-04-04

    申请人： CANON KABUSHIKI KAISHA

    发明人： Fujioka, Hidehiko ,  Miyachi, Takeshi ,  Chiba, Yuji ,  Mizusawa, Nobutoshi ,  Kariya, Takao ,  Uzawa, Shunichi ,  Fukuda, Yasuaki

    IPC分类号： G03F1/14

    CPC分类号： G03F1/22

    摘要： A method and apparatus for manufacturing an X-ray mask having a mask substrate and a supporting frame, wherein the mask substrate having a first surface on which a mask pattern is provided or to be provided is to be fixed onto a first surface of the supporting frame by using an adhesive material, is disclosed. A first base has a first engaging surface to be opposed to and engageable with the first surface of the mask substrate and a second base has a second engaging surface to be opposed to and engageable with a second surface of the supporting frame on a side thereof remote from the first surface thereof. Attracting device is actable on the first and second bases to attract the mask substrate to the first base and to attract the supporting frame to the second base, respectively, whereby the mask substrate and the supporting frame are held fixed by the first and second bases, respectively. Interval adjusting device relatively moves at least one of the first and second bases to the other with the mask substrate and the supporting frame being held by the first and second bases, respectively, wherein at an adjusted interval the first engaging surface of the first base and the second engaging surface of the second base are held in parallel to each other.

    Method and apparatus for manufacture of X-ray mask
    9.
    发明公开
    Method and apparatus for manufacture of X-ray mask 失效
    Verfahren und Vorrichtung zur Herstellung einerRöntgenmaske。

    公开(公告)号：EP0453133A2

    公开(公告)日：1991-10-23

    申请号：EP91302988.0

    申请日：1991-04-04

    申请人： CANON KABUSHIKI KAISHA

    发明人： Fujioka, Hidehiko ,  Miyachi, Takeshi ,  Chiba, Yuji ,  Mizusawa, Nobutoshi ,  Kariya, Takao ,  Uzawa, Shunichi ,  Fukuda, Yasuaki

    IPC分类号： G03F1/14

    CPC分类号： G03F1/22

    摘要： A method and apparatus for manufacturing an X-ray mask having a mask substrate and a supporting frame, wherein the mask substrate having a first surface on which a mask pattern is provided or to be provided is to be fixed onto a first surface of the supporting frame by using an adhesive material, is disclosed. A first base has a first engaging surface to be opposed to and engageable with the first surface of the mask substrate and a second base has a second engaging surface to be opposed to and engageable with a second surface of the supporting frame on a side thereof remote from the first surface thereof. Attracting device is actable on the first and second bases to attract the mask substrate to the first base and to attract the supporting frame to the second base, respectively, whereby the mask substrate and the supporting frame are held fixed by the first and second bases, respectively. Interval adjusting device relatively moves at least one of the first and second bases to the other with the mask substrate and the supporting frame being held by the first and second bases, respectively, wherein at an adjusted interval the first engaging surface of the first base and the second engaging surface of the second base are held in parallel to each other.

    摘要翻译： 一种用于制造具有掩模基板和支撑框架的X射线掩模的方法和装置，其中具有设置有掩模图案或要设置的掩模图案的第一表面的掩模基板被固定到支撑件的第一表面上 公开了使用粘合剂材料的框架。 第一基座具有与掩模基板的第一表面相对并可接合的第一接合表面，并且第二基座具有第二接合表面，该第二接合表面与支撑框架的第二表面相对并可与其接合 从其第一表面。 吸引装置可以在第一和第二基座上作用，以分别将掩模基板吸引到第一基座并将支撑框架吸引到第二基座，由此掩模基板和支撑框架由第一和第二基座保持固定， 分别。 间隔调整装置将第一和第二基座中的至少一个相对移动到另一个基座，并且支撑框架分别由第一和第二基座保持，其中在调整间隔处，第一基座的第一接合表面和 第二基座的第二接合面保持彼此平行。