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公开(公告)号：EP0279670A2
公开(公告)日：1988-08-24
申请号：EP88301367.4
申请日：1988-02-18
发明人： Ikeda, Tsutomu , Watanabe, Yutaka , Suzuki, Masayuki , Hayashida, Masami , Fukuda, Yasuaki , Ogura, Shigetaro , Iizuka, Takashi , Niibe, Masahito
IPC分类号： G03F1/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/58 , G03F7/70033 , G03F7/70233 , G03F7/70283 , G03F7/70875 , G03F7/70958
摘要： A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
摘要翻译： 公开了一种可用于通过使用软X射线在半导体晶片上印刷图案的反射型掩模。 考虑到布拉格衍射和菲涅尔反射，通过分层折射率不同的材料形成在基板上的多层膜形成反射表面。 在反射面上形成非反射部分，以提供所需的图案。 或者，包括多层结构的图案可以形成在非反射基板上。 本发明的掩模确保高对比度的图案印刷。
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公开(公告)号：EP0279670B1
公开(公告)日：1997-10-29
申请号：EP88301367.4
申请日：1988-02-18
发明人： Ikeda, Tsutomu , Watanabe, Yutaka , Suzuki, Masayuki , Hayashida, Masami , Fukuda, Yasuaki , Ogura, Shigetaro , Iizuka, Takashi , Niibe, Masahito
IPC分类号： G03F1/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/58 , G03F7/70033 , G03F7/70233 , G03F7/70283 , G03F7/70875 , G03F7/70958
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公开(公告)号：EP0279670A3
公开(公告)日：1990-03-14
申请号：EP88301367.4
申请日：1988-02-18
发明人： Ikeda, Tsutomu , Watanabe, Yutaka , Suzuki, Masayuki , Hayashida, Masami , Fukuda, Yasuaki , Ogura, Shigetaro , Iizuka, Takashi , Niibe, Masahito
IPC分类号： G03F1/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/58 , G03F7/70033 , G03F7/70233 , G03F7/70283 , G03F7/70875 , G03F7/70958
摘要： A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
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