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1.发明授权
公开(公告)号：EP0501498B1
公开(公告)日：1998-01-21
申请号：EP92103404.7
申请日：1992-02-27
发明人： Takei, Tetsuya, c/o Canon Kabushiki Kaisha , Ohtoshi, Hirokazu, c/o Canon Kabushiki Kaisha , Okamura, Ryuji, c/o Canon Kabushiki Kaisha , Katagiri, Hiroyuki, c/o Canon Kabushiki Kaisha , Takai, Yasuyoshi, c/o Canon Kabushiki Kaisha
IPC分类号： G03G5/10
CPC分类号： G03G5/102 , G03G5/10 , Y10S29/095 , Y10T82/10 , Y10T408/44
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2.发明授权
公开(公告)号：EP0605972B1
公开(公告)日：1999-10-27
申请号：EP93310038.0
申请日：1993-12-13
发明人： Takai, Yasuyoshi, c/o Canon Kabushiki Kaisha , Takei, Tetsuya, c/o Canon Kabushiki Kaisha , Otoshi, Hirokazu, c/o Canon Kabushiki Kaisha , Okamura, Ryuji, c/o Canon Kabushiki Kaisha , Katagiri, Hiroyuki, c/o Canon Kabushiki Kaisha , Kojima, Satoshi, c/o Canon Kabushiki Kaisha
IPC分类号： G03G5/082 , H01L31/09 , H01L31/0376
CPC分类号： G03G5/08228 , G03G5/08242
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3.发明授权Method and apparatus for continuously forming functional deposited films with a large area by microwave plasma CVD 失效用于通过微波等离子体CVD法，连续生产大表面的实用淀积薄膜的方法和装置。
公开(公告)号：EP0411317B1
公开(公告)日：1995-09-27
申请号：EP90112245.7
申请日：1990-06-27
发明人： Echizen, Hiroshi, c/o Canon Kabushiki Kaisha , Fujioka, Yasushi, c/o Canon Kabushiki Kaisha , Nakagawa, Katsumi, c/o Canon Kabushiki Kaisha , Kanai, Masahiro, c/o Canon Kabushiki Kaisha , Kariya, Toshimitsu, c/o Canon Kabushiki Kaisha , Matsuyama, Jinsho, c/o Canon Kabushiki Kaisha , Takei, Tetsuya, c/o Canon Kabushiki Kaisha
CPC分类号： H01J37/3222 , C23C16/50 , H01J37/32192 , H01J37/3277 , H01J2237/3325 , H01L31/202 , H01L31/206 , Y02E10/50 , Y02P70/521
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公开(公告)号：EP0616260A2
公开(公告)日：1994-09-21
申请号：EP94103893.7
申请日：1994-03-14
IPC分类号： G03G5/082
CPC分类号： G03G5/08214 , G03G5/08221
摘要： To provide an electrophotographic light-receiving member having a good initial-stage electrophotographic performance and also having a good durability especially in an environment of low humidity, the light-receiving member comprises a support 101, a photoconductive layer 103 formed on the support and formed of a non-monocrystalline material mainly composed of silicon atoms, and a surface layer 104 formed of a non-monocrystalline material constituted of silicon atoms, carbon atoms, nitrogen atoms and hydrogen atoms in which silicon atoms having at least one bond to a carbon atom are in a percentage of at least 50 atom% based on the whole silicon atoms in the surface layer.
摘要翻译： 为了提供具有良好初始阶段电子照相性能并且还具有良好耐久性的电子成象受光部件，特别是在低湿度环境下，光接收部件包括支撑体101，形成在支撑体上并形成的光电导层103 主要由硅原子组成的非单晶材料和由硅原子，碳原子，氮原子和氢原子构成的非单晶材料形成的表面层104，其中硅原子与碳原子具有至少一个键 相对于表面层中的全部硅原子为至少50原子％的百分比。
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5.发明公开
公开(公告)号：EP0501498A1
公开(公告)日：1992-09-02
申请号：EP92103404.7
申请日：1992-02-27
发明人： Takei, Tetsuya, c/o Canon Kabushiki Kaisha , Ohtoshi, Hirokazu, c/o Canon Kabushiki Kaisha , Okamura, Ryuji, c/o Canon Kabushiki Kaisha , Katagiri, Hiroyuki, c/o Canon Kabushiki Kaisha , Takai, Yasuyoshi, c/o Canon Kabushiki Kaisha
IPC分类号： G03G5/10
CPC分类号： G03G5/102 , G03G5/10 , Y10S29/095 , Y10T82/10 , Y10T408/44
摘要： A method of treating a substrate for an electrophotographic photosensitive member by a process comprises the steps of;
a) cutting the surface of the substrate to remove the surface in the desired thickness; and
b) bringing the cut surface of the substrate into contact with water having a temperature of from 5°C to 90°C, having a resistivity of not less than 11 MΩ·cm at 25°C, containing fine particles with a particle diameter of not smaller than 0.2 µm in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for at least 10 seconds at a pressure of from 1 kg·f/cm² to 300 kg·f/cm².摘要翻译： 通过一种方法在电子照相感光构件用于处理一基板的方法，包括以下步骤; 一个）切割所述基板的表面，以去除表面的所需厚度; 和b）使该基板的切断面接触到具有水从5℃至90℃的温度下，在25℃下具有不小于-11 M OMEGA·cm的范围的电阻率，将含有细颗粒的颗粒 不小于0.2微米每毫升不大于10,000的颗粒的数量，直径含微生物在不100每毫升大于总活菌数和在不超过10毫克每一个量的有机物质含 升，至少10秒的从1 kg.f /厘米<2>〜300 kg.f /厘米<2>的压力。
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6.发明公开Method and apparatus for continuously forming functional deposited films with a large area by microwave plasma CVD 失效通过微波等离子体CVD连续形成具有大面积的功能性沉积膜的方法和装置
公开(公告)号：EP0411317A3
公开(公告)日：1991-05-29
申请号：EP90112245.7
申请日：1990-06-27
发明人： Echizen, Hiroshi, c/o Canon Kabushiki Kaisha , Fujioka, Yasushi, c/o Canon Kabushiki Kaisha , Nakagawa, Katsumi, c/o Canon Kabushiki Kaisha , Kanai, Masahiro, c/o Canon Kabushiki Kaisha , Kariya, Toshimitsu, c/o Canon Kabushiki Kaisha , Matsuyama, Jinsho, c/o Canon Kabushiki Kaisha , Takei, Tetsuya, c/o Canon Kabushiki Kaisha
CPC分类号： H01J37/3222 , C23C16/50 , H01J37/32192 , H01J37/3277 , H01J2237/3325 , H01L31/202 , H01L31/206 , Y02E10/50 , Y02P70/521
摘要： A method for continuously forming a functional deposited film with a large area according to a microwave plasma CVD process is described. The method comprises the steps of continuously traveling a band-shaped member containing a conductive member along its length during which a pillar-shaped film-forming space capable of being kept substantially in vacuum therein is established by the use of the traveling band-shaped member as a side wall for the film-forming space, charging starting gases for film formation through a gas feed means into the film-forming space, and simultaneously radiating a microwave through a microwave antenna in all directions vertical to the direction of movement of the microwave so that microwave power is supplied to the film-forming space to initiate a plasma in the space whereby the film is deposited on the surface of the continuously traveling band-shaped member which constitutes the side wall exposed to the plasma. An apparatus for carrying out the method is also described.
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7.发明公开Method and apparatus for continuously forming functional deposited films with a large area by microwave plasma CVD 失效用于通过微波等离子体CVD法，连续生产大表面的实用淀积薄膜的方法和装置。
公开(公告)号：EP0411317A2
公开(公告)日：1991-02-06
申请号：EP90112245.7
申请日：1990-06-27
发明人： Echizen, Hiroshi, c/o Canon Kabushiki Kaisha , Fujioka, Yasushi, c/o Canon Kabushiki Kaisha , Nakagawa, Katsumi, c/o Canon Kabushiki Kaisha , Kanai, Masahiro, c/o Canon Kabushiki Kaisha , Kariya, Toshimitsu, c/o Canon Kabushiki Kaisha , Matsuyama, Jinsho, c/o Canon Kabushiki Kaisha , Takei, Tetsuya, c/o Canon Kabushiki Kaisha
CPC分类号： H01J37/3222 , C23C16/50 , H01J37/32192 , H01J37/3277 , H01J2237/3325 , H01L31/202 , H01L31/206 , Y02E10/50 , Y02P70/521
摘要： A method for continuously forming a functional deposited film with a large area according to a microwave plasma CVD process is described. The method comprises the steps of continuously traveling a band-shaped member containing a conductive member along its length during which a pillar-shaped film-forming space capable of being kept substantially in vacuum therein is established by the use of the traveling band-shaped member as a side wall for the film-forming space, charging starting gases for film formation through a gas feed means into the film-forming space, and simultaneously radiating a microwave through a microwave antenna in all directions vertical to the direction of movement of the microwave so that microwave power is supplied to the film-forming space to initiate a plasma in the space whereby the film is deposited on the surface of the continuously traveling band-shaped member which constitutes the side wall exposed to the plasma. An apparatus for carrying out the method is also described.
摘要翻译： 描述了一种用于形成功能连续沉积电影具有大面积gemäß到微波等离子体CVD的工艺方法。 该方法包括的连续移动的带状构件包含沿其能够在真空中。其中通过使用行进带状部件的建立基本上保持柱状电影成型空间中它的长度的导电性部件的步骤 如侧壁的膜形成空间，通过气体输送充电膜形成原料气体装置引入到膜形成空间，并且同时通过微波天线在所有方向上垂直于微波运动的方向上辐射微波 所以没有微波功率被提供到膜形成空间以发起等离子体中的空间，由此该膜是构成暴露于等离子体的侧壁的连续移动的带状部件的表面上的沉积。 因此描述了用于执行该方法的装置。
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公开(公告)号：EP0616260B1
公开(公告)日：2001-01-10
申请号：EP94103893.7
申请日：1994-03-14
IPC分类号： G03G5/082
CPC分类号： G03G5/08214 , G03G5/08221
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公开(公告)号：EP0616260A3
公开(公告)日：1996-01-10
申请号：EP94103893.7
申请日：1994-03-14
IPC分类号： G03G5/082
CPC分类号： G03G5/08214 , G03G5/08221
摘要： To provide an electrophotographic light-receiving member having a good initial-stage electrophotographic performance and also having a good durability especially in an environment of low humidity, the light-receiving member comprises a support 101, a photoconductive layer 103 formed on the support and formed of a non-monocrystalline material mainly composed of silicon atoms, and a surface layer 104 formed of a non-monocrystalline material constituted of silicon atoms, carbon atoms, nitrogen atoms and hydrogen atoms in which silicon atoms having at least one bond to a carbon atom are in a percentage of at least 50 atom% based on the whole silicon atoms in the surface layer.
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10.发明公开
公开(公告)号：EP0605972A1
公开(公告)日：1994-07-13
申请号：EP93310038.0
申请日：1993-12-13
发明人： Takai, Yasuyoshi, c/o Canon Kabushiki Kaisha , Takei, Tetsuya, c/o Canon Kabushiki Kaisha , Otoshi, Hirokazu, c/o Canon Kabushiki Kaisha , Okamura, Ryuji, c/o Canon Kabushiki Kaisha , Katagiri, Hiroyuki, c/o Canon Kabushiki Kaisha , Kojima, Satoshi, c/o Canon Kabushiki Kaisha
IPC分类号： G03G5/082 , H01L31/09 , H01L31/0376
CPC分类号： G03G5/08228 , G03G5/08242
摘要： A light receiving member comprising a substrate and a light receiving layer disposed on said substrate, said light receiving layer having a stacked structure comprising a plurality of constituent layers each being composed of a non-single crystal material containing silicon atoms as a matrix and at least either hydrogen atoms or halogen atoms, characterized in that said light receiving layer has a region containing at least one kind of atoms selected from the group consisting of hydrogen atoms and halogen atoms at an enhanced concentration distribution in the thickness direction in the vicinity of at least one layer interface of the light receiving layer.
摘要翻译： 一种光接收元件，其包括衬底和设置在所述基板的光接收层，所述具有堆叠结构，其包括构成层的多个光接收层中的每个被由含有硅原子作为基质和至少一个非单晶材料的 氢原子或卤原子，在所述光接收层，其特征具有包含至少一种原子的选自氢原子和卤素原子中的在厚度方向上在其附近中的增强的浓度分布的区域中的至少 光接收层中的一个层的界面。
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