公开(公告)号：EP1390813A2

公开(公告)日：2004-02-25

申请号：EP02769464.5

申请日：2002-05-04

申请人： Carl Zeiss SMT AG ,  CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG

发明人： BRUNOTTE, Martin ,  HARTMAIER, Jürgen ,  HOLDERER, Hubert ,  KAISER, Winfried ,  KOHL, Alexander ,  KUGLER, Jens ,  MAUL, Manfred ,  WAGNER, Christian

IPC分类号： G03F7/20 ,  G02B5/30

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G03F7/70241 ,  G03F7/70825 ,  G03F7/70966

摘要： The injection relates to a projection illumination system, especially one with 157 or 193 nm and an image-side NA of 0.8 0.95, comprising fluoride crystal lenses (43, 43), wherein the negative effect of the angle-dependent birefringence thereof is reduced by relative rotation around the optical axis (O) and/or by a correction element (44) close to a plane of the pupil (P).

公开(公告)号：EP1407299A1

公开(公告)日：2004-04-14

申请号：EP02752986.6

申请日：2002-06-25

申请人： CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG

发明人： HARTMAIER, Jürgen ,  FIOLKA, Damian ,  ZENZINGER, Markus ,  MECKING, Birgit ,  DITTMANN, Olaf ,  GRUNER, Toralf ,  KAMENOV, Vladimir ,  BRUNOTTE, Martin

IPC分类号： G02B5/30 ,  G02B1/02 ,  G02B1/08 ,  G03F7/20

CPC分类号： G03F7/70225 ,  G02B1/02 ,  G02B5/3091 ,  G03F7/70308 ,  G03F7/70966

摘要： Centimetre-thick sheets or lenses made from calcium fluoride or barium fluoride with beam propagation in the direction of the crystal direction or a main axis equivalent thereto, used as delay elements for the deep ultraviolet are disclosed, embodied in a stress-free form. The above is particularly suitable for microlithography at 157 nm.