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公开(公告)号:EP1407299A1
公开(公告)日:2004-04-14
申请号:EP02752986.6
申请日:2002-06-25
发明人: HARTMAIER, Jürgen , FIOLKA, Damian , ZENZINGER, Markus , MECKING, Birgit , DITTMANN, Olaf , GRUNER, Toralf , KAMENOV, Vladimir , BRUNOTTE, Martin
CPC分类号: G03F7/70225 , G02B1/02 , G02B5/3091 , G03F7/70308 , G03F7/70966
摘要: Centimetre-thick sheets or lenses made from calcium fluoride or barium fluoride with beam propagation in the direction of the crystal direction or a main axis equivalent thereto, used as delay elements for the deep ultraviolet are disclosed, embodied in a stress-free form. The above is particularly suitable for microlithography at 157 nm.
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公开(公告)号:EP1405144A1
公开(公告)日:2004-04-07
申请号:EP02751097.3
申请日:2002-07-02
发明人: FIOLKA, Damian
CPC分类号: G03F7/70558 , G01J1/48 , Y10T436/206664
摘要: The invention relates to a sensor for determining the radiated energy of a type which is capable of converting oxygen into ozone, and to the use of said sensor. According to the invention, the sensor contains a measuring chamber (1) which can be penetrated by radiation, comprising a gas inlet (4) and a gas outlet (6), means (8) for supplying gas (9) containing oxygen into the measuring chamber by the gas inlet and for supplying gas into the measuring chamber via the gas inlet and means for discharging said gas via the outlet, an ozone element (10) for measuring the ozone content of the gas (9a) in the measuring chamber or the gas (9a) discharged via the gas outlet, and evaluating means (12) for determining the radiation energy from the measured ozone content. The sensor can, for example, be used for determining the radiation energy in an optical imaging system working with said rays. Said sensor can be used, for example, in a microlithography-projection exposure system.
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